KR960035774A - 개선된 슬릿밸브 도어 - Google Patents

개선된 슬릿밸브 도어 Download PDF

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Publication number
KR960035774A
KR960035774A KR1019960009968A KR19960009968A KR960035774A KR 960035774 A KR960035774 A KR 960035774A KR 1019960009968 A KR1019960009968 A KR 1019960009968A KR 19960009968 A KR19960009968 A KR 19960009968A KR 960035774 A KR960035774 A KR 960035774A
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KR
South Korea
Prior art keywords
slit valve
wall
recess
door
valve door
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KR1019960009968A
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English (en)
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KR100371996B1 (ko
Inventor
더블유. 프리어크스 프레데릭
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제임스 조셉 드롱
어플라이드 머티어리얼스, 인코포레이티드
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Publication of KR960035774A publication Critical patent/KR960035774A/ko
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Publication of KR100371996B1 publication Critical patent/KR100371996B1/ko

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/06Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising selenium or tellurium in uncombined form other than as impurities in semiconductor bodies of other materials
    • H01L21/08Preparation of the foundation plate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67126Apparatus for sealing, encapsulating, glassing, decapsulating or the like
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16KVALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K51/00Other details not peculiar to particular types of valves or cut-off apparatus
    • F16K51/02Other details not peculiar to particular types of valves or cut-off apparatus specially adapted for high-vacuum installations
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67742Mechanical parts of transfer devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67748Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a single workpiece

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • General Engineering & Computer Science (AREA)
  • Robotics (AREA)
  • Mechanical Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Gasket Seals (AREA)
  • Sliding Valves (AREA)
  • Details Of Valves (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

본 발명은 반도체 처리챔버의 벽의 개구를 시일링하는 개선된 슬릿밸브 도어에 관한 것이다. 슬릿밸브 도어는 이동가능한 삽입부를 수용하기 위해 리세스를 가진 개구 덮개판으로 구성된다. O-링 시일은 삽입 부위에 위치하며, 삽입부가 개구 덮개판의 리세스에 위치할 때, O-링은 개구 덮개판내에서 O-링 시트로 이동한다. 삽입부가 리세스에 삽입되고 리세스층으로부터 돌출하는 나사에 의해 덮개판에 고정됨에 따라, 도브데일 홈은 O-링을 유지하도록 형성된다.

Description

개선된 슬릿밸브 도어
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제5도는 본 발명에 따른 슬릿밸브 도어의 수질단면도 및 반응챔버의 개구를 덮는 것을 도시한 수직단면도, 제6도는 1차 시일 및 1차 시일을 유지하는 수단을 도시한, 제5도는 슬릿밸브 도어의 상세한 단면도.

Claims (16)

  1. 반도체 반응챔버의 벽에 형성된 개구를 시일링하게 위한 슬릿밸브 도어에 있어서, (i) 상기 벽과 결합되며 상기 개구를 시일링하는 1차 시일과, (ii) 결합될 때, 상호 분리가능하게 고정되고 리테이너를 한정하는, 상기 1차 시일을 위한 석어도 제1부분 및 제2부분을 포함하는 개구 덮개판을 포함하는 것을 특징으로 하는 슬릿밸브 도어.
  2. 제1항에 잇어서, 상기 개구 덮개판은 벽과 맞선 면을 포함하며, 상기 제1 및 제2부분을 포함하는 개구 덮개판은 벽과 맞선 면 이상으로 적어도 부분적으로 돌출하는 1차 시일을 유지하기 위해 측면 및 바닥면을 가지고 상기 벽과 맞선 면에서 개방하는 시일 리테이너를 한정하는 것을 특징으로 하는 슬릿밸브 도어.
  3. 제2항에 있어서, 상기 측면은 상기 측면 및 바닥면사이의 제한부를 한정하며, 시일의 주요부분은 유지되는 것을 특징으로 하는 슬릿밸브 도어.
  4. 제3항에 있어서, 측면 및 바닥표면사이의 삽입부는 오목한 것을 특징으로 하는 슬릿밸브 도어.
  5. 제2항에 있어서, 상기 제1뿐은 벽을 가지며 제2부분을 수용하는 리세스와, 제2부분이 상기 리세스에 수용될 때 상기 리세스 및 제2부분사이에 1차 시일을 유지하기 위해 상기 리세스의 벽게 형성된 쇼울더를 포함하는 것을 특징으로 하는 슬릿밸브 도어.
  6. 제5항에 있어서, 제1 및 제2부분은 반응 챔버벽의 외부면에 인접한 면을 각각 포함하는 것을 특징으로 하는 슬릿밸브 도어.
  7. 제6항에 있어서, 상기 제1 및 제2부분의 각각의 면은 상기 제2부분이 상기 리세스에 수용될 때 벽과 맞선 면을 한정하는 것을 특징으로 하는 슬릿밸브 도어.
  8. 제5항에 있어서, 상기 쇼울더는 상기 제2부분이 상기 리세스에 수용될 때 일반적으로 사다리꼴형 1차 시일 리테이너의 바닥면을 한정하는 것을 특징으로 하는 슬릿밸브 도어.
  9. 제2항에 있어서, 상기 제1부분 및 제2부분사이에 위치한 2차 시일을 더 포함하는 것을 특징으로 하는 슬릿밸브 도어.
  10. 제9항에 있어서, 상기 리세스는 상기 측면 및 바닥면을 포함하며, 상기 2차 시일은 상기 바닥면에 위치하는 것을 특징으로 하는 슬릿밸브 도어.
  11. 제10항에 있어서, 상기 바닥면은 2차시일을 유지하기 위해 그 안에 형성된 홈을 가지는 것을 특징으로 하는 슬릿밸브 도어.
  12. 주위벽의 개구를 시일링하기 위한 슬릿밸브에 있어서, (i) 상기 개구를 덮기 위해 구성되고 상기 개구보다 큰 면적을 가진 리세스를 가진 도어부와 ; (ii) 상기 도어부의 상기 리세스내에 분리가능하게 고정되고 상기 벽에 인접한 상기 도어부의 일부분의 면에 홈을 형성하는 삽입부와 ; (iii) 상기 홈내에 사용할 수 있는 엘라스토머 시일링 부재를 포함하는 것을 특징으로 하는 개구를 시일링하는 슬릿밸브.
  13. 제12항에 있어서, 상기 개구는 일반적으로 직사각형인 것을 특징으로 하는 개구를 시일링하는 슬릿밸브.
  14. 제12항에 있어서, 각각의 상기 도어부 및 상기 삽입부는 상기 주위벽쪽의 내부로 기울어진 상기 홈을 한정하는 벽을 가지는 것을 특징으로 하는 개구를 시일링하는 슬릿밸브.
  15. 제14항에 있어서, 상기 도어부는 일반적으로 상기 주위벽에 평행하고 상기 홈의 일부분을 형성하는 쇼울더를 더 포함하는 것을 특징으로 하는 개구를 시일링하는 슬릿밸브.
  16. 제14항에 있어서, 상기 도어부는 상기 리세스로 삽입 가능하며 상기 엘라스토머 시일부재가 고정 될 수 있는 돌출부를 더 포함하는 것을 특징으로 하는 개구를 시일링하는 슬릿밸브.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019960009968A 1995-03-31 1996-03-30 슬릿밸브도어 KR100371996B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/414,420 1995-03-31
US08/414,420 US5579718A (en) 1995-03-31 1995-03-31 Slit valve door

Publications (2)

Publication Number Publication Date
KR960035774A true KR960035774A (ko) 1996-10-28
KR100371996B1 KR100371996B1 (ko) 2003-04-10

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Country Status (5)

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US (1) US5579718A (ko)
EP (2) EP1179835A2 (ko)
JP (1) JPH1050791A (ko)
KR (1) KR100371996B1 (ko)
DE (1) DE69619717T2 (ko)

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JPH1050791A (ja) 1998-02-20
EP0735574A1 (en) 1996-10-02
DE69619717T2 (de) 2002-11-07
EP0735574B1 (en) 2002-03-13
DE69619717D1 (de) 2002-04-18
US5579718A (en) 1996-12-03
EP1179835A2 (en) 2002-02-13

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