KR930700695A - 금속화 장치 - Google Patents

금속화 장치

Info

Publication number
KR930700695A
KR930700695A KR1019920703166A KR920703166A KR930700695A KR 930700695 A KR930700695 A KR 930700695A KR 1019920703166 A KR1019920703166 A KR 1019920703166A KR 920703166 A KR920703166 A KR 920703166A KR 930700695 A KR930700695 A KR 930700695A
Authority
KR
South Korea
Prior art keywords
target
machine
curved
magnet
constitutes
Prior art date
Application number
KR1019920703166A
Other languages
English (en)
Korean (ko)
Inventor
프랭크 케이시
폴 알렉산더 다우닝
그라함 해롤드 엘리스
Original Assignee
원본미기재
배콤 이큅먼트 리미티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB909013498A external-priority patent/GB9013498D0/en
Priority claimed from GB909018624A external-priority patent/GB9018624D0/en
Application filed by 원본미기재, 배콤 이큅먼트 리미티드 filed Critical 원본미기재
Publication of KR930700695A publication Critical patent/KR930700695A/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
KR1019920703166A 1990-06-16 1991-06-13 금속화 장치 KR930700695A (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
GB909013498A GB9013498D0 (en) 1990-06-16 1990-06-16 Metallizing apparatus
GB9013498.2 1990-06-16
GB9018624.8 1990-08-24
GB909018624A GB9018624D0 (en) 1990-08-24 1990-08-24 Mettalizing apparatus
PCT/GB1991/000955 WO1991020091A1 (en) 1990-06-16 1991-06-13 Metallizing apparatus

Publications (1)

Publication Number Publication Date
KR930700695A true KR930700695A (ko) 1993-03-15

Family

ID=26297212

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019920703166A KR930700695A (ko) 1990-06-16 1991-06-13 금속화 장치

Country Status (4)

Country Link
EP (1) EP0535054A1 (ja)
JP (1) JPH05507765A (ja)
KR (1) KR930700695A (ja)
WO (1) WO1991020091A1 (ja)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU4855696A (en) * 1995-01-12 1996-07-31 Boc Group, Inc., The Rotatable magnetron with curved or segmented end magnets
GB2318127B (en) * 1996-10-10 2001-03-07 Gen Vacuum Equipment Ltd A vacuum process and apparatus for depositing lithium/lithium nitride coating on flexiible moving web
US6093290A (en) * 1997-05-14 2000-07-25 Canon Kabushiki Kaisha Method of generating a reciprocating plurality of magnetic fluxes on a target
US20030183518A1 (en) * 2002-03-27 2003-10-02 Glocker David A. Concave sputtering apparatus
JP4796549B2 (ja) * 2007-07-27 2011-10-19 株式会社アルバック 成膜装置及び成膜方法
CN101805889B (zh) 2009-02-13 2012-01-11 北京京东方光电科技有限公司 磁靶及具有该磁靶的磁控溅射设备
KR101794586B1 (ko) * 2011-05-23 2017-11-08 삼성디스플레이 주식회사 스퍼터링용 분할 타겟 장치 및 그것을 이용한 스퍼터링 방법
JP5915580B2 (ja) * 2013-03-29 2016-05-11 住友金属鉱山株式会社 マグネトロンスパッタリングカソード及びこれを備えたスパッタリング装置並びに該スパッタリング装置を用いたスパッタリング成膜方法
CN103334086B (zh) * 2013-07-01 2016-05-25 南昌欧菲光科技有限公司 镀膜腔用隔板
KR20170126483A (ko) * 2015-03-02 2017-11-17 토소우 에스엠디, 인크 리버스 보윙 타겟 기하 구조를 갖는 스퍼터링 타겟
CN107815637B (zh) * 2017-10-31 2019-07-16 中国工程物理研究院材料研究所 一种轴对称半封闭曲面件内表面镀层均匀增强结合的方法及其应用

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3829373A (en) * 1973-01-12 1974-08-13 Coulter Information Systems Thin film deposition apparatus using segmented target means
JPS51117933A (en) * 1975-04-10 1976-10-16 Tokuda Seisakusho Spattering apparatus
US4865710A (en) * 1988-03-31 1989-09-12 Wisconsin Alumni Research Foundation Magnetron with flux switching cathode and method of operation

Also Published As

Publication number Publication date
WO1991020091A1 (en) 1991-12-26
JPH05507765A (ja) 1993-11-04
EP0535054A1 (en) 1993-04-07

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Legal Events

Date Code Title Description
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid