KR200177326Y1 - Apparatus for recovering di water of semiconductor rinse bath - Google Patents

Apparatus for recovering di water of semiconductor rinse bath Download PDF

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Publication number
KR200177326Y1
KR200177326Y1 KR2019970033478U KR19970033478U KR200177326Y1 KR 200177326 Y1 KR200177326 Y1 KR 200177326Y1 KR 2019970033478 U KR2019970033478 U KR 2019970033478U KR 19970033478 U KR19970033478 U KR 19970033478U KR 200177326 Y1 KR200177326 Y1 KR 200177326Y1
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KR
South Korea
Prior art keywords
rinse
pipe
rinse liquid
acidity
semiconductor
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KR2019970033478U
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Korean (ko)
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KR19990020074U (en
Inventor
김정태
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김영환
현대반도체주식회사
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Priority to KR2019970033478U priority Critical patent/KR200177326Y1/en
Publication of KR19990020074U publication Critical patent/KR19990020074U/en
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Publication of KR200177326Y1 publication Critical patent/KR200177326Y1/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking

Abstract

본 고안은 반도체 린스조의 린스액 재활용장치에 관한 것으로, 종래에는 린스조에 사용되는 린스액이 재사용 가능여부에 관계없이 전량 폐기하여 원가절감에 한계가 있는 문제점이 있었다. 본 고안 반도체 린스조의 린스액 재활용장치는 산도검출센서(16)에서 배출되는 린스액(13)의 산도를 측정하여, 회수 또는 폐수처리할 수 있도록 함으로써, 종래와 같이 전량 폐수처리하는 경우보다 생산원가가 절감되는 효과가 있다.The present invention relates to a rinse liquid recycling apparatus of a semiconductor rinse tank, conventionally, there was a problem that the cost reduction by limiting the cost reduction by discarding the entire rinse liquid used in the rinse tank. The rinse liquid recycling apparatus of the semiconductor rinsing tank of the present invention measures the acidity of the rinse liquid 13 discharged from the acidity detection sensor 16 so that recovery or wastewater treatment can be performed, and thus, the production cost of the rinse liquid recycling system as compared to conventional wastewater treatment. Has the effect of reducing.

Description

반도체 린스조의 린스액 재활용장치Semiconductor Rinse Tank Rinse Liquid Recycling Equipment

본 고안은 반도체 린스조의 린스액 재활용장치에 관한 것으로, 특히 일정 기준치 이상의 양호한 린스액을 재횔용하여 생산원가를 절감할 수 있도록 하는데 적합한 반도체 린스조의 린스액 재활용장치에 관한 것이다.The present invention relates to a rinse liquid recycling apparatus of a semiconductor rinse tank, and more particularly, to a rinse liquid recycling apparatus of a semiconductor rinse tank suitable for reducing the production cost by recycling a good rinse liquid above a certain reference value.

일반적으로 반도체 웨이퍼 세정장치는 제1도에 도시된 바와 같이, SC-1조(1) 2개의 린스조(2), HF조(3) 3개의 린스조(2), 건조장치(4)가 나열설치된 구조로 되어 있어서, 상기 로봇암으로 웨이퍼들을 이동하며 세정을 실시할 수 있도록 되어 있다.In general, as shown in FIG. 1, a semiconductor wafer cleaning apparatus includes two rinse tanks (2), two rinse tanks (H), and three rinse tanks (2) and a drying apparatus (4). The structure is arranged so that the wafer can be moved to the robot arm for cleaning.

제2도에 도시되어 있는 바와 같이, 상기 린조조(2)는 싱크대(5)의 내측에 린스용기(6)가 설치되어 있고, 상기 린스용기(6)의 하부에는 린스액공급관(7)이 설치되어 있으며, 상기 싱크대(5)의 하부로는 배액배관(8)어 설치되어 있어서, 린스작업시에는 웨이퍼를 상기 린스용기(6)에 넣고, 상기 린스액공급관(7)으로 린스액을 공급하면 웨이퍼를 린스한 다음, 싱크대(5)로 오버 플로우되어 배액배관(8)을 통하여 배출되었다.As shown in FIG. 2, the rinse tank 2 is provided with a rinse container 6 inside the sink 5, and a rinse liquid supply pipe 7 is provided below the rinse container 6. The drainage pipe 8 is installed in the lower part of the sink 5, and during the rinsing operation, the wafer is placed in the rinse container 6, and the rinse liquid is supplied to the rinse liquid supply pipe 7. The wafer was rinsed on the lower surface and then overflowed to the sink 5 and discharged through the drain pipe 8.

그러나, 상기와 같은 종래 반도체 린스조는 1회 린스작업을 실시한 린스액은 경우에 따라 재사용 할 수 있는데, 전부 페수처리함으로서 원가상승의 원인이 되는 문제점이 있었다.However, in the conventional semiconductor rinse bath as described above, the rinse liquid which has been rinsed once can be reused in some cases, but all waste water treatment causes a problem of cost increase.

상기와 같은 문제점을 감안하여 안출한 본 고안의 목적은 배출되는 린스액 중 재사용이 가능한 일정 기준치 이상의 린스액을 선별적으로 재사용할 수 있도록하여 생산원가를 절감할 수 있도록 하는데 적합한 반도체 린스조의 린스액 재활용장치를 제공함에 있다.The object of the present invention devised in view of the above problems is that a semiconductor rinse bath rinse solution suitable for reducing the production cost by selectively reusing a rinse solution above a predetermined standard value that can be reused among the rinse liquids discharged. To provide a recycling device.

제1도는 종래 반도체 웨이퍼 세정장비의 구성을 개략적으로 보인 정면도.1 is a front view schematically showing the configuration of a conventional semiconductor wafer cleaning equipment.

제2도는 종래 린즈조의 구성을 보인 종단면도.Figure 2 is a longitudinal sectional view showing the configuration of a conventional rinse tank.

제3도는 본 고안 린스액 재활용장치가 설치된 린스조의 구성을 보인 종단면도.Figure 3 is a longitudinal cross-sectional view showing the configuration of a rinse tank in which the rinsing liquid recycling apparatus of the present invention is installed.

* 도면의 주요부분에 대한 부호의 설명* Explanation of symbols for main parts of the drawings

11 : 싱크대 12 : 린스용기11: sink 12: rinse container

14 : 린스액공급관 15 : 배액배관14: rinse liquid supply pipe 15: drainage piping

16 : 산도검출센서 17 : 폐수처리관16: acidity detection sensor 17: wastewater treatment pipe

18 : 재활용관 19 : 제1밸브18: recycling pipe 19: first valve

20 : 제2밸브 21 : 메인 콘트롤러20: second valve 21: main controller

상기와 같은 본 고안의 목적을 달성하기 위하여 싱크대의 내측에 린스용기가 설치되어 있고, 린스용기의 하부에 린스액공급관이 설치되어 있으며, 상기 싱크대의 하부에 배액배관이 설치되어 있는 반도체 린스조에 있어서, 상기 배액배관 상에는 산도검출센서를 설치하고, 상기 산도검출센서가 설치된 배액배관의 하단부는 폐수처리관과 재활용배관으로 분기하며 상기 폐수처리관과 재활용배관 상에 각각 제1/제2 밸브를 설치하고, 상기 산도검출센서에서 검출된 산도에 따라 상기 제1/제2 밸브를 콘트롤 할 수 있도록 메인 콘트롤러를 연결설치하여서 구성되는 것을 특징으로 하는 반도체 린스조의 린스액 재활용장치가 제공된다.In order to achieve the object of the present invention as described above, a rinse container is installed inside the sink, a rinse liquid supply pipe is installed in the lower part of the rinse container, and in the semiconductor rinse bath in which a drainage pipe is installed in the lower part of the sink. And a pH detection sensor is installed on the drainage pipe, and a lower end of the drainage pipe where the acidity detection sensor is installed is branched into a wastewater treatment pipe and a recycling pipe, and a first / second valve is installed on the wastewater treatment pipe and the recycling pipe, respectively. In addition, the rinse liquid recycling apparatus of the semiconductor rinse tank is provided by connecting and installing the main controller to control the first / second valve according to the acidity detected by the acidity detection sensor.

이하, 상기와 같이 구성되는 본 고안 반도체 린스조의 린스액 재활용장치를 첨부된 도면의 실시예를 참고하여 보다 상세히 설명하면 다음과 같다.Hereinafter, with reference to the embodiment of the accompanying drawings the rinse liquid recycling apparatus of the present invention rinsing tank configured as described above in more detail as follows.

제3도는 본 고안 린스액 재활용장치가 설치된 린스조의 구성을 보인 종단면도로서, 도시된 바와 같이, 본 고안 린스액 재활용장치가 설치된 린스조는 싱크대(11)의 내측에 린스용기(12)가 설치되어 있고, 그 린스용기(12)의 하부로는 린스용기(12)의 내측으로 린스액(13)을 공급하기 린스액공급관(14)이 설치되어 있으며, 상기 싱크대(11)의 하부에는 싱크대(11)로 오버 플로우된 린스액(13)을 배출하기 위한 배액배관(15)이 설치되어 있다.Figure 3 is a longitudinal cross-sectional view showing the configuration of the rinse tank in which the subject innovation rinse liquid recycling apparatus is installed, as shown, the rinse tank in which the subject rinse liquid recycling apparatus is installed is provided with a rinse container (12) inside the sink (11) The lower part of the rinse container 12 is provided with a rinse liquid supply pipe 14 for supplying a rinse liquid 13 to the inside of the rinse container 12, and a sink 11 below the sink 11. Drain pipe 15 for discharging the rinse liquid 13 overflowed to the () is provided.

그리고, 상기 배액배관(15) 상에는 린스액(13)의 산도를 측정하기 위한 산도검출센서(16)를 설치하고, 상기 산도검출센서(16)가 설치된 배액배관의 하단부를 폐기할 린스액(13)이 배출되는 폐수처리관(17)과 재활용하기 위한 린스액(13)을 배출하기 위한 재할용배관(18)으로 분기하고, 상기 폐수처리관(17)과 재활용배관(18) 상에 각각 제1/제2 밸브(19)(20)를 설치하며, 상기 산도검출센서(16)에서 검출된 산도에 따라 상기 제1/제2 밸브(19)(20)를 콘트롤 할 수 있도록 메인 콘트롤러(21)를 연결 설치하여서 구성된다.In addition, the acidity detection sensor 16 for measuring the acidity of the rinse liquid 13 is installed on the drainage pipe 15, and the rinse liquid 13 to dispose the lower end of the drainage pipe in which the acidity detection sensor 16 is installed. ) Branched into a wastewater treatment pipe 17 for discharging and a recycling pipe 18 for discharging the rinse liquid 13 for recycling, and disposed on the wastewater treatment pipe 17 and the recycling pipe 18, respectively. The main controller 21 is installed to install the first and second valves 19 and 20 and to control the first and second valves 19 and 20 according to the acidity detected by the acidity detection sensor 16. It is configured by connecting and installing).

즉, 상기 산도검출센서(16)에서 검출되는 산도에 따라, 제1 밸브(19) 또는 제2 밸브(20)를 열거나 닫을 수 있도록 되어 있다.That is, the first valve 19 or the second valve 20 can be opened or closed in accordance with the acidity detected by the acidity detection sensor 16.

상기와 같이 구성되는 본 고안 린스액 재활용장치가 설치된 반도체 린스조는 린스액공급관(14)을 통하여 린스용기(12)의 내부로 공급된 린스액이 웨이퍼를 린스한 다음, 싱크대(11)로 오버플로우되어 배액배관(15)을 통하여 배출되는데, 이때 배액배관(15) 상에 설치된 산도검출센서(16)에서 배출되는 린스액(13)의 산도를 측정한다. 그런 다음, 그 측정된 산도 값을 메인 콘트롤러(21)로 전송하여 기준치와 비교한 다음, 재사용이 가능한 경우에는 재활용배관(18) 상에 설치된 제2 밸브(20)를 열어서 회수하고, 재활용이 불가능한 경우에는 폐수처리관(17)에 설치된 제1 밸브(19)를 열어서 페수처리하게 된다.In the semiconductor rinse tank provided with the present invention rinse liquid recycling apparatus configured as described above, the rinse liquid supplied into the rinse container 12 through the rinse liquid supply pipe 14 rinses the wafer and then overflows to the sink 11. It is discharged through the drainage pipe 15, wherein the acidity of the rinse liquid 13 discharged from the acidity detection sensor 16 installed on the drainage pipe 15 is measured. Then, the measured acidity value is transmitted to the main controller 21 and compared with the reference value, and when reusable, the second valve 20 installed on the recycling pipe 18 is opened and recovered, and the recycling is impossible. In this case, wastewater treatment is performed by opening the first valve 19 installed in the wastewater treatment pipe 17.

이상에서 상세히 설명한 바와 같이, 본 고안 반도체 린스조의 린스액 재활용장치는 산도검출센서에서 배출되는 린스액의 산도를 측정하여, 회수 또는 폐수처리할 수 있도록 함으로써, 종래와 같이 전량 페수처리하는 경우보다 생산원가가 절감되는 효과가 있다.As described in detail above, the rinse liquid recycling apparatus of the present invention rinsing tank is produced by measuring the acidity of the rinse liquid discharged from the acidity detection sensor, and recovering or treating the waste water, as compared with the conventional whole amount of wastewater treatment. Cost savings

Claims (1)

싱크대의 내측에 린스용기가 설치되어 있고, 린스용기의 하부에 린스액공급관이 설치되어 있으며, 상기 싱크대의 하부에 배액배관이 설치되어 있는 반도체 린스조에 있어서, 상기 배액배관 상에는 산도검출센서를 설치하고, 상기 산도검출센서가 설치된 배액배관의 하단부는 페수처리관과 재활용배관으로 분기하며, 상기 폐수처리관과 재활용배관 상에 각각 제1/제2 밸브를 설치하고, 상기 산도검출센서에서 검출된 산도에 따라 상기 제1/제2 밸브를 콘트롤 할 수 있도록 메인 콘트롤러를 연결설치하여서 구성되는 것을 특징으로 하는 반도체 린스조의 린스액 재활용장치.In a semiconductor rinse tank having a rinse container provided inside the sink, a rinse liquid supply pipe provided at a lower part of the rinse container, and a drain pipe installed at the lower part of the sink, a pH detection sensor is installed on the drain pipe. The lower end of the drainage pipe in which the acidity detection sensor is installed is branched into a wastewater treatment pipe and a recycling pipe, and each of the first and second valves is installed on the wastewater treatment pipe and the recycling pipe, and the acidity detected by the acidity detection sensor. And a main controller connected to the main controller so as to control the first and second valves.
KR2019970033478U 1997-11-24 1997-11-24 Apparatus for recovering di water of semiconductor rinse bath KR200177326Y1 (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101071343B1 (en) 2008-12-19 2011-10-07 세메스 주식회사 An Apparatus for Processing Waste Requid and Method Thereof

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* Cited by examiner, † Cited by third party
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KR100684049B1 (en) * 2006-02-14 2007-02-16 주식회사 디엠에스 Apparatus for rinse works

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101071343B1 (en) 2008-12-19 2011-10-07 세메스 주식회사 An Apparatus for Processing Waste Requid and Method Thereof

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