KR970025806U - Gas cleaning equipment for semiconductor device manufacturing equipment - Google Patents

Gas cleaning equipment for semiconductor device manufacturing equipment

Info

Publication number
KR970025806U
KR970025806U KR2019950035229U KR19950035229U KR970025806U KR 970025806 U KR970025806 U KR 970025806U KR 2019950035229 U KR2019950035229 U KR 2019950035229U KR 19950035229 U KR19950035229 U KR 19950035229U KR 970025806 U KR970025806 U KR 970025806U
Authority
KR
South Korea
Prior art keywords
equipment
semiconductor device
device manufacturing
gas cleaning
manufacturing equipment
Prior art date
Application number
KR2019950035229U
Other languages
Korean (ko)
Other versions
KR0135371Y1 (en
Inventor
박선후
Original Assignee
삼성전자주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 삼성전자주식회사 filed Critical 삼성전자주식회사
Priority to KR2019950035229U priority Critical patent/KR0135371Y1/en
Publication of KR970025806U publication Critical patent/KR970025806U/en
Application granted granted Critical
Publication of KR0135371Y1 publication Critical patent/KR0135371Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Treating Waste Gases (AREA)
  • Gas Separation By Absorption (AREA)
KR2019950035229U 1995-11-23 1995-11-23 A wet scrubber for semiconductor fabrication KR0135371Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950035229U KR0135371Y1 (en) 1995-11-23 1995-11-23 A wet scrubber for semiconductor fabrication

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950035229U KR0135371Y1 (en) 1995-11-23 1995-11-23 A wet scrubber for semiconductor fabrication

Publications (2)

Publication Number Publication Date
KR970025806U true KR970025806U (en) 1997-06-20
KR0135371Y1 KR0135371Y1 (en) 1999-03-20

Family

ID=19430045

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950035229U KR0135371Y1 (en) 1995-11-23 1995-11-23 A wet scrubber for semiconductor fabrication

Country Status (1)

Country Link
KR (1) KR0135371Y1 (en)

Also Published As

Publication number Publication date
KR0135371Y1 (en) 1999-03-20

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20051007

Year of fee payment: 8

LAPS Lapse due to unpaid annual fee