KR960032735U - Semiconductor wafer cleaning device - Google Patents

Semiconductor wafer cleaning device

Info

Publication number
KR960032735U
KR960032735U KR2019950003748U KR19950003748U KR960032735U KR 960032735 U KR960032735 U KR 960032735U KR 2019950003748 U KR2019950003748 U KR 2019950003748U KR 19950003748 U KR19950003748 U KR 19950003748U KR 960032735 U KR960032735 U KR 960032735U
Authority
KR
South Korea
Prior art keywords
cleaning device
semiconductor wafer
wafer cleaning
semiconductor
wafer
Prior art date
Application number
KR2019950003748U
Other languages
Korean (ko)
Other versions
KR0128244Y1 (en
Inventor
호원준
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019950003748U priority Critical patent/KR0128244Y1/en
Publication of KR960032735U publication Critical patent/KR960032735U/en
Application granted granted Critical
Publication of KR0128244Y1 publication Critical patent/KR0128244Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
    • B08B2203/02—Details of machines or methods for cleaning by the force of jets or sprays
    • B08B2203/0288—Ultra or megasonic jets
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/048—Overflow-type cleaning, e.g. tanks in which the liquid flows over the tank in which the articles are placed

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
KR2019950003748U 1995-03-04 1995-03-04 Wafer cleaning device KR0128244Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950003748U KR0128244Y1 (en) 1995-03-04 1995-03-04 Wafer cleaning device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950003748U KR0128244Y1 (en) 1995-03-04 1995-03-04 Wafer cleaning device

Publications (2)

Publication Number Publication Date
KR960032735U true KR960032735U (en) 1996-10-24
KR0128244Y1 KR0128244Y1 (en) 1998-12-01

Family

ID=19408790

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950003748U KR0128244Y1 (en) 1995-03-04 1995-03-04 Wafer cleaning device

Country Status (1)

Country Link
KR (1) KR0128244Y1 (en)

Also Published As

Publication number Publication date
KR0128244Y1 (en) 1998-12-01

Similar Documents

Publication Publication Date Title
DE69610457D1 (en) Semiconductor device
KR970004020A (en) Semiconductor device
KR970005998A (en) Semiconductor device
DE69631940D1 (en) Semiconductor device
DE59607521D1 (en) Semiconductor device configuration
DE19681689T1 (en) Secured semiconductor device
KR960019102U (en) Wafer cleaning device
KR970015302U (en) Semiconductor wafer cleaning device
KR960032734U (en) Wafer cleaning device
KR960015599U (en) Wafer bottom cleaning device
KR960032735U (en) Semiconductor wafer cleaning device
DE69635334D1 (en) SEMICONDUCTOR DEVICE
KR960025321U (en) Semiconductor wafer cleaning device
KR960035590U (en) Wafer exposure stage cleaning device
KR970046723U (en) Cleaning device to prevent wafer backside contamination
KR970015285U (en) Wafer back cleaning device
KR970025773U (en) Semiconductor device
KR970059837U (en) Semiconductor wafer chuck cleaning device
KR970046738U (en) Semiconductor Wafer Ultrasonic Cleaner
KR940027602U (en) Semiconductor Wafer Wet Cleaning Device
KR960029726U (en) Semiconductor Wafer Cleaning Equipment
KR960029739U (en) Semiconductor wafer up/down device
KR940008664U (en) Semiconductor wafer cleaning device
KR950031470U (en) Wafer cleaning device
KR960025327U (en) Wafer cleaning device

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20050718

Year of fee payment: 8

LAPS Lapse due to unpaid annual fee