KR940001309A - Rigid Wafer Cleaner - Google Patents

Rigid Wafer Cleaner Download PDF

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Publication number
KR940001309A
KR940001309A KR1019920011472A KR920011472A KR940001309A KR 940001309 A KR940001309 A KR 940001309A KR 1019920011472 A KR1019920011472 A KR 1019920011472A KR 920011472 A KR920011472 A KR 920011472A KR 940001309 A KR940001309 A KR 940001309A
Authority
KR
South Korea
Prior art keywords
cleaning
washing
inner cylinder
discharge pipe
tank
Prior art date
Application number
KR1019920011472A
Other languages
Korean (ko)
Other versions
KR950007964B1 (en
Inventor
고용선
오영선
유선일
Original Assignee
김광호
삼성전자주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자주식회사 filed Critical 김광호
Priority to KR1019920011472A priority Critical patent/KR950007964B1/en
Publication of KR940001309A publication Critical patent/KR940001309A/en
Application granted granted Critical
Publication of KR950007964B1 publication Critical patent/KR950007964B1/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

본 발명은 하나의 세정조 안에서 서로 다른 세정 용액들을 사용하는 모든 세정 처리는 물론 세척 및 건조 공정까지도 연속적으로 처리할 수 있는 일조식 세정 장치이다. 따라서, 종래의 세정 설비를 대신할 수 있는 경제성 및 실용성을 두루 갖춘 장치이다.The present invention is a solar type washing apparatus capable of continuously processing all washing treatments using different cleaning solutions in one washing tank as well as washing and drying processes. Therefore, it is an apparatus equipped with economical efficiency and practicality which can replace the conventional washing | cleaning installation.

Description

일조식 웨이퍼 세정장치Rigid Wafer Cleaner

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제2도는 본 발명에 따른 웨이퍼 세정장치의 블럭도이다.2 is a block diagram of a wafer cleaning apparatus according to the present invention.

Claims (4)

각종 세정이 진행되는 내통과 이 내통을 소정 간격을 갖고 둘러싸는 외통으로 이루어진 세정조, 상기 내용 내외로 웨이퍼를 이송하기 위해 로봇 팔이 부착된 자동 이송기, 상기 자동 이송기의 출입을 통제하기 위해 상기 외통의 상부에 설치된 도어, 상기 세정조의 내통으로 세정액 및 세척액을 공급하기 위해 희석조와 내통사이에 연결된 다수의 세정액 및 세척액 공급관, 상기 내통으로부터 오버플로우 되는 세정 및 세척액을 배출하기 위해 설치된 외측 배출관, 상기 내통에 남은 잔류 세정 및 세척액을 배출하기 위한 내측 배출관, 및 상기 외측 배출관과 내측 배출관에 연결되어 상기 웨이퍼 표면에 남아 있는 잔류 물기를 제거하기 위해 상기 세정조 내부를 감압 상태로 하기 위한 어스피레이터(aspirator)로 구성되어 하나의 세정조내에서 모든 세정처리는 물론 세척 및 건조까지도 처리한는 것을 특징으로 하는 일조식 웨이퍼 세정장치.A cleaning tank consisting of an inner cylinder through which various washings are carried out and an outer cylinder surrounding the inner cylinder at predetermined intervals, an automatic conveyor with a robot arm for transferring wafers into and out of the contents, and for controlling access of the automatic conveyor. A door installed at an upper portion of the outer cylinder, a plurality of washing liquids and washing liquid supply pipes connected between the dilution tank and the inner cylinder to supply the washing liquid and the washing liquid to the inner cylinder of the washing tank, an outer discharge pipe installed to discharge the washing and washing liquid overflowed from the inner cylinder, An inner discharge pipe for discharging the remaining cleaning liquid and the cleaning liquid remaining in the inner cylinder, and an aspirator connected to the outer discharge pipe and the inner discharge pipe to depressurize the inside of the cleaning tank to remove residual water remaining on the wafer surface; consisting of an aspirator, all cleaning stations in one cleaning bath As well as one breakfast wafer cleaning apparatus, characterized in that an an even treatment for cleaning and drying. 제1항에 있어서, 상기 세정할 웨이퍼는 치공구로부터의 역오염을 방지하기 위하여 카셋트(cassette)를 사용하지 않는 것을 특징으로 하는 일조식 웨이퍼 세정장치.The apparatus of claim 1, wherein the wafer to be cleaned does not use a cassette to prevent back contamination from the tool. 제1항에 있어서, 상기 일 또는 그 이상의 세척액 공급관은 적어도 하나의 냉(cold) 탈이온수와 온(hot) 탈이온수를 공급할 수 있도록 구성된 것을 특징으로 하는 일조식 웨이퍼 세정장치.The apparatus of claim 1, wherein the one or more cleaning solution supply pipes are configured to supply at least one cold deionized water and hot deionized water. 제1항에 있어서, 상기 도어에는 최종 건조를 위하여 적외선 히터가 부착된 것을 특징으로 하는 일조식 웨이퍼 세정장치.The solar wafer cleaning apparatus according to claim 1, wherein an infrared heater is attached to the door for final drying. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019920011472A 1992-06-29 1992-06-29 Cleaning apparatus of wafer KR950007964B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019920011472A KR950007964B1 (en) 1992-06-29 1992-06-29 Cleaning apparatus of wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019920011472A KR950007964B1 (en) 1992-06-29 1992-06-29 Cleaning apparatus of wafer

Publications (2)

Publication Number Publication Date
KR940001309A true KR940001309A (en) 1994-01-11
KR950007964B1 KR950007964B1 (en) 1995-07-21

Family

ID=19335514

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019920011472A KR950007964B1 (en) 1992-06-29 1992-06-29 Cleaning apparatus of wafer

Country Status (1)

Country Link
KR (1) KR950007964B1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010094349A (en) * 2000-03-30 2001-11-01 박종섭 Equipment for cleansing of wafer and method for cleansing of wafer

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100840005B1 (en) * 2007-03-12 2008-06-20 (주) 디바이스이엔지 Door of vertical tube cleaner having drain guide

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010094349A (en) * 2000-03-30 2001-11-01 박종섭 Equipment for cleansing of wafer and method for cleansing of wafer

Also Published As

Publication number Publication date
KR950007964B1 (en) 1995-07-21

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