KR960035598U - Gas supply device for ion implantation equipment for semiconductor manufacturing process - Google Patents

Gas supply device for ion implantation equipment for semiconductor manufacturing process

Info

Publication number
KR960035598U
KR960035598U KR2019950007910U KR19950007910U KR960035598U KR 960035598 U KR960035598 U KR 960035598U KR 2019950007910 U KR2019950007910 U KR 2019950007910U KR 19950007910 U KR19950007910 U KR 19950007910U KR 960035598 U KR960035598 U KR 960035598U
Authority
KR
South Korea
Prior art keywords
manufacturing process
supply device
gas supply
ion implantation
semiconductor manufacturing
Prior art date
Application number
KR2019950007910U
Other languages
Korean (ko)
Other versions
KR200224251Y1 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to KR2019950007910U priority Critical patent/KR200224251Y1/en
Publication of KR960035598U publication Critical patent/KR960035598U/en
Application granted granted Critical
Publication of KR200224251Y1 publication Critical patent/KR200224251Y1/en

Links

KR2019950007910U 1995-04-18 1995-04-18 Gas supply device for ion implantation equipment for semiconductor manufacturing process KR200224251Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950007910U KR200224251Y1 (en) 1995-04-18 1995-04-18 Gas supply device for ion implantation equipment for semiconductor manufacturing process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950007910U KR200224251Y1 (en) 1995-04-18 1995-04-18 Gas supply device for ion implantation equipment for semiconductor manufacturing process

Publications (2)

Publication Number Publication Date
KR960035598U true KR960035598U (en) 1996-11-21
KR200224251Y1 KR200224251Y1 (en) 2001-06-01

Family

ID=60866923

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950007910U KR200224251Y1 (en) 1995-04-18 1995-04-18 Gas supply device for ion implantation equipment for semiconductor manufacturing process

Country Status (1)

Country Link
KR (1) KR200224251Y1 (en)

Also Published As

Publication number Publication date
KR200224251Y1 (en) 2001-06-01

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20090223

Year of fee payment: 9

EXPY Expiration of term