KR940003877A - 유리에칭 조성물과 그를 이용한 유리표면의 에칭 방법 - Google Patents
유리에칭 조성물과 그를 이용한 유리표면의 에칭 방법 Download PDFInfo
- Publication number
- KR940003877A KR940003877A KR1019920014675A KR920014675A KR940003877A KR 940003877 A KR940003877 A KR 940003877A KR 1019920014675 A KR1019920014675 A KR 1019920014675A KR 920014675 A KR920014675 A KR 920014675A KR 940003877 A KR940003877 A KR 940003877A
- Authority
- KR
- South Korea
- Prior art keywords
- weight
- parts
- glass
- solution
- etching
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B15/00—Drawing glass upwardly from the melt
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31105—Etching inorganic layers
- H01L21/31111—Etching inorganic layers by chemical means
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Surface Treatment Of Glass Fibres Or Filaments (AREA)
- Detergent Compositions (AREA)
Abstract
본 발명은, 정제 글리세린 100중량부에 25내지 35중량부의 설탕, 물엿, 조청 또는 꿀을 첨가하여 중탕하고 여기에 25내지 35중량부의 불화수소 암모늄을 첨가한 뒤 이를 실온에서 냉각시켜서 제1용액을 준비하고, 정제 글리세린 100중량부를 중탕한 후 여기에 25내지 35중량부의 불화수소암모늄을 첨가하고 이어서 10 내지 15중량부의 염화 제이철을 첨가하여 불화수소 암모늄을 분쇄시킨 뒤 이를 실온에서 냉각시켜 불화수소 암모늄의 분쇄물을 침적시키고 이 침적물을 제거하여 제2용액을 준비한 다음, 상기 제1용액과 상기 제2용액을 1:1 내지 2:1의 중량비로 혼합하여서된 저독성 및 저공해성의 유리에칭 조성물과; 그러한 유리에칭 조성물을 이용하여 통상적인 방법에 따라 유리표면을 에칭하는 방법을 제공하는 것이다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (3)
- (가)정제 글리세린 1000중량부에 25내지 35중량부의 설탕, 물엿, 조청 또는꿀을 첨가하여 중탕히고, 여기에 25내지 35중량부의 불화수소 암모늄을 첨가한 뒤, 이를 실온에서 냉각시켜서 제1용액을 준비하고 (나) 정제 글리세린 100중량부를 중탕한 후, 여기에 25내지 35중량부의 불화수소암모늄을 첨가하고, 이어서 10내지 15중량부의 연화제이철을 첨가하여 불화수소암모늄을 분쇄시킨 뒤, 이를 실온에서 냉각시켜 불화수소 암모늄의 분쇄물을 침적시키고, 이 침적물을 제거하여, 제2용액을 준비한 다음, (다) 상기 제1용액과 상기 제2용액을 1:1 내지 2:1의 중량비로 혼합하여서 된 유리에칭 조성물.
- 제1항에 있어서, 상기 1용액과 상기 제2용액의 혼합물에 물을 추가로 첨가함을 특징으로 하는 유리에칭 조성물.
- 유리표면을 수세하고, 필요에 따라서는 유리표면의 일부를 내부식성 물질로 보호한 다음, 이렇게 처리된 유리를 에칭 조성물로 처리하여 유리표면을 에칭시키는데 있어서, 상기 에칭용액으로서 제1항의 조성물을 사용하는 것을 특징으로하는 유리표면의 에칭방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019920014675A KR950002233B1 (ko) | 1992-08-14 | 1992-08-14 | 유리에칭 조성물과 그를 이용한 유리표면의 에칭 방법 |
US07/968,951 US5281350A (en) | 1992-08-14 | 1992-10-30 | Glass etching composition |
EP93306407A EP0586126A1 (en) | 1992-08-14 | 1993-08-13 | Glass etching composition and method |
CA002104087A CA2104087A1 (en) | 1992-08-14 | 1993-08-13 | Glass etching composition and method |
JP5202244A JPH085694B2 (ja) | 1992-08-14 | 1993-08-16 | ガラスエッチングの組成物及び方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019920014675A KR950002233B1 (ko) | 1992-08-14 | 1992-08-14 | 유리에칭 조성물과 그를 이용한 유리표면의 에칭 방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR940003877A true KR940003877A (ko) | 1994-03-12 |
KR950002233B1 KR950002233B1 (ko) | 1995-03-15 |
Family
ID=19338003
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019920014675A KR950002233B1 (ko) | 1992-08-14 | 1992-08-14 | 유리에칭 조성물과 그를 이용한 유리표면의 에칭 방법 |
Country Status (5)
Country | Link |
---|---|
US (1) | US5281350A (ko) |
EP (1) | EP0586126A1 (ko) |
JP (1) | JPH085694B2 (ko) |
KR (1) | KR950002233B1 (ko) |
CA (1) | CA2104087A1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20040042243A (ko) * | 2002-11-13 | 2004-05-20 | 박진국 | 유리표면의 반투명 처리용 부식액조성물과 이를 이용한저반사처리방법 |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR960010586B1 (ko) * | 1993-07-03 | 1996-08-06 | 김중형 | 무반사 유리 에칭 방법 및 그를 위한 조성물 |
US5695661A (en) | 1995-06-07 | 1997-12-09 | Micron Display Technology, Inc. | Silicon dioxide etch process which protects metal |
TW434196B (en) | 1997-06-25 | 2001-05-16 | Ibm | Selective etching of silicate |
US6337029B1 (en) | 1999-01-21 | 2002-01-08 | Xim Products | Method and composition for etching glass ceramic and porcelain surfaces |
AU4314600A (en) * | 1999-04-27 | 2000-11-10 | Hiroshi Miwa | Glass etching composition and method for frosting using the same |
DE10101926A1 (de) * | 2000-04-28 | 2001-10-31 | Merck Patent Gmbh | Ätzpasten für anorganische Oberflächen |
FR2809722B1 (fr) | 2000-05-31 | 2003-01-03 | Seppic Sa | Nouveau procede de depolissage chimique du verre comprenant un rincage avec une solution saline et objets depolis obtenus par ce procede |
WO2002053508A1 (fr) * | 2000-12-27 | 2002-07-11 | Hiroshi Miwa | Procede de preparation de verre decoratif au moyen d'une composition de gravure sur verre |
DE10104726A1 (de) * | 2001-02-02 | 2002-08-08 | Siemens Solar Gmbh | Verfahren zur Strukturierung einer auf einem Trägermaterial aufgebrachten Oxidschicht |
DE10150040A1 (de) | 2001-10-10 | 2003-04-17 | Merck Patent Gmbh | Kombinierte Ätz- und Dotiermedien |
TW200939509A (en) * | 2007-11-19 | 2009-09-16 | Applied Materials Inc | Crystalline solar cell metallization methods |
US7888168B2 (en) * | 2007-11-19 | 2011-02-15 | Applied Materials, Inc. | Solar cell contact formation process using a patterned etchant material |
TWI390756B (zh) | 2008-07-16 | 2013-03-21 | Applied Materials Inc | 使用摻質層遮罩之混合異接面太陽能電池製造 |
WO2010025262A2 (en) * | 2008-08-27 | 2010-03-04 | Applied Materials, Inc. | Back contact solar cells using printed dielectric barrier |
CN104011882A (zh) | 2012-01-12 | 2014-08-27 | 应用材料公司 | 制造太阳能电池装置的方法 |
JP6242902B2 (ja) | 2012-09-20 | 2017-12-06 | スイスインソ・ホールディング・インコーポレイテッド | 太陽エネルギーシステムに適した着色反射および高日射透過率を有する積層グレージング(laminatedglazing) |
US11745473B2 (en) | 2012-09-20 | 2023-09-05 | Kromatix SA | Laminated glazing with coloured reflection and high solar transmittance, and solar energy systems employing the same |
JP6543436B2 (ja) * | 2013-09-02 | 2019-07-10 | 株式会社堀場製作所 | ガラス電極の応答ガラス用洗浄キット及びガラス電極の応答ガラス洗浄方法 |
KR101717259B1 (ko) * | 2016-01-19 | 2017-03-17 | 주식회사 가인공영 | 난반사 유리 제조용 에칭액 조성물 및 그 제조방법 |
WO2018124666A1 (ko) * | 2016-12-29 | 2018-07-05 | 코닝 인코포레이티드 | 글라스 에칭 조성물 및 방현 글라스 제조방법 |
US20190322573A1 (en) * | 2016-12-29 | 2019-10-24 | Corning Incorporated | Glass etching composition and method of manufacturing anti-glare glass |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE153360C (ko) * | ||||
GB302582A (en) * | 1927-12-17 | 1929-12-12 | Elek Sche Glulampenfabrik Watt | Improvements in and relating to a process for matting the interior surface of hollowglass bodies |
NL302162A (ko) * | 1963-01-18 | |||
US3616098A (en) * | 1968-03-18 | 1971-10-26 | Dearborn Glass Co | Method of producing glare-reducing glass surface |
US3642549A (en) * | 1969-01-15 | 1972-02-15 | Ibm | Etching composition indication |
US3551228A (en) * | 1969-10-06 | 1970-12-29 | Rose Meth | Glass etching composition and method of preparing nonreflective glass |
US3769113A (en) * | 1971-04-01 | 1973-10-30 | Conrad Schmitt Studios Inc | Method of etching glass |
JPS5361968A (en) * | 1976-11-15 | 1978-06-02 | Fujitsu Ltd | Production of semiconductor device |
US4781792A (en) * | 1985-05-07 | 1988-11-01 | Hogan James V | Method for permanently marking glass |
JPH01125831A (ja) * | 1987-11-10 | 1989-05-18 | Minolta Camera Co Ltd | エッチング液及びエッチング方法 |
US4921626A (en) * | 1989-08-23 | 1990-05-01 | Automark Corporation | Glass etching composition and method of making |
HUT68365A (en) * | 1991-04-17 | 1995-06-28 | Ristau | Device and method for protecting against theft of motor vehicles and etchant for executing the method |
-
1992
- 1992-08-14 KR KR1019920014675A patent/KR950002233B1/ko not_active IP Right Cessation
- 1992-10-30 US US07/968,951 patent/US5281350A/en not_active Expired - Fee Related
-
1993
- 1993-08-13 CA CA002104087A patent/CA2104087A1/en not_active Abandoned
- 1993-08-13 EP EP93306407A patent/EP0586126A1/en not_active Withdrawn
- 1993-08-16 JP JP5202244A patent/JPH085694B2/ja not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20040042243A (ko) * | 2002-11-13 | 2004-05-20 | 박진국 | 유리표면의 반투명 처리용 부식액조성물과 이를 이용한저반사처리방법 |
Also Published As
Publication number | Publication date |
---|---|
JPH0717743A (ja) | 1995-01-20 |
CA2104087A1 (en) | 1994-02-15 |
KR950002233B1 (ko) | 1995-03-15 |
US5281350A (en) | 1994-01-25 |
JPH085694B2 (ja) | 1996-01-24 |
EP0586126A1 (en) | 1994-03-09 |
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A201 | Request for examination | ||
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E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 19980310 Year of fee payment: 4 |
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LAPS | Lapse due to unpaid annual fee |