KR940001972U - 평판형 플라즈마 식각장비 - Google Patents
평판형 플라즈마 식각장비Info
- Publication number
- KR940001972U KR940001972U KR2019920009859U KR920009859U KR940001972U KR 940001972 U KR940001972 U KR 940001972U KR 2019920009859 U KR2019920009859 U KR 2019920009859U KR 920009859 U KR920009859 U KR 920009859U KR 940001972 U KR940001972 U KR 940001972U
- Authority
- KR
- South Korea
- Prior art keywords
- plasma etching
- flat type
- type plasma
- etching equipment
- equipment
- Prior art date
Links
- 238000001020 plasma etching Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR92009859U KR950002450Y1 (ko) | 1992-06-04 | 1992-06-04 | 평판형 플라즈마 식각장비 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR92009859U KR950002450Y1 (ko) | 1992-06-04 | 1992-06-04 | 평판형 플라즈마 식각장비 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR940001972U true KR940001972U (ko) | 1994-01-03 |
| KR950002450Y1 KR950002450Y1 (ko) | 1995-04-04 |
Family
ID=19334305
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR92009859U KR950002450Y1 (ko) | 1992-06-04 | 1992-06-04 | 평판형 플라즈마 식각장비 |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR950002450Y1 (ko) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100516052B1 (ko) * | 1998-01-21 | 2005-12-30 | 삼성전자주식회사 | 블랭크구간을이용한비디오패러미터의전송방법 |
-
1992
- 1992-06-04 KR KR92009859U patent/KR950002450Y1/ko not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| KR950002450Y1 (ko) | 1995-04-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| E701 | Decision to grant or registration of patent right | ||
| REGI | Registration of establishment | ||
| FPAY | Annual fee payment |
Payment date: 20030318 Year of fee payment: 9 |
|
| LAPS | Lapse due to unpaid annual fee |