KR960029722U - Gas supply device for semiconductor manufacturing equipment - Google Patents
Gas supply device for semiconductor manufacturing equipmentInfo
- Publication number
- KR960029722U KR960029722U KR2019950001848U KR19950001848U KR960029722U KR 960029722 U KR960029722 U KR 960029722U KR 2019950001848 U KR2019950001848 U KR 2019950001848U KR 19950001848 U KR19950001848 U KR 19950001848U KR 960029722 U KR960029722 U KR 960029722U
- Authority
- KR
- South Korea
- Prior art keywords
- supply device
- gas supply
- semiconductor manufacturing
- manufacturing equipment
- equipment
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Pipeline Systems (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019950001848U KR0121146Y1 (en) | 1995-02-08 | 1995-02-08 | Gas supply system of semiconductor manufacture device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019950001848U KR0121146Y1 (en) | 1995-02-08 | 1995-02-08 | Gas supply system of semiconductor manufacture device |
Publications (2)
Publication Number | Publication Date |
---|---|
KR960029722U true KR960029722U (en) | 1996-09-17 |
KR0121146Y1 KR0121146Y1 (en) | 1998-08-01 |
Family
ID=19407590
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR2019950001848U KR0121146Y1 (en) | 1995-02-08 | 1995-02-08 | Gas supply system of semiconductor manufacture device |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR0121146Y1 (en) |
-
1995
- 1995-02-08 KR KR2019950001848U patent/KR0121146Y1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR0121146Y1 (en) | 1998-08-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
REGI | Registration of establishment | ||
FPAY | Annual fee payment |
Payment date: 20090323 Year of fee payment: 12 |
|
EXPY | Expiration of term |