KR930700695A - Metallization - Google Patents

Metallization

Info

Publication number
KR930700695A
KR930700695A KR1019920703166A KR920703166A KR930700695A KR 930700695 A KR930700695 A KR 930700695A KR 1019920703166 A KR1019920703166 A KR 1019920703166A KR 920703166 A KR920703166 A KR 920703166A KR 930700695 A KR930700695 A KR 930700695A
Authority
KR
South Korea
Prior art keywords
target
machine
curved
magnet
constitutes
Prior art date
Application number
KR1019920703166A
Other languages
Korean (ko)
Inventor
프랭크 케이시
폴 알렉산더 다우닝
그라함 해롤드 엘리스
Original Assignee
원본미기재
배콤 이큅먼트 리미티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB909013498A external-priority patent/GB9013498D0/en
Priority claimed from GB909018624A external-priority patent/GB9018624D0/en
Application filed by 원본미기재, 배콤 이큅먼트 리미티드 filed Critical 원본미기재
Publication of KR930700695A publication Critical patent/KR930700695A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

내용 없음.No content.

Description

금속화 장치Metallization

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도는 스퍼터링 장치가 끼워맞춰진 웨브감는 기계의 개략적 횡단면도,1 is a schematic cross-sectional view of a web winding machine fitted with a sputtering device,

제2도는 제1도의 스퍼터링 장치의 일부를 형성하는 표적의 개략적 사시도,FIG. 2 is a schematic perspective view of a target forming part of the sputtering apparatus of FIG.

제3도는 제1도의 스퍼터링 장치의 일부를 형성하는 자석의 부분적인 개략적 횡단면도,3 is a partial schematic cross-sectional view of a magnet forming part of the sputtering apparatus of FIG.

제4도는 제1도의 만곡된 회전표면과 스퍼터링 장치의 부분적인 개략적 횡단면도.4 is a partial schematic cross-sectional view of the curved rotating surface and sputtering apparatus of FIG.

Claims (11)

챔바, 챔바를 비우는 수단과 기층위에 물질을 스퍼터링시키는 수단을 구성하는 기층위에 원자와 분자를 쌓게하는 기계에서, 스퍼터링 수단은 긴 표적과 표적에 인접 배치된 자석 체계를 구성하고 자석체계는 표적의 긴 축방향으로 뻗어가는 자력선을 만들도록 배치된 다수의 자석을 구성하는 기계.In a machine that accumulates atoms and molecules on a substrate that constitutes a chamber, means for emptying the chamber, and means for sputtering material on the substrate, the sputtering means constitutes a long target and a magnet system positioned adjacent to the target and the magnet system is a long target. A machine comprising a plurality of magnets arranged to create an axially extending line of magnetic force. 웨브위에 물질을 스퍼터링하는 수단, 가요성 웨브를 지지하는 만곡된 회전하는 표면, 챔바와 챔바를 비우는 수단을 구성하는 긴 가요성 웨브물질을 구성하는 기층위에 원자와 분자를 쌓는 기계에서, 스퍼터링 수단은 만곡된 표면과 동심에 있는 만곡된 표면과 표적과 관련된 하나이상의 자석을 갖는 표적을 구성하는 기계.In a machine that deposits atoms and molecules on a substrate that constitutes a long flexible web material that constitutes a means of sputtering a material on the web, a curved rotating surface that supports the flexible web, and a chamber and a means of emptying the chamber, the sputtering means A machine that constructs a target having a curved surface concentric with the curved surface and one or more magnets associated with the target. 제1항에 있어서, 기층이 긴 가요성 웨브의 형태이고 만곡된 회전하는 표면이 웨브를 지지하도록 갖춰지고 표적이 만곡된 회전하는 표면과 동심적으로 배열된 만곡의 표면을 갖는 기계.The machine of claim 1, wherein the substrate is in the form of a long flexible web and the curved rotating surface is equipped to support the web and the target has a curved surface arranged concentrically with the curved rotating surface. 제2항에 있어서, 표적의 자석이 만들어진 자장의 힘의 선이 회전하는 표면의 세로축에 평행하게 만들어지도록 배열되는 기계.3. The machine of claim 2 wherein the magnet of the target is arranged such that the line of force of the magnetic field produced is made parallel to the longitudinal axis of the rotating surface. 제1항에서 4항까지중 어느 한 항에 있어서, 균일한 침전을 증진시키고 표적의 부식을 같게 하기 위해 만들어진 자장을 움직이도록 각 자석을 움직이는 수단이 갖춰지는 기계.The machine according to any one of claims 1 to 4, wherein means are provided for moving each magnet to move a magnetic field created to promote uniform precipitation and equalize the target's corrosion. 제5항에 있어서, 움직이는 수단이 회전표면의 세로축 방향으로 자석을 움직이도록 작동하는 기계.A machine according to claim 5, wherein the moving means operates to move the magnet in the direction of the longitudinal axis of the rotating surface. 제2,3,4,6항중 어느 한 항에 있어서, 만곡된 표면이 회전하는 원통형 드럼의 일부를 형성하는 기계.The machine according to claim 2, 3, 4, 6, wherein the curved surface forms part of a rotating cylindrical drum. 제7항에 있어서, 드럼이 냉각되는 기계.8. The machine of claim 7, wherein the drum is cooled. 제2항에 있어서, 표적의 각 자석이 만곡되고 표적과 동심상으로 배치되고 그 자기축의 만곡된 표면의 회전축과 동축상에 있는 기계.3. The machine of claim 2 wherein each magnet of the target is curved and disposed concentric with the target and coaxial with the axis of rotation of the curved surface of its magnetic axis. 제5항 또는 6항에 있어서, 움직이는 수단의 유압의 작용으로 슬라이드 위에서 왕복하도록 작동하고 슬라이드에 미끄러지게 배치된 지지물을 구성하는 기계.7. The machine according to claim 5 or 6, which acts to reciprocate on the slide under the action of hydraulic pressure of the moving means and constitutes a support arranged to slide on the slide. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019920703166A 1990-06-16 1991-06-13 Metallization KR930700695A (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
GB909013498A GB9013498D0 (en) 1990-06-16 1990-06-16 Metallizing apparatus
GB9013498.2 1990-06-16
GB9018624.8 1990-08-24
GB909018624A GB9018624D0 (en) 1990-08-24 1990-08-24 Mettalizing apparatus
PCT/GB1991/000955 WO1991020091A1 (en) 1990-06-16 1991-06-13 Metallizing apparatus

Publications (1)

Publication Number Publication Date
KR930700695A true KR930700695A (en) 1993-03-15

Family

ID=26297212

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019920703166A KR930700695A (en) 1990-06-16 1991-06-13 Metallization

Country Status (4)

Country Link
EP (1) EP0535054A1 (en)
JP (1) JPH05507765A (en)
KR (1) KR930700695A (en)
WO (1) WO1991020091A1 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10512326A (en) * 1995-01-12 1998-11-24 ザ ビーオーシー グループ インコーポレイテッド Rotary magnetron with curved or fan-shaped end magnet
GB2318127B (en) * 1996-10-10 2001-03-07 Gen Vacuum Equipment Ltd A vacuum process and apparatus for depositing lithium/lithium nitride coating on flexiible moving web
US6093290A (en) * 1997-05-14 2000-07-25 Canon Kabushiki Kaisha Method of generating a reciprocating plurality of magnetic fluxes on a target
US20030183518A1 (en) * 2002-03-27 2003-10-02 Glocker David A. Concave sputtering apparatus
JP4796549B2 (en) * 2007-07-27 2011-10-19 株式会社アルバック Film forming apparatus and film forming method
CN101805889B (en) 2009-02-13 2012-01-11 北京京东方光电科技有限公司 Magnetic target and magnetron sputtering device having same
KR101794586B1 (en) * 2011-05-23 2017-11-08 삼성디스플레이 주식회사 Separated target apparatus for sputtering and sputtering method using the same
JP5915580B2 (en) * 2013-03-29 2016-05-11 住友金属鉱山株式会社 Magnetron sputtering cathode, sputtering apparatus provided with the same, and sputtering film forming method using the sputtering apparatus
CN103334086B (en) * 2013-07-01 2016-05-25 南昌欧菲光科技有限公司 Plated film chamber dividing plate
WO2016140833A1 (en) * 2015-03-02 2016-09-09 Tosoh Smd, Inc. Sputtering target having reverse bowing target geometry
CN107815637B (en) * 2017-10-31 2019-07-16 中国工程物理研究院材料研究所 A kind of semiclosed curved-surface piece inner surface coating of axial symmetry uniformly enhances the method and its application of combination

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3829373A (en) * 1973-01-12 1974-08-13 Coulter Information Systems Thin film deposition apparatus using segmented target means
JPS51117933A (en) * 1975-04-10 1976-10-16 Tokuda Seisakusho Spattering apparatus
US4865710A (en) * 1988-03-31 1989-09-12 Wisconsin Alumni Research Foundation Magnetron with flux switching cathode and method of operation

Also Published As

Publication number Publication date
WO1991020091A1 (en) 1991-12-26
EP0535054A1 (en) 1993-04-07
JPH05507765A (en) 1993-11-04

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