KR970015305U - 플라즈마 에칭 장치 - Google Patents

플라즈마 에칭 장치

Info

Publication number
KR970015305U
KR970015305U KR2019950024899U KR19950024899U KR970015305U KR 970015305 U KR970015305 U KR 970015305U KR 2019950024899 U KR2019950024899 U KR 2019950024899U KR 19950024899 U KR19950024899 U KR 19950024899U KR 970015305 U KR970015305 U KR 970015305U
Authority
KR
South Korea
Prior art keywords
plasma etching
etching equipment
equipment
plasma
etching
Prior art date
Application number
KR2019950024899U
Other languages
English (en)
Other versions
KR0125244Y1 (ko
Inventor
오한주
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019950024899U priority Critical patent/KR0125244Y1/ko
Publication of KR970015305U publication Critical patent/KR970015305U/ko
Application granted granted Critical
Publication of KR0125244Y1 publication Critical patent/KR0125244Y1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
KR2019950024899U 1995-09-15 1995-09-15 플라즈마 에칭 장치 KR0125244Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950024899U KR0125244Y1 (ko) 1995-09-15 1995-09-15 플라즈마 에칭 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950024899U KR0125244Y1 (ko) 1995-09-15 1995-09-15 플라즈마 에칭 장치

Publications (2)

Publication Number Publication Date
KR970015305U true KR970015305U (ko) 1997-04-28
KR0125244Y1 KR0125244Y1 (ko) 1999-02-18

Family

ID=19423382

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950024899U KR0125244Y1 (ko) 1995-09-15 1995-09-15 플라즈마 에칭 장치

Country Status (1)

Country Link
KR (1) KR0125244Y1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990016573A (ko) * 1997-08-18 1999-03-15 윤종용 포토 레지스트 스트리퍼

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100425445B1 (ko) 2001-04-24 2004-03-30 삼성전자주식회사 플라즈마 에칭 챔버 및 이를 이용한 포토마스크 제조 방법

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990016573A (ko) * 1997-08-18 1999-03-15 윤종용 포토 레지스트 스트리퍼

Also Published As

Publication number Publication date
KR0125244Y1 (ko) 1999-02-18

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Legal Events

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