KR940023548U - 이온주입기의 웨이퍼 쿨링장치 - Google Patents

이온주입기의 웨이퍼 쿨링장치

Info

Publication number
KR940023548U
KR940023548U KR2019930004788U KR930004788U KR940023548U KR 940023548 U KR940023548 U KR 940023548U KR 2019930004788 U KR2019930004788 U KR 2019930004788U KR 930004788 U KR930004788 U KR 930004788U KR 940023548 U KR940023548 U KR 940023548U
Authority
KR
South Korea
Prior art keywords
cooling device
wafer cooling
ion injector
injector
ion
Prior art date
Application number
KR2019930004788U
Other languages
English (en)
Other versions
KR950009255Y1 (ko
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to KR2019930004788U priority Critical patent/KR950009255Y1/ko
Publication of KR940023548U publication Critical patent/KR940023548U/ko
Application granted granted Critical
Publication of KR950009255Y1 publication Critical patent/KR950009255Y1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge clamping, e.g. clamping ring
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/002—Cooling arrangements

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
KR2019930004788U 1993-03-29 1993-03-29 이온주입기의 웨이퍼 쿨링장치 KR950009255Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019930004788U KR950009255Y1 (ko) 1993-03-29 1993-03-29 이온주입기의 웨이퍼 쿨링장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019930004788U KR950009255Y1 (ko) 1993-03-29 1993-03-29 이온주입기의 웨이퍼 쿨링장치

Publications (2)

Publication Number Publication Date
KR940023548U true KR940023548U (ko) 1994-10-22
KR950009255Y1 KR950009255Y1 (ko) 1995-10-23

Family

ID=19352828

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019930004788U KR950009255Y1 (ko) 1993-03-29 1993-03-29 이온주입기의 웨이퍼 쿨링장치

Country Status (1)

Country Link
KR (1) KR950009255Y1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010027090A (ko) * 1999-09-10 2001-04-06 김영환 반도체소자 제조를 위한 웨이퍼 식각용 정전척의 냉각장치

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010027090A (ko) * 1999-09-10 2001-04-06 김영환 반도체소자 제조를 위한 웨이퍼 식각용 정전척의 냉각장치

Also Published As

Publication number Publication date
KR950009255Y1 (ko) 1995-10-23

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Legal Events

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A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20040920

Year of fee payment: 10

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