KR950021341A - 정전척크 부착 세라믹 히터 - Google Patents

정전척크 부착 세라믹 히터 Download PDF

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Publication number
KR950021341A
KR950021341A KR1019940037553A KR19940037553A KR950021341A KR 950021341 A KR950021341 A KR 950021341A KR 1019940037553 A KR1019940037553 A KR 1019940037553A KR 19940037553 A KR19940037553 A KR 19940037553A KR 950021341 A KR950021341 A KR 950021341A
Authority
KR
South Korea
Prior art keywords
electrostatic chuck
ceramic
ceramic heater
electrode
coating layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
KR1019940037553A
Other languages
English (en)
Korean (ko)
Inventor
노부오 가와다
도시히꼬 신도오
다따아끼 나가오
다께시 가께가와
주니찌 아라미
겐지 이시까와
Original Assignee
가나까와 지히로
신에쓰가가꾸고오교 가부시끼가이샤
이노우에 아끼라
도오꾜엘렉트론 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가나까와 지히로, 신에쓰가가꾸고오교 가부시끼가이샤, 이노우에 아끼라, 도오꾜엘렉트론 가부시끼가이샤 filed Critical 가나까와 지히로
Publication of KR950021341A publication Critical patent/KR950021341A/ko
Abandoned legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H01L21/6833Details of electrostatic chucks

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Resistance Heating (AREA)
  • Ceramic Products (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Jigs For Machine Tools (AREA)
KR1019940037553A 1993-12-27 1994-12-27 정전척크 부착 세라믹 히터 Abandoned KR950021341A (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP33087993 1993-12-27
JP93-330879 1993-12-27
JP31639694A JPH07297267A (ja) 1993-12-27 1994-12-20 静電チャック付セラミックスヒーター
JP94-316396 1994-12-20

Publications (1)

Publication Number Publication Date
KR950021341A true KR950021341A (ko) 1995-07-26

Family

ID=26568639

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940037553A Abandoned KR950021341A (ko) 1993-12-27 1994-12-27 정전척크 부착 세라믹 히터

Country Status (3)

Country Link
JP (1) JPH07297267A (enExample)
KR (1) KR950021341A (enExample)
TW (1) TW289129B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100477388B1 (ko) * 2002-08-26 2005-03-17 주성엔지니어링(주) 웨이퍼 공정용 히터블록

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE202011000090U1 (de) 2011-01-14 2011-04-21 E-LEAD ELECTRONIC CO., LTD., Shengang Shiang Fahrzeug-Audiosystem mit auswechselbarem Plug-In-Computer
US10917942B2 (en) 2017-07-31 2021-02-09 Samsung Electronics Co., Ltd. Structure, planar heater including the same, heating device including the planar heater, and method of preparing the structure

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2638649B2 (ja) * 1989-12-22 1997-08-06 東京エレクトロン株式会社 静電チャック
JPH0750736B2 (ja) * 1990-12-25 1995-05-31 日本碍子株式会社 ウエハー加熱装置及びその製造方法
JP3081279B2 (ja) * 1991-06-03 2000-08-28 電気化学工業株式会社 ホットプレート
JPH0513555A (ja) * 1991-07-01 1993-01-22 Toto Ltd 静電チヤツク及び静電チヤツクに対する電圧印加方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100477388B1 (ko) * 2002-08-26 2005-03-17 주성엔지니어링(주) 웨이퍼 공정용 히터블록

Also Published As

Publication number Publication date
JPH07297267A (ja) 1995-11-10
TW289129B (enExample) 1996-10-21

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Legal Events

Date Code Title Description
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 19941227

PG1501 Laying open of application
A201 Request for examination
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 19970310

Comment text: Request for Examination of Application

Patent event code: PA02011R01I

Patent event date: 19941227

Comment text: Patent Application

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

Patent event code: PE07011S01D

Comment text: Decision to Grant Registration

Patent event date: 19990831

NORF Unpaid initial registration fee
PC1904 Unpaid initial registration fee