KR960015776A - 액공급장치 - Google Patents

액공급장치 Download PDF

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Publication number
KR960015776A
KR960015776A KR1019950034513A KR19950034513A KR960015776A KR 960015776 A KR960015776 A KR 960015776A KR 1019950034513 A KR1019950034513 A KR 1019950034513A KR 19950034513 A KR19950034513 A KR 19950034513A KR 960015776 A KR960015776 A KR 960015776A
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KR
South Korea
Prior art keywords
processing liquid
cup
discharge means
processing
discharging
Prior art date
Application number
KR1019950034513A
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English (en)
Inventor
아끼라 요시오
Original Assignee
고이께 시로오
소니 디스크 테크노로지 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 고이께 시로오, 소니 디스크 테크노로지 가부시끼가이샤 filed Critical 고이께 시로오
Publication of KR960015776A publication Critical patent/KR960015776A/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/5762—With leakage or drip collecting

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Coating Apparatus (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

본 발명의 목적은 처리대상에 대하여 처리액을 토출하는 처리액토출수단에 처리액을 공급하는 액공급장치에 있어서, 처리액을 쓸데없이 버리지 않고, 고품질의 처리액을 공급할 수 있는 액공급장치를 제안하는데 있다.
그 구성은 프로세스의 기다리는 시간동안에 처리액토출부(11)에서 소정량의 처리액(6)을 토출하고 이 처리액(6)을 밀폐된 컵(12)을 거쳐서 액탱크(16)에 송출하여 순환시키도록함으로써 처리액(6)을 쓸데없이 버리지 않고, 고품질의 처리액(6)을 공급할 수 있는 액공급장치(10)를 실현할 수 있다.

Description

액공급장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명에 의한 액공급장치의 일실시예의 구성을 나타내는 약선도이다,
제2도는 처리액 토출부 및 순환컵의 구성을 나타내는 단면도이다,
제3도는 액토출장치의 구성을 나타내는 약선도이다.

Claims (7)

  1. 처리대상에 대하여 처리액을 토출하는 처리액 토출수단에 상기 처리액을 공급하는 액공급장치에 있어서, 상기 처리액 토출수단이 상기 처리액 대상에 대하여 처리액을 토출하고 있지 않을 때 상기 처리액 토출수단이 토출하는 처리액을 순환시켜서 재차 상기 처리액 토출수단에 부여하는 순환수단을 구비한 것을 특징으로 하는 액공급장치.
  2. 제1항에 있어서, 상기 순환수단은, 상기 처리액 토출수단에서 토출되는 처리액을 받는 컵과, 상기 컵으로 받은 처리액을 도입하는 처리액 저장탱크와, 상기 처리액 저장탱크에 설치되어 상기 처리액을 소망의 온도로 조정하는 히터와를 구비하고, 상기 처리액 토출수단에서 토출된 처리액을 상기 컵 및 상기 처리액 저장탱크를 거쳐서 재차 상기 처리액 토출수단에 부여하는 것을 특징으로 하는 액공급장치.
  3. 제2항에 있어서, 상기 순환수단은, 상기 컵과 상기 처리액 저장탱크와의 경로 및 또는 상기 저장탱크와 상기 처리액 토출수단과의 경로에 상기 처리액중의 불순물을 제거하는 필터를 구비한 것을 특징으로 하는 액공급장치.
  4. 제2항에 있어서, 상기 처리액 토출수단은, 상기 처리액을 토출하는 노즐과, 상기 노즐의 측편으로 연장하도록 설치된 플랜지와, 상기 플랜지의 상기 컵과 대향하는 위치에 설치된 밀폐부재와를 구비하고, 상기 컵에 대하여 처리액을 토출할 때 상기 컵내를 밀폐하도록 한 것을 특징으로 하는 액공급장치.
  5. 제2항에 있어서, 상기 처리액 토출수단은 상기 처리액을 토출하는 노즐과, 상기 노즐의 측편으로 연장하도록 설치된 플랜지와를 구비하는 동시에 상기 컵은 상기 플랜지와 대향하는 위치에 밀폐부재를 구비하고, 상기 컵에 대하여 처리액을 토출할 때 상기 컵내를 밀폐하도록 한 것을 특징으로 하는 액공급장치.
  6. 제2항, 제3항, 제4항, 또는 제5항에 있어서, 상기 컵에 질소가스를 도입하는 파이프를 연결하도록 한 것을 특징으로 하는 액공급장치.
  7. 제2항, 제3항, 제4항, 제5항 또는 제6항에 있어서, 상기 처리액 토출수단은 상기처리액을 토출하는 토출구가 메시형태로 형성된 것을 특징으로 하는 액공급장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019950034513A 1994-10-13 1995-10-09 액공급장치 KR960015776A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP94-275954 1994-10-13
JP6275954A JPH08108125A (ja) 1994-10-13 1994-10-13 液供給装置

Publications (1)

Publication Number Publication Date
KR960015776A true KR960015776A (ko) 1996-05-22

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ID=17562744

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Application Number Title Priority Date Filing Date
KR1019950034513A KR960015776A (ko) 1994-10-13 1995-10-09 액공급장치

Country Status (4)

Country Link
US (1) US5778911A (ko)
JP (1) JPH08108125A (ko)
KR (1) KR960015776A (ko)
CN (1) CN1137948A (ko)

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Also Published As

Publication number Publication date
CN1137948A (zh) 1996-12-18
US5778911A (en) 1998-07-14
JPH08108125A (ja) 1996-04-30

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