KR960002639A - Method for forming BPSG film of semiconductor device - Google Patents
Method for forming BPSG film of semiconductor device Download PDFInfo
- Publication number
- KR960002639A KR960002639A KR1019940013499A KR19940013499A KR960002639A KR 960002639 A KR960002639 A KR 960002639A KR 1019940013499 A KR1019940013499 A KR 1019940013499A KR 19940013499 A KR19940013499 A KR 19940013499A KR 960002639 A KR960002639 A KR 960002639A
- Authority
- KR
- South Korea
- Prior art keywords
- semiconductor device
- bpsg film
- forming
- bpsg
- atoms
- Prior art date
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- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Formation Of Insulating Films (AREA)
Abstract
본 발명은 반도체 소자의 BPSG막 형성방법에 관한 것으로, BPSG증착시 P원자의 농도가 B원자의 농도에 비해 과도하게 첨가됨으로 인해 플로우 공정시 발생되는 결정결함을 방지하기 위하여 소오스 가스(Source Gas)의 량을 소정의 비율로 조절하여 BPSG를 증착(Deposition) 시키므로써 상부에 형성되는 금속층의 스텝커버리지 및 질이 개선되어 소자의 전기적 특성을 향상시킬 수 있도록 한 반도체 소자의 BPSG막 형성방법에 관한 것이다.The present invention relates to a method for forming a BPSG film of a semiconductor device, source gas in order to prevent crystal defects generated during the flow process due to the excessive addition of P atoms in the BPSG deposition compared to the concentration of B atoms. The present invention relates to a method for forming a BPSG film of a semiconductor device in which the step coverage and quality of a metal layer formed thereon are improved by controlling the amount of the compound at a predetermined ratio, thereby improving the electrical characteristics of the device. .
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제2도는 본 발명에 의해 형성된 BPSG막을 갖는 소자의 단면도.2 is a cross-sectional view of a device having a BPSG film formed by the present invention.
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940013499A KR960002639A (en) | 1994-06-15 | 1994-06-15 | Method for forming BPSG film of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940013499A KR960002639A (en) | 1994-06-15 | 1994-06-15 | Method for forming BPSG film of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
KR960002639A true KR960002639A (en) | 1996-01-26 |
Family
ID=66685743
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019940013499A KR960002639A (en) | 1994-06-15 | 1994-06-15 | Method for forming BPSG film of semiconductor device |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR960002639A (en) |
-
1994
- 1994-06-15 KR KR1019940013499A patent/KR960002639A/en not_active Application Discontinuation
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Legal Events
Date | Code | Title | Description |
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A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E601 | Decision to refuse application |