KR960009023A - Photosensitive film pattern formation method - Google Patents
Photosensitive film pattern formation method Download PDFInfo
- Publication number
- KR960009023A KR960009023A KR1019940020657A KR19940020657A KR960009023A KR 960009023 A KR960009023 A KR 960009023A KR 1019940020657 A KR1019940020657 A KR 1019940020657A KR 19940020657 A KR19940020657 A KR 19940020657A KR 960009023 A KR960009023 A KR 960009023A
- Authority
- KR
- South Korea
- Prior art keywords
- photosensitive film
- film pattern
- forming
- decane
- silicon
- Prior art date
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- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
본 발명은 반도체 소자의 감광막 패턴을 형성방법에 관한 것으로, DESIRE 공정방법으로 감광막 패턴을 형성할때 실리레이션 용액으로 인체에 유해하지 않은 안전한 용액인 n-데칸(decane)이나 n-헵탄(heptane)을 사용하고, 확산 촉진제로 PGMEA(propylene glyxol methyl ether acetate)를 사용하여 작업자의 안전성을 향상시키고, 미세패턴에서 해상도 및 촛점심도를 증가시킬 수 있는 기술이다.The present invention relates to a method of forming a photosensitive film pattern of a semiconductor device, n-decane (n-decane) or n-heptane (safe), which is a safe solution that is not harmful to the human body when the photosensitive film pattern is formed by the DESIRE process method It is a technology that can improve the safety of the operator by using PGMEA (propylene glyxol methyl ether acetate) as a diffusion promoter, and to increase the resolution and depth of focus in the fine pattern.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제1도 내지 제3도는 DESIRE 공정 방법으로 감광막 패턴을 형성하는 단계를 도시한 단면도.1 to 3 are cross-sectional views illustrating a step of forming a photoresist pattern by the DESIRE process method.
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940020657A KR960009023A (en) | 1994-08-22 | 1994-08-22 | Photosensitive film pattern formation method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940020657A KR960009023A (en) | 1994-08-22 | 1994-08-22 | Photosensitive film pattern formation method |
Publications (1)
Publication Number | Publication Date |
---|---|
KR960009023A true KR960009023A (en) | 1996-03-22 |
Family
ID=66698278
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019940020657A KR960009023A (en) | 1994-08-22 | 1994-08-22 | Photosensitive film pattern formation method |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR960009023A (en) |
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1994
- 1994-08-22 KR KR1019940020657A patent/KR960009023A/en not_active Application Discontinuation
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