CN107815637B - A kind of semiclosed curved-surface piece inner surface coating of axial symmetry uniformly enhances the method and its application of combination - Google Patents
A kind of semiclosed curved-surface piece inner surface coating of axial symmetry uniformly enhances the method and its application of combination Download PDFInfo
- Publication number
- CN107815637B CN107815637B CN201711046343.1A CN201711046343A CN107815637B CN 107815637 B CN107815637 B CN 107815637B CN 201711046343 A CN201711046343 A CN 201711046343A CN 107815637 B CN107815637 B CN 107815637B
- Authority
- CN
- China
- Prior art keywords
- axial symmetry
- semiclosed
- work pieces
- coating
- curve surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses physical gas-phase deposite method and its applications that a kind of semiclosed curved-surface piece inner surface coating of axial symmetry uniformly enhances combination, when purpose is to solve to carry out Glow Discharge Cleaning to the semiclosed curved-surface piece inner surface of axial symmetry using existing method, based on " Faraday cup " effect existing for field distribution, cause the ion bombardment effects in Glow Discharge Cleaning and coating process to be concentrated mainly on the oral area of the semiclosed curved-surface piece inner surface of axial symmetry, and leads to remaining position coating of the semiclosed curved-surface piece inner surface of axial symmetry and the weaker problem of matrix binding ability.The present invention changes the field distribution of the semiclosed curve surface work pieces inner surface of axial symmetry by pictograph impressed current anode, to enhance the ion bombardment effects during Glow Discharge Cleaning, obtain workpiece clean surface before plating, the binding performance of the final effectively enhancing semiclosed curve surface work pieces inner surface magnetron sputtering coating of axial symmetry.The present invention can effectively realize that the uniform enhancing between the semiclosed curve surface work pieces inner surface magnetron sputtering coating of axial symmetry and matrix is combined, and be obviously improved equipment manufacturing level.
Description
Technical field
The present invention relates to coating preparation field, especially magnetron sputtering coating binding performances to enhance field, specially a kind of
The Enhancement Method of the semiclosed curve surface work pieces inner surface magnetron sputtering coating binding performance of axial symmetry.
Background technique
Magnetron sputtering is a kind of industrialization plating layer deposition techniques, its working principles are as follows: electronics is in the orthogonal electricity of sputtering target surface
It spins in magnetic field movement, and collides with working gas (such as argon gas), making working gas ionization is ion (such as argon ion),
Ion accelerates under the electric field action of sputter cathode, and the kinetic energy of target surface is flown in capacitation, and is collided with target surface atom, and makes target
Material atom is sputtered out, and the target atom for being sputtered out deposits to workpiece surface, and forms coating.It is answered to meet engineering
With needing preferable binding performance between magnetron sputtering coating and matrix.
In magnetron sputtering coating preparation process, in order to make to have between coating and matrix preferable binding performance, usually
It needs to carry out Glow Discharge Cleaning under certain back bias voltage to matrix.During Glow Discharge Cleaning, in workpiece surface negative bias
Under the action of piezoelectric field, the ion in glow discharge plasma flies to workpiece, and bombards with workpiece surface, passes through momentum
Transmitting is to remove workpiece surface polluter, to obtain clean surface.Wherein, the ion bombardment during Glow Discharge Cleaning
It is an important factor for enhancing magnetron sputtering coating is in conjunction with matrix.
For common plane, cylindric, convex surface workpiece, ion bombardment effect in Glow Discharge Cleaning and coating process compared with
Good, magnetron sputtering coating and matrix usually have preferable binding performance.But curved-surface piece inner surface semiclosed for axial symmetry, by
During Glow Discharge Cleaning there is " Faraday cup " effect (as shown in Figure 2) in field distribution, Glow Discharge Cleaning and plated film
Ion bombardment effects in the process are concentrated mainly on the oral area of the semiclosed curved-surface piece inner surface of axial symmetry, electric field remoter away from oral area
Weaker, ion bombardment effect is poorer, and then causes coating weaker in conjunction with matrix, in addition there is coating and matrix is not bound with and
The phenomenon that being bubbled, or even falling off.
In practical engineering applications, the coating of workpiece surface usually has the special surfaces function such as decoration, wear-resisting, anticorrosion
Can, coating deficiency in conjunction with matrix will influence the surface property of workpiece after coating.
For this purpose, there is an urgent need to a kind of new devices and/or method, to solve the above problems.
Summary of the invention
Goal of the invention of the invention is: carrying out brightness to the semiclosed curved-surface piece inner surface of axial symmetry for using existing method
When light Discharge Cleaning, based on " Faraday cup " effect existing for field distribution, cause in Glow Discharge Cleaning and coating process
Ion bombardment effects are concentrated mainly on the oral area of the semiclosed curved-surface piece inner surface of axial symmetry, and remoter away from oral area, electric field is weaker, ion
Bombardment effect is poorer, and leads to coating and the weaker problem of matrix binding ability, provides in a kind of semiclosed curved-surface piece of axial symmetry
Overlay coating uniformly enhances physical gas-phase deposite method and its application of combination.The present invention changes axis by pictograph impressed current anode
The field distribution of symmetrical semiclosed curve surface work pieces inner surface, thus the ion bombardment effects during enhancing Glow Discharge Cleaning,
Obtain workpiece clean surface before plating, the combination of the final effectively enhancing semiclosed curve surface work pieces inner surface magnetron sputtering coating of axial symmetry
Performance.Of the invention is easy to operate, and technique is controllable, favorable repeatability, can satisfy the need of industrialization large-scale production and application
It wants, effectively realizes the firm connection between the semiclosed curve surface work pieces inner surface magnetron sputtering coating of axial symmetry and matrix, significantly mention
It is horizontal to rise equipment manufacturing, application value with higher and preferable application prospect.
To achieve the goals above, the present invention adopts the following technical scheme:
A kind of method that semiclosed curved-surface piece inner surface coating of axial symmetry uniformly enhances combination, includes the following steps:
(1) opening portion of the semiclosed curve surface work pieces of axial symmetry is arranged downward, and circular flat magnetic controlled sputtering target is arranged
Below the semiclosed curve surface work pieces of axial symmetry, and the axis phase of the semiclosed curve surface work pieces of axial symmetry and circular flat magnetic controlled sputtering target
It is overlapped, is maintained a certain distance between the semiclosed curve surface work pieces of axial symmetry and circular flat magnetic controlled sputtering target;
(2) one and the semiclosed curve surface work pieces inner surface of axial symmetry are set in the opening portion of the semiclosed curve surface work pieces of axial symmetry
The pictograph impressed current anode matched, and the axis of pictograph impressed current anode is overlapped with the axis of circular flat magnetic controlled sputtering target;
(3) pictograph impressed current anode and the semiclosed curve surface work pieces of axial symmetry are relatively rotated, physical vapour deposition (PVD) is carried out, works as plating
After layer reaches setting value.
In the step 3, carrying out physical vapour deposition (PVD) includes: Glow Discharge Cleaning process, coating process;In glow discharge
In cleaning process, pictograph impressed current anode is connected with power anode;In coating process, pictograph impressed current anode ground connection;Work as coating
After reaching setting value.
In the step 3, pictograph impressed current anode is static, and the semiclosed curve surface work pieces of axial symmetry are rotated along its axis;
Or the semiclosed curve surface work pieces of axial symmetry are static, pictograph impressed current anode is rotated along its axis;
Or using the axis of the semiclosed curve surface work pieces of axial symmetry as rotary shaft, the semiclosed curve surface work pieces of axial symmetry and pictograph are assisted
Anode is relatively rotated along rotary shaft.
In the step 1, gap is formed between the semiclosed curve surface work pieces of axial symmetry and circular flat magnetic controlled sputtering target.
In the step 2, pictograph impressed current anode includes first matched with the semiclosed curve surface work pieces opening portion of axial symmetry
Annulus, the arc-shaped connecting rod matched with the semiclosed curve surface work pieces inner surface of axial symmetry, anode connecting rod, the arc-shaped connecting rod
For at least two and arc-shaped connecting rod and the first annulus are connected as one composition anode body, and the anode body is connect with anode
Bar is connected.
It further include the second annulus, the both ends of the arc-shaped connecting rod are connected as one with the first annulus, the second annulus respectively.
The arc-shaped connecting rod is four and is distributed between the first annulus and the second annulus.
The application of preceding method, the coating for being used for axisymmetric curved surface work piece inner surface band bias uniformly enhance combination
Physical vapour deposition (PVD).
It is used for the magnetron sputtering preparation semiclosed curved-surface piece inner surface coating of axial symmetry.
It is poor and uneven in order to solve the semiclosed curve surface work pieces inner surface magnetron sputtering coating binding performance of existing axial symmetry
The technical issues of, the present invention provides a kind of method that the semiclosed curved-surface piece inner surface coating of axial symmetry uniformly enhances combination, specifically
For a kind of Enhancement Method of the semiclosed curve surface work pieces inner surface magnetron sputtering coating binding performance of axial symmetry.This method includes as follows
Step: the semiclosed curve surface work pieces oral area of axial symmetry is placed downward, circular flat magnetic controlled sputtering target is disposed below, the two axis
It is overlapped, target and the semiclosed curve surface work pieces oral area of axial symmetry keep certain distance;Oral area is put in the semiclosed curve surface work pieces of axial symmetry
A pictograph impressed current anode is set, and its axis is overlapped with axis of workpiece;During the deposition process, pictograph impressed current anode is static, axial symmetry
Semiclosed curve surface work pieces are rotated along axis of workpiece or the semiclosed curve surface work pieces of axial symmetry are static, pictograph impressed current anode is along axis
Rotation.During Glow Discharge Cleaning, pictograph impressed current anode is connected with power anode.In the present invention, by axial symmetry
Impressed current anode, the semiclosed curve surface work pieces inner surface electricity of Lai Gaishan technical process formed symmetrical is arranged in semiclosed curve surface work pieces inner surface
The uniformity of bit distribution acts on to enhance uniform bombardment of the Glow Discharge Cleaning process intermediate ion at each position.I.e. in workpiece
Before plating during Glow Discharge Cleaning, improved in the semiclosed curve surface work pieces of axial symmetry by applying positive potential on impressed current anode
The uniformity of surface potential distribution achievees the purpose that effectively uniformly to clean, most so as to improve the uniformity of each position ion bombardment
The bond strength of the enhancing semiclosed curve surface work pieces inner surface magnetron sputtering coating of axial symmetry eventually.
Present invention coating with bias suitable for axisymmetric curved surface work piece inner surface technical process uniformly enhances combination
Physical vapour deposition (PVD), and it is not limited only to magnetron sputtering technique.
Further, the present invention provides a kind of specific structure of pictograph impressed current anode.The pictograph impressed current anode includes and axis pair
The first annulus for claiming semiclosed curve surface work pieces opening portion to match, the arc matched with the semiclosed curve surface work pieces inner surface of axial symmetry
Shape connecting rod, the anode connecting rod for being connected with power supply, arc-shaped connecting rod is at least two and arc-shaped connecting rod and first is justified
Ring is connected as one composition anode body, and anode body is connected with anode connecting rod.The structure preparation pictograph impressed current anode with
The inner surface of the semiclosed curve surface work pieces of axial symmetry is consistent, and structure is simple, and production cost is low, and can effectively solve of the invention
Technical problem.
Further, which further includes the second annulus, the both ends of arc-shaped connecting rod respectively with the first annulus,
Two annulus are connected as one.The present invention is cooperated using the first annulus, the second annulus, is conducive to adding for pictograph impressed current anode
Work and manufacture reduce production cost.
In a specific example, arc-shaped connecting rod is four and is distributed between the first annulus and the second annulus;It will
The semiclosed curve surface work pieces oral area of axial symmetry is placed downward, and circular flat magnetic controlled sputtering target is disposed below, and the two axis is overlapped, target
Certain distance (target-cardinal distance) is kept with axisymmetric curved surface oral area;Placed inside axisymmetric curved surface one and work piece inner surface as
The impressed current anode of shape, axis are overlapped with axis of workpiece, and impressed current anode is 3 cm at a distance from work piece inner surface;In glow discharge
In cleaning process, the air pressure of argon working gas is 2.0 Pa, and workpiece bias is -800V, and impressed current anode voltage is+50V, cleaning
Time 30min;In coating process, impressed current anode ground connection;In technical process, workpiece keeps rotation, and pictograph impressed current anode is protected
It holds static.
The present invention changes the field distribution of the semiclosed curve surface work pieces inner surface of axial symmetry by pictograph impressed current anode, thus
Enhance the ion bombardment effects during Glow Discharge Cleaning, obtains workpiece clean surface before plating, final effectively enhancing axial symmetry
The binding performance of semiclosed curve surface work pieces inner surface magnetron sputtering coating.After measured, the present invention can be by the axis pair of internal diameter Φ 260mm
Claim semiclosed curve surface work pieces inner surface magnetron sputtering coating bond strength to greatly improve about 20MPa by minimum about 3MPa, has
Significant technological progress.
In conclusion the present invention can effectively overcome the shortcomings of conventional method, the table in the semiclosed curve surface work pieces of axial symmetry
The firm connection between magnetron sputtering coating and matrix is realized in face, and method is simple, and technique is controllable, and process is short, high treating effect.
Practice further demonstrates that the method can significantly improve the combination of the semiclosed curve surface work pieces inner surface magnetron sputtering coating of axial symmetry is strong
Degree, application value with higher.
Detailed description of the invention
Examples of the present invention will be described by way of reference to the accompanying drawings, in which:
Fig. 1 is the semiclosed curve surface work pieces inner surface magnetron sputtering schematic diagram of conventional method axial symmetry.
Fig. 2 is the semiclosed curve surface work pieces inner surface Glow Discharge Cleaning potential image of conventional method axial symmetry.
Fig. 3 is the semiclosed curve surface work pieces inner surface magnetron sputtering schematic diagram of 2 formed symmetrical of embodiment.
Fig. 4 is the structural schematic diagram of pictograph impressed current anode in embodiment 2.
Fig. 5 is the semiclosed curve surface work pieces inner surface Glow Discharge Cleaning potential image of 2 formed symmetrical of embodiment.
Fig. 6 is in experimental verification, and the semiclosed curve surface work pieces inner surface bond strength of axial symmetry measures pull head arrangement schematic diagram.
Fig. 7 is the bond strength measurement of embodiment 1 and the semiclosed curve surface work pieces inner surface coating of 2 gained axial symmetry of embodiment
Result figure.
Marked in the figure: 1, vacuum chamber, 2, the semiclosed curve surface work pieces of axial symmetry, 3, pictograph impressed current anode, 4, sputtering target, 5,
One annulus, the 6, second annulus, 7, arc-shaped connecting rod, 8, anode connecting rod.
Specific embodiment
All features disclosed in this specification or disclosed all methods or in the process the step of, in addition to mutually exclusive
Feature and/or step other than, can combine in any way.
Any feature disclosed in this specification unless specifically stated can be equivalent or with similar purpose by other
Alternative features are replaced.That is, unless specifically stated, each feature is an example in a series of equivalent or similar characteristics
?.
Below by taking the semiclosed curve surface work pieces inner surface magnetron sputtering copper facing of the axial symmetry of internal diameter Φ 260mm as an example, by right
Effect of the present invention is further described than testing, wherein embodiment 1 is the conventional method without impressed current anode, embodiment 2
To there is the content of present invention of impressed current anode.
For comparative effectiveness, other than the impressed current anode in invention, other equipment, tooling and technological parameter are all the same.Tool
Body is as follows: plane magnetic controlled sputtering target diameter is Φ 240mm, target surface apart from axisymmetric curved surface workpiece oral area 100mm, target power output 3kW,
Work Ar Pressure 0.3Pa, is coated with time 1h.In technical process, axial symmetry semiclosed 3 turns/min of curve surface work pieces velocity of rotation is auxiliary
Supporing yang pole remains static.
Wherein, the Potential distribution during the semiclosed curved-surface piece inner surface Glow Discharge Cleaning of axial symmetry is soft using Ansys
Part is calculated, and coat binding strength is measured using POSITEST bond strength tester.
Embodiment 1
Using conventional method, the downward face target surface of the semiclosed curve surface work pieces oral area of axial symmetry is placed, and axis is overlapped, such as
Shown in Fig. 1.During Glow Discharge Cleaning, the space potential distribution of near workpieces is as shown in Figure 2.It can be seen that axial symmetry
There are the equipotential regions of large area inside semiclosed curve surface work pieces, and in the equipotential region, the Ar+ that glow discharge generates cannot
Accelerated capacitation, workpiece surface is only flown under initial kinetic energy, is collided in flight course with other gas atoms in addition
And energy attenuation occurs, cause the ion energy for reaching workpiece surface insufficient and is difficult to keep the pollutant of workpiece surface absorption effective
Removal, such coating atom are difficult to effectively be combined with workpiece substrate, and show coating and combine deficiency.
Embodiment 2
Using the method for the present invention, the semiclosed curve surface work pieces oral area face target surface of axial symmetry, and axis is overlapped, in axial symmetry half
Impressed current anode is set in closed surface workpiece, and axis is overlapped with axis of workpiece, and impressed current anode is apart from work piece inner surface 3cm, such as
Shown in Fig. 3.In order to not influence coating deposition, impressed current anode is four spoke spherical structures (as shown in figure 4, the pictograph impressed current anode
Including the first annulus matched with the semiclosed curve surface work pieces opening portion of axial symmetry and the semiclosed curve surface work pieces inner surface of axial symmetry
The arc-shaped connecting rod matched, the anode connecting rod for being connected with power supply, the second annulus, the both ends of arc-shaped connecting rod respectively with
First annulus, the second annulus are connected as one, and arc-shaped connecting rod is four and is distributed between the first annulus and the second annulus, arc
Shape connecting rod and the first annulus, the second annulus are connected as one composition anode body, and anode body is connected with anode connecting rod).
During Glow Discharge Cleaning, pictograph impressed current anode is connected with power anode;In coating process, pictograph impressed current anode is connect
Ground.During Glow Discharge Cleaning, the space electric field distribution of near workpieces is as shown in Figure 5.As can be seen that addition impressed current anode
Afterwards, equipotential region is reduced significantly inside the semiclosed curve surface work pieces of axial symmetry, to overcome the deficiency of conventional method.Meanwhile
Under the action of impressed current anode positive potential, the electric field strength of impressed current anode and the semiclosed curve surface work pieces inner surface of axial symmetry increases,
In the region, the Ar+ that glow discharge generates is further accelerated capacitation, to effectively bombard workpiece surface and remove adsorption
Pollutant, such coating atom can effectively be combined with workpiece substrate and show the enhancing in conjunction with coating.
Experimental verification
Using above-mentioned glow discharge and technique for preparing coating parameter, embodiment 1, the method for embodiment 2 is respectively adopted in carbon
Symmetrically semiclosed curve surface work pieces inner surface carries out the preparation of copper coating to steel shaft, then using POSITEST bond strength tester into
The measurement of row coat binding strength.The pull head arrangement of bond strength is measured as shown in fig. 6, using epoxy resin between pull head and coating
Glue is bonded, and solidifies 4h at 100 DEG C.In addition to vertex, remaining each latitude arranges 4 measurement points, measures bond strength
For the average value of 4 measured values of Same Latitude, coat binding strength measurement result is as shown in Figure 7.As seen in Figure 7, it adopts
With conventional method (embodiment 1) obtained coat binding strength with the increasing of the semiclosed curve surface work pieces inner surface latitude of axial symmetry
It is big and reduce, oral area coat binding strength about 20MPa, and top only has 3MPa or so, this with during Glow Discharge Cleaning
Potential distribution have direct relation (since the uniformity of Potential distribution is poor, ion bombardment effects during Glow Discharge Cleaning
Significant difference causes much lower compared with the bond strength of oral area at the top of shape face in workpiece);Using the method for the present invention (embodiment 2) institute
Obtained coat binding strength uniformity is good and is apparently higher than conventional method, and entire inner surface different parts coat binding strength
It is almost the same, about 20MPa, this is because the addition of pictograph impressed current anode significantly improves in the semiclosed curve surface work pieces of axial symmetry
Potential distribution uniformity during the Glow Discharge Cleaning of surface, each position ion bombardment effects are consistent and cleaning effect is good.
In conclusion coat binding strength measurement result shows that the method can significantly improve the semiclosed curved surface works of axial symmetry
The bond strength of part inner surface magnetron sputtering coating.
The invention is not limited to specific embodiments above-mentioned.The present invention, which expands to, any in the present specification to be disclosed
New feature or any new combination, and disclose any new method or process the step of or any new combination.
Claims (8)
1. a kind of method that semiclosed curved-surface piece inner surface coating of axial symmetry uniformly enhances combination, which is characterized in that including as follows
Step:
(1) opening portion of the semiclosed curve surface work pieces of axial symmetry is arranged downward, and circular flat magnetic controlled sputtering target is set to axis
Below symmetrical semiclosed curve surface work pieces, and the semiclosed curve surface work pieces of axial symmetry are mutually be overlapped with the axis of circular flat magnetic controlled sputtering target
It closes, is maintained a certain distance between the semiclosed curve surface work pieces of axial symmetry and circular flat magnetic controlled sputtering target;
(2) it is arranged one in the opening portion of the semiclosed curve surface work pieces of axial symmetry to match with the semiclosed curve surface work pieces inner surface of axial symmetry
The pictograph impressed current anode of conjunction, and the axis of pictograph impressed current anode is overlapped with the axis of circular flat magnetic controlled sputtering target;
(3) pictograph impressed current anode and the semiclosed curve surface work pieces of axial symmetry are relatively rotated, physical vapour deposition (PVD) is carried out, when coating reaches
To after setting value;
In the step (3), carrying out physical vapour deposition (PVD) includes: Glow Discharge Cleaning process, coating process;It is clear in glow discharge
During washing, pictograph impressed current anode is connected with power anode;In coating process, pictograph impressed current anode ground connection;When coating reaches
To after setting value.
2. the method according to claim 1, wherein pictograph impressed current anode is static, axis pair in the step (3)
Semiclosed curve surface work pieces are claimed to rotate along its axis;
Or the semiclosed curve surface work pieces of axial symmetry are static, pictograph impressed current anode is rotated along its axis;
Or using the axis of the semiclosed curve surface work pieces of axial symmetry as rotary shaft, the semiclosed curve surface work pieces of axial symmetry and pictograph impressed current anode
It is relatively rotated along rotary shaft.
3. the method according to claim 1, wherein in the step (1), the semiclosed curve surface work pieces of axial symmetry with
Gap is formed between circular flat magnetic controlled sputtering target.
4. method according to claim 1-3, which is characterized in that in the step (2), pictograph impressed current anode packet
Include the first annulus matched with the semiclosed curve surface work pieces opening portion of axial symmetry and the semiclosed curve surface work pieces inner surface phase of axial symmetry
The arc-shaped connecting rod of cooperation, anode connecting rod, the arc-shaped connecting rod is at least two and arc-shaped connecting rod and the first annulus connect
It is connected in and is integrally formed anode body, the anode body is connected with anode connecting rod.
5. according to the method described in claim 4, it is characterized in that, further including the second annulus, the both ends of the arc-shaped connecting rod
It is connected as one respectively with the first annulus, the second annulus.
6. according to the method described in claim 5, it is characterized in that, the arc-shaped connecting rod is four and is distributed in the first annulus
Between the second annulus.
7. the application of any one of -6 the methods according to claim 1, which is characterized in that be used in axisymmetric curved surface workpiece
The coating of surface band bias uniformly enhances the physical vapour deposition (PVD) of combination.
8. application according to claim 7, which is characterized in that be used for the magnetron sputtering preparation semiclosed curved surface of axial symmetry
Part inner surface coating.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201711046343.1A CN107815637B (en) | 2017-10-31 | 2017-10-31 | A kind of semiclosed curved-surface piece inner surface coating of axial symmetry uniformly enhances the method and its application of combination |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201711046343.1A CN107815637B (en) | 2017-10-31 | 2017-10-31 | A kind of semiclosed curved-surface piece inner surface coating of axial symmetry uniformly enhances the method and its application of combination |
Publications (2)
Publication Number | Publication Date |
---|---|
CN107815637A CN107815637A (en) | 2018-03-20 |
CN107815637B true CN107815637B (en) | 2019-07-16 |
Family
ID=61604439
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201711046343.1A Active CN107815637B (en) | 2017-10-31 | 2017-10-31 | A kind of semiclosed curved-surface piece inner surface coating of axial symmetry uniformly enhances the method and its application of combination |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN107815637B (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113061863A (en) * | 2019-12-16 | 2021-07-02 | 深圳市万普拉斯科技有限公司 | Film coating jig, film coating equipment and film coating method |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05507765A (en) * | 1990-06-16 | 1993-11-04 | ゼネラル ヴァキュウム イクイップメント リミテッド | Vacuum deposition equipment |
CN101649445B (en) * | 2009-08-31 | 2012-01-25 | 哈尔滨工业大学 | Ion injection method for inner electrode movable type inner surface plasma |
CN104988464B (en) * | 2015-06-30 | 2017-10-27 | 中国工程物理研究院材料研究所 | A kind of uniform magnetron sputtering deposition method of axial-symmetric shell part inner surface and its device |
-
2017
- 2017-10-31 CN CN201711046343.1A patent/CN107815637B/en active Active
Also Published As
Publication number | Publication date |
---|---|
CN107815637A (en) | 2018-03-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN107142463B (en) | A kind of coating method that plasma activated chemical vapour deposition is compound with magnetron sputtering or ion plating | |
CN201614406U (en) | Equipment for forming cladding layer of deposition material | |
CN110098044B (en) | Composite modification method for surface protection of neodymium iron boron magnet | |
JP2014231644A (en) | Coating apparatus for covering substrate, and method for coating substrate | |
JP2014534341A (en) | Multi-directional racetrack rotating cathode for PVD arrays | |
CN111455336A (en) | Electromagnetic field enhanced magnetron sputtering device and method for preparing diamond-like carbon coating | |
CN107815637B (en) | A kind of semiclosed curved-surface piece inner surface coating of axial symmetry uniformly enhances the method and its application of combination | |
US20120228124A1 (en) | Method of creating pvd layers using a cylindrical rotating cathode and apparatus for carrying out this method | |
Matthews | Plasma-based physical vapor deposition surface engineering processes | |
CN105803408A (en) | Neodymium-iron-boron permanent magnet surface protection method | |
CN102943240A (en) | Multifunctional plasma enhanced coating system | |
US10332731B2 (en) | Method of and magnet assembly for high power pulsed magnetron sputtering | |
MX2013012200A (en) | High power impulse magnetron sputtering method providing enhanced ionization of the sputtered particles and apparatus for its implementation. | |
CN109680250B (en) | Arc ion source and arc ion source coating method | |
CN211367703U (en) | Magnetron sputtering coating machine for depositing DLC film | |
CN105220122B (en) | Has the magnetic control sputtering device of high power pulse ion source | |
CN100575543C (en) | A kind of method at the high radiation coating of cobalt base superalloy surface deposition silicon carbide | |
CN211361908U (en) | Sand blasting shielding jig for target material | |
TWI490354B (en) | Housing and method for making the same | |
CN105112872A (en) | Pulse magnetron sputtering device for preparing inner surface coating of cylinder part and application of pulse magnetron sputtering device | |
CN205152323U (en) | Magnetron sputtering device of utensil high power pulsed ion source | |
CN104674179B (en) | The bipolar sputtering tableware film plating process of vacuum | |
CN108251810B (en) | Preparation method of corrosion-resistant sintered neodymium-iron-boron magnet | |
TWI490358B (en) | Housing and method for making the same | |
CN105177512B (en) | Multi-arc ion coating aluminium+arc-added glow chromising+recoil ion injection prepares Fe Al Cr alloy-layers |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant |