KR960032741U - 반도체 장치의 플라즈마 식각장치 - Google Patents
반도체 장치의 플라즈마 식각장치Info
- Publication number
- KR960032741U KR960032741U KR2019950006007U KR19950006007U KR960032741U KR 960032741 U KR960032741 U KR 960032741U KR 2019950006007 U KR2019950006007 U KR 2019950006007U KR 19950006007 U KR19950006007 U KR 19950006007U KR 960032741 U KR960032741 U KR 960032741U
- Authority
- KR
- South Korea
- Prior art keywords
- plasma etching
- semiconductor device
- semiconductor
- etching device
- plasma
- Prior art date
Links
- 238000001020 plasma etching Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019950006007U KR0122876Y1 (ko) | 1995-03-30 | 1995-03-30 | 반도체 장치의 플라즈마 식각장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019950006007U KR0122876Y1 (ko) | 1995-03-30 | 1995-03-30 | 반도체 장치의 플라즈마 식각장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR960032741U true KR960032741U (ko) | 1996-10-24 |
KR0122876Y1 KR0122876Y1 (ko) | 1999-02-18 |
Family
ID=19410298
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR2019950006007U KR0122876Y1 (ko) | 1995-03-30 | 1995-03-30 | 반도체 장치의 플라즈마 식각장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR0122876Y1 (ko) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100442194B1 (ko) * | 2002-03-04 | 2004-07-30 | 주식회사 씨싸이언스 | 웨이퍼 건식 식각용 전극 |
KR100447891B1 (ko) * | 2002-03-04 | 2004-09-08 | 강효상 | 반도체 웨이퍼의 건식 식각 방법 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6050722B2 (ja) * | 2013-05-24 | 2016-12-21 | 東京エレクトロン株式会社 | プラズマ処理装置及びフィルタユニット |
-
1995
- 1995-03-30 KR KR2019950006007U patent/KR0122876Y1/ko not_active IP Right Cessation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100442194B1 (ko) * | 2002-03-04 | 2004-07-30 | 주식회사 씨싸이언스 | 웨이퍼 건식 식각용 전극 |
KR100447891B1 (ko) * | 2002-03-04 | 2004-09-08 | 강효상 | 반도체 웨이퍼의 건식 식각 방법 |
Also Published As
Publication number | Publication date |
---|---|
KR0122876Y1 (ko) | 1999-02-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
REGI | Registration of establishment | ||
O032 | Opposition [utility model]: request for opposition | ||
O131 | Decision on opposition [utility model] | ||
O062 | Revocation of registration by opposition: final registration of opposition [utility model] | ||
LAPS | Lapse due to unpaid annual fee |