KR960019063U - Gas supply device for semiconductor manufacturing equipment - Google Patents

Gas supply device for semiconductor manufacturing equipment

Info

Publication number
KR960019063U
KR960019063U KR2019940031520U KR19940031520U KR960019063U KR 960019063 U KR960019063 U KR 960019063U KR 2019940031520 U KR2019940031520 U KR 2019940031520U KR 19940031520 U KR19940031520 U KR 19940031520U KR 960019063 U KR960019063 U KR 960019063U
Authority
KR
South Korea
Prior art keywords
supply device
gas supply
semiconductor manufacturing
manufacturing equipment
equipment
Prior art date
Application number
KR2019940031520U
Other languages
Korean (ko)
Other versions
KR0123387Y1 (en
Inventor
정인철
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019940031520U priority Critical patent/KR0123387Y1/en
Publication of KR960019063U publication Critical patent/KR960019063U/en
Application granted granted Critical
Publication of KR0123387Y1 publication Critical patent/KR0123387Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67253—Process monitoring, e.g. flow or thickness monitoring

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
KR2019940031520U 1994-11-28 1994-11-28 Gas supplying apparatus of semiconductor fabricating apparatus KR0123387Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940031520U KR0123387Y1 (en) 1994-11-28 1994-11-28 Gas supplying apparatus of semiconductor fabricating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940031520U KR0123387Y1 (en) 1994-11-28 1994-11-28 Gas supplying apparatus of semiconductor fabricating apparatus

Publications (2)

Publication Number Publication Date
KR960019063U true KR960019063U (en) 1996-06-19
KR0123387Y1 KR0123387Y1 (en) 1999-02-18

Family

ID=19399266

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940031520U KR0123387Y1 (en) 1994-11-28 1994-11-28 Gas supplying apparatus of semiconductor fabricating apparatus

Country Status (1)

Country Link
KR (1) KR0123387Y1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101489740B1 (en) * 2013-08-09 2015-02-04 인하대학교 산학협력단 Dry etching method for Magnetic Tunnel Junction(MTJ) stack and vaporizing apparatus for the same
KR101642021B1 (en) * 2014-08-22 2016-07-22 주식회사 테라텍 Liquid Delivery Apparatus and Method in The Vacuum System

Also Published As

Publication number Publication date
KR0123387Y1 (en) 1999-02-18

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20050422

Year of fee payment: 8

LAPS Lapse due to unpaid annual fee