GB9715430D0 - Process for manufacturing semiconductor device - Google Patents

Process for manufacturing semiconductor device

Info

Publication number
GB9715430D0
GB9715430D0 GB9715430A GB9715430A GB9715430D0 GB 9715430 D0 GB9715430 D0 GB 9715430D0 GB 9715430 A GB9715430 A GB 9715430A GB 9715430 A GB9715430 A GB 9715430A GB 9715430 D0 GB9715430 D0 GB 9715430D0
Authority
GB
United Kingdom
Prior art keywords
semiconductor device
manufacturing semiconductor
manufacturing
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB9715430A
Other versions
GB2315598A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Publication of GB9715430D0 publication Critical patent/GB9715430D0/en
Publication of GB2315598A publication Critical patent/GB2315598A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L28/00Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
    • H01L28/40Capacitors
    • H01L28/60Electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3205Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
    • H01L21/32055Deposition of semiconductive layers, e.g. poly - or amorphous silicon layers
GB9715430A 1996-07-23 1997-07-22 Process for forming a large grain polysilicon part for a semiconductor device. Withdrawn GB2315598A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8193109A JPH1041245A (en) 1996-07-23 1996-07-23 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
GB9715430D0 true GB9715430D0 (en) 1997-09-24
GB2315598A GB2315598A (en) 1998-02-04

Family

ID=16302406

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9715430A Withdrawn GB2315598A (en) 1996-07-23 1997-07-22 Process for forming a large grain polysilicon part for a semiconductor device.

Country Status (3)

Country Link
JP (1) JPH1041245A (en)
KR (1) KR980012099A (en)
GB (1) GB2315598A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100913055B1 (en) * 2002-11-01 2009-08-20 매그나칩 반도체 유한회사 Method of manufacturing a semiconductor device
KR101088449B1 (en) * 2009-05-06 2011-12-01 주식회사 테라세미콘 Semiconductor device including polysilicon gate electrode using metal catalyst and method for fabricating the same

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2505736B2 (en) * 1985-06-18 1996-06-12 キヤノン株式会社 Method for manufacturing semiconductor device

Also Published As

Publication number Publication date
GB2315598A (en) 1998-02-04
JPH1041245A (en) 1998-02-13
KR980012099A (en) 1998-04-30

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)