CN102943240A - Multifunctional plasma enhanced coating system - Google Patents
Multifunctional plasma enhanced coating system Download PDFInfo
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- CN102943240A CN102943240A CN2012104523288A CN201210452328A CN102943240A CN 102943240 A CN102943240 A CN 102943240A CN 2012104523288 A CN2012104523288 A CN 2012104523288A CN 201210452328 A CN201210452328 A CN 201210452328A CN 102943240 A CN102943240 A CN 102943240A
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Abstract
The invention relates to a multifunctional plasma enhanced coating system which comprises a vacuum chamber (1) and a vacuum obtaining device and is characterized in that the center of the vacuum chamber (1) is provided with a rotary working table (12); an inner cavity wall of the vacuum chamber (1) is provided with two adjacent cathode arc targets (2 and 4); the first cathode arc target is provided with a barrier screen (3); an auxiliary anode device (11) is arranged in front of the cathode arc target (2); the second cathode arc target is adjacent to the first cathode arc target; and the rotary arc ion plating plasma enhanced coating system is formed by the rotary working table (12), the two cathode arc targets, the vacuum chamber (1) and the auxiliary anode device (11). The multifunctional plasma enhanced coating system has the beneficial effects of precise coating surface, low porosity, stable coating performance, simple structure and low cost.
Description
Technical field
The present invention relates to a kind of multi-functional plasma body and strengthen coat system, be applied to surface coating, belong to the plasma gas phase deposition technical field of thin-film material and Modern Surface Engineering.
Background technology
As everyone knows, arc ion plating (aip) is to utilize awkward silence at a meeting to cause the arc discharge process, makes by the evaporation of plating target, ionization, and reactive deposition forms the compound coats such as metal nitride or nitrogen carbide.Arc ion plating (aip), device structure is simpler owing to having, and ionization level is high, and sedimentation rate is high, and incident ionic energy is large, and film-substrate cohesion, has obtained to use more and more widely on cutter and various tool and mould as hard films coating means than advantages of higher.Yet, exist macrobead to pollute in the electric arc ion coating plating of prior art, make coatingsurface coarse, porosity increases, and coating performance is unstable, and this has restricted the application of arc ion plating hard coat on accurate tool and mould and high-grade part to a certain extent.In order to reduce the coatingsurface particle, make coating fine and close, smooth finish improves, and people have designed improving one's methods of many article on plasma systems.Wherein a kind ofly commonly used than effective means be, in the cathode target back permanent magnet be set, make at target surface and produce bent magnetic field, utilize this magnetic-field component, to increase the arc spot in the translational speed of target surface.But the bent magnetic field of this technology also constrains in charged particle the cathode target near surface, makes it fully to be transmitted into the coated workpieces zone and participates in ionization.
Sputter coating belongs to the glow discharge category, utilizes the cathode sputtering principle to carry out plated film.Argon ion in the vacuum chamber gets off the target atom sputter, deposits to and forms required rete on the workpiece.In sputter plating evolution, people have introduced magnetic control technology.Set up runway magnetic field on the cathode target surface, utilize its control secondary electron motion, prolong near its stroke target surface, increase the probability of collision with gas, thereby improve the density of plasma body, can greatly improve like this sputter rate of target, improve sedimentation rate.But the ring-type runway magnetic field of this sealing can constrain in a large amount of charged particles the cathode target near surface too, make neutral atom produce reaction with process gas (for example nitrogen and carbonaceous gas), to obtain the coating based on nitride, carbide or carbonitride, cause a large amount of neutral atoms of cathode material to be fallen on the coatingsurface that is forming
Summary of the invention
The technical issues that need to address of the present invention, it is purpose of the present invention, to be to exist macrobead to pollute, make that coatingsurface is coarse, porosity increases, the unsettled defective of coating performance in the prior art electric arc ion coating plating in order overcoming, to provide a kind of multi-functional plasma body to strengthen coat system.
Purpose of the present invention can reach by taking following technical scheme:
A kind of multi-functional plasma body strengthens coat system, comprise that vacuum chamber and vacuum obtain device, constructional feature is: the central authorities at vacuum chamber are provided with the rotational workpieces platform, internal chamber wall at vacuum chamber is provided with two adjacent cathode arc targets, one of cathode arc target band stops screen, right opposite at this cathode arc target is provided with auxiliary anode device, and two of cathode arc target is positioned at the adjacent of one of cathode arc target; Consist of rotary electric arc ion plating plasma body by rotational workpieces platform, two cathode arc targets, auxiliary anode device and vacuum chamber and strengthen coat system.
Purpose of the present invention can also reach by taking following technical scheme:
One embodiment of the present invention are: the opposite slightly to the right or left at one of cathode arc target is provided with magnetron sputtering target, consists of rotary electric arc ion plating, the multi-functional plasma body enhancing of magnetron sputtering coat system by rotational workpieces platform, two cathode arc targets, magnetron sputtering target, auxiliary anode device and vacuum chambers.
Further, vacuum chamber is tubular, its cross section can be hexagon shape, eight limit shapes, odd plots of land that can be cultivated shape or twelve edge shape, wherein there are two adjacent limits respectively to be provided with a recess, one of cathode arc target is built in one of recess, two of cathode arc target is built in two of recess, and auxiliary anode device is arranged on the right opposite of one of cathode arc target, and magnetron sputtering target is arranged on the bottom place adjacent with auxiliary anode device; Stop that screen is positioned at the opening part of one of cathode arc target recess and leaves the gap at this opening part.
Further, it is cylindric that vacuum chamber is, the rounded shape in the cross section of vacuum chamber, and the inwall place on X-axis is provided with one of recess, and one of cathode arc target is built in one of this recess; Below one of recess, be provided with two of recess, two of cathode arc target be built in recess two in, auxiliary anode device is arranged on the right opposite of one of cathode arc target, magnetron sputtering target is arranged on the place with the bottom of auxiliary anode device; Stop that screen is positioned at the opening part of electric arc target one recess and leaves the gap at this opening part.
One embodiment of the present invention are: vacuum chamber is tubular, the cross section of vacuum chamber can be hexagon shape, eight limit shapes, odd plots of land that can be cultivated shape or twelve edge shape, wherein there are two adjacent limits respectively to be provided with a recess, one of cathode arc target is built in one of recess, two of cathode arc source is built in two of recess, and auxiliary anode device is arranged on the right opposite of one of cathode arc target; Stop that screen is positioned at the opening part of one of recess and leaves the gap at this opening part.
Further, vacuum chamber 1 is cylindric, the rounded shape in the cross section of vacuum chamber, and the inwall place on X-axis is provided with one of recess, and one of cathode arc target is built in one of this recess; Below one of recess, be provided with two of recess, two of cathode arc target be built in recess two in, auxiliary anode device is arranged on the right opposite of one of cathode arc target; Stop that screen is positioned at the opening part of one of recess and leaves the gap at this opening part.
Further, in vacuum chamber electric heating panel can be set, rotary table is equipped with planetary mechanism and some other necessary off-set facility.
Further, vacuum obtains device and is made of the vacuum pump unit, and its connecting passage is arranged on a side of vacuum chamber.
The present invention has following outstanding beneficial effect;
1, because the present invention is provided with cathode arc source in coat system, and auxiliary anode device is arranged, ion plating or magnetron sputtering are plated in geseous discharge and the arc-over carry out.Because the existence of this special arc source, the neutral atom of system is reduced, and ionization level improves, and the etching of film-coating workpiece is cleaned with deposition process strengthened, thereby improve the performance of coating, have coatingsurface precision, porosity is low, coating performance is stable beneficial effect.
2, the present invention is owing to adopt band to stop the cathode arc target of screen, in vacuum chamber, produce gaseous plasma, substituted fully involve great expense, power is little, the gas ion source utility appliance of operation control difficulty, therefore, has beneficial effect simple in structure, with low cost.Because atom (ion) stops that screen is every having lived the drop that the larger atoms metal of quality, ion and the little molten bath of arc spot eject, the electronics that quality is very little then can be walked around and stop screen, behind screen, form electronic cloud as virtual negative electrode, therefore, can increase the plasma density in the cavity.
Description of drawings
Fig. 1 is the structural representation of the specific embodiment of the invention 1.
Embodiment
Specific embodiment 1:
With reference to Fig. 1, present embodiment comprises that vacuum chamber 1 and vacuum obtain device, central authorities at vacuum chamber 1 are provided with rotational workpieces platform 12, internal chamber wall at vacuum chamber 1 is provided with two adjacent cathode arc targets (2,4), cathode arc target 2 band stops screen 3, is provided with auxiliary anode device 11 at the right opposite of cathode arc target 2, and cathode arc target 4 is positioned at the adjacent of cathode arc target 2; Be provided with magnetron sputtering target 10 at the opposite slightly to the right or left of cathode arc target 2; Consist of rotary electric arc ion plating, the multi-functional plasma body enhancing of magnetron sputtering coat system by rotational workpieces platform 12, cathode arc target 2, cathode arc target 4, magnetron sputtering target 10, auxiliary anode device 11 and vacuum chamber 1.
In the present embodiment, vacuum chamber 1 is tubular, the cross section of vacuum chamber 1 is eight limit shapes, wherein there are two adjacent limits respectively to be provided with a recess, cathode arc target 2 is built in one of recess, cathode arc target 4 is built in two of recess, and auxiliary anode device 11 is arranged on the right opposite of cathode arc target 2, and magnetron sputtering target 10 is arranged on the bottom place adjacent with auxiliary anode device 11; Stop that screen 3 is positioned at the opening part of one of recess and leaves the gap at this opening part.Electric heating panel can be set in that vacuum chamber 1 is interior, with rotary table 12 and some other necessary off-set facility of planetary mechanism.The interface of vacuum acquisition device is arranged on a side of vacuum chamber.
The principle of work of present embodiment is as follows:
With reference to Fig. 1, in vacuum chamber 1, metal ion source is arranged, for example common cathode arc target 4 and magnetron sputtering target 10, equipped one and disposed cathode arc target 2 that atom (ion) stops screen 3 and the auxiliary anode device 11 of arranging in pairs or groups mutually with it in that vacuum chamber 1 is interior, be equipped with simultaneously corresponding arc power 5,6,9 and magnetron sputtering power supply 8, rotary table 12 is connected with grid bias power supply 7, workpiece or sample are installed in above the rotary table 12, and planetary mechanism and some other necessary off-set facility of electric heating panel, rotary table can also be set in the vacuum chamber.
Stop screen 3 cathode arc target 2 by band atom (ion), in vacuum cavity, produce gaseous plasma, substituted fully involve great expense, power is little, the gas ion source utility appliance of operation control difficulty.In the working process, after this cathode target starting the arc, because atom (ion) stops screen 3 every having lived the drop that the larger atoms metal of quality, ion and the little molten bath of arc spot eject, the electronics that quality is very little then can be walked around and stop screen, forms electronic cloud as virtual negative electrode behind screen.If at this moment the supplementary anode on its opposite adds positive voltage, then electronics is migrated under the effect of electrical forces, thereby has ionized the gas molecule between the two poles of the earth, has greatly increased the plasma density in the cavity.
If add negative bias at workpiece this moment, then be conducive to promote to be coated with layer deposition process.Simultaneously, the application of said mechanism also helps to reduce the neutral metal atom in the cathode material on the coatingsurface, and coating quality is improved.
Experiment shows, by regulating arc power 9, can change the electric current of supplementary anode 11, can change the metal that drops on the coating workpieces and the ratio of gas neutral atom and ion, thus the hardness of change coating.For example, when the supplementary anode electric current was zero, the hardness of TiN coating was at 20-25GPa, and the supplementary anode electric current is when transferring to maximum, and hardness can reach 35-40GPa; Accordingly, to the TiAlN coating, its microhardness changes between from 25-30GPa to 40-50GPa.In whole deposition cycle, by adjusting the supplementary anode electric current, can obtain the needed microhardness distribution of deposited coatings thickness, and change other performance, for example the wear resistance of coating.
The multi-functional plasma body that present embodiment consists of strengthens coat system, is on the basis of conventional physical vapour deposition (PVD) technology, carries out technological innovation, and a kind of enhancing coat system of developing.It can be enhanced prepared hard coat in conjunction with technology such as arc ion plating, sputter coating and plasma enhanced chemical vapor depositions, and rete is finer and close, and hardness and toughness are higher, and bonding force is better.
Application example one, the arc ion plating titanium nitride coating:
With reference to Fig. 1, in vacuum chamber 1, workpiece to be machined is installed.The air pressure of vacuum chamber 1 after vacuumizing should not be lower than 0.005Pa.When coating, in vacuum chamber 1, pass into the rare gas element argon gas, reach the air pressure of 0.05-0.5Pa.Starter cathode electric arc target (titanium target) 2 is adjusted its working current by arc power 5 afterwards.According to loading varying in weight of workpiece, working current can be regulated in the 30A-300A scope, and the weight of instrument is larger, and electric current is larger.Cathode arc target 2 steadily increases the electric current by supplementary anode 11 by arc power 5 and arc power 9, and workpiece increases bias voltage (from 0 to maximum value) by grid bias power supply 7, until the temperature on the workpiece reaches desired temperature (150-600 ° of C).For the homogeneous heating workpiece, workpiece is placed on the rotating mechanism 12, and around the vacuum chamber center rotating, adopts in case of necessity planetary mechanism.
When the deposition beginning, arc power 5 and arc power 9 electric currents can reduce to minimum, and bias voltage is adjusted to 150-300V.Then, starter cathode electric arc target (titanium target) 4, and the nitrogen content that steadily changes in the gaseous mixture arrives the concentration that needs.After the pressure-stabilisation in the vacuum chamber, can adjust arc power 5 and arc power 9, by cathode arc target 2 and supplementary anode 11, change the degree of ionization of gaseous mixture.Correspondingly, can change metal and the neutral atom of gas and the ratio between the ion that drops on the workpiece.Based on the microhardness of the coating of titanium nitride TiN when supplementary anode 11 electric currents are zero between 20-25GPa, and when supplementary anode 11 electric currents are maximum the microhardness of coating between 35-40GPa.
If plating TiAlN based on the microhardness of TiAlN coating, changes between can be from 25-30GPa to 40-50GPa.Like this, in whole deposition cycle, can obtain along the microhardness distribution of coat-thickness needs by adjusting the supplementary anode electric current, and change other performances, for example, the wear resistance of coating.
Application example two, the magnetron sputtering titanium nitride coating:
With reference to Fig. 1, in vacuum chamber 1, workpiece to be machined is installed.The air pressure of vacuum chamber after vacuumizing should not be lower than 0.005Pa.When coating, in vacuum chamber 1, pass into the rare gas element argon gas, reach the air pressure of 0.05-0.5Pa.Starter cathode electric arc target (titanium target) 2 is adjusted its working current by arc power 5 afterwards.According to loading varying in weight of workpiece, working current can be regulated in the 30A-300A scope, and the weight of instrument is larger, and electric current is larger.Cathode arc target 2 steadily increases the electric current by supplementary anode 11 by arc power 5 and arc power 9, and workpiece increases bias voltage (from 0 to maximum value) by grid bias power supply 7, until the temperature on the workpiece reaches desired temperature (150-600 ° of C).For the homogeneous heating workpiece, workpiece is placed on the rotating mechanism [12], and around the vacuum chamber center rotating, adopts in case of necessity planetary mechanism.
When the deposition beginning, arc power 5 and arc power 9 electric currents can reduce to minimum, and bias voltage is adjusted to 150-300V.Then, start magnetron sputtering power supply 8, make magnetron sputtering target 10 surfaces produce glow discharge, the nitrogen content that steadily changes in the gaseous mixture arrives the concentration that needs.After the pressure-stabilisation in the vacuum chamber, can adjust arc power 5 and arc power 9, by cathode arc target 2 and supplementary anode 11, change the degree of ionization of gaseous mixture.Correspondingly, can change metal and the neutral atom of gas and the ratio between the ion that drops on the workpiece.Based on the microhardness of the coating of titanium nitride TiN when supplementary anode 11 electric currents are zero between 25-30GPa, and when supplementary anode 11 electric currents are maximum the microhardness of coating between 40-45GPa.
If plating TiAlN based on the microhardness of TiAlN coating, changes between can be from 3540GPa to 45-55GPa.Like this, in whole deposition cycle, can obtain along the microhardness distribution of coat-thickness needs by adjusting the supplementary anode electric current, and change other performances, for example, the wear resistance of coating.
Specific embodiment 2:
The characteristics of present embodiment are: vacuum chamber 1 is tubular, the cross section of vacuum chamber 1 can be hexagon shape, eight limit shapes, odd plots of land that can be cultivated shape or twelve edge shape, wherein there are two adjacent limits respectively to be provided with a recess, cathode arc target 2 is built in one of recess, auxiliary anode device 11 is arranged on the right opposite of cathode arc target 2, and magnetron sputtering target 10 is arranged on the bottom place adjacent with auxiliary anode device 11; Stop that screen 3 is positioned at the opening part of one of recess and leaves the gap at this opening part.All the other structure compositions, principle of work and application example are described with specific embodiment 1.
Specific embodiment 3:
The characteristics of present embodiment are: at the basis of specific embodiment 1 deletion magnetron sputtering target 10, namely consist of rotary electric arc ion plating plasma body by rotational workpieces platform 12, cathode arc target 2, cathode arc target 4, auxiliary anode device 11 and vacuum chamber 1 and strengthen coat system.In the present embodiment, vacuum chamber 1 is tubular, the cross section of this vacuum chamber 1 is hexagon shape, eight limit shapes, odd plots of land that can be cultivated shape or twelve edge shape, wherein there are two adjacent limits respectively to be provided with a recess, cathode arc target 2 is built in one of recess, cathode arc source 4 is built in two of recess, and auxiliary anode device 11 is arranged on the right opposite of cathode arc target 2; Stop that screen 3 is positioned at the opening part of one of recess and leaves the gap at this opening part.All the other structure compositions, principle of work and application example are described with specific embodiment 1.
Specific embodiment 4:
The characteristics of present embodiment are: vacuum chamber 1 is cylindric, the rounded shape in the cross section of vacuum chamber 1, and the inwall place on X-axis is provided with one of recess, and cathode arc target 2 is built in one of this recess; Below one of recess, be provided with two of recess, cathode arc target 4 be built in recess two in, auxiliary anode device 11 is arranged on the right opposite of cathode arc target 2; Stop that screen 3 is positioned at the opening part of one of recess and leaves the gap at this opening part.All the other are with specific embodiment 3.
By above-mentioned specific embodiment as can be known, in coating apparatus, can only have the ion coating plating function, also can only be with the magnetron sputtering plating function, perhaps two kinds of functions have both at the same time.In like manner, also can be applied in the plasma enhanced chemical vapor deposition technology.The present invention is in order to overcome in arc ion plating and the magnetron sputtering, and charged particle is crossed multiple constraint on the cathode target surface, makes it fully to be transmitted into the coated workpieces zone and participates in ionization, affects coating process and coating quality.
Claims (8)
1. a multi-functional plasma body strengthens coat system, comprise that vacuum chamber (1) and vacuum obtain device, it is characterized in that: the central authorities at vacuum chamber (1) are provided with rotational workpieces platform (12), internal chamber wall at vacuum chamber (1) is provided with two adjacent cathode arc targets (2,4), one of cathode arc target band stops screen (3), right opposite at this cathode arc target (2) is provided with auxiliary anode device (11), two of cathode arc target is positioned at the adjacent of one of cathode arc target, by rotational workpieces platform (12), two cathode arc targets and vacuum chamber (1), auxiliary anode device (11) and vacuum chamber (1) consist of rotary electric arc ion plating plasma body and strengthen coat system.
2. a kind of multi-functional plasma body according to claim 1 strengthens coat system, it is characterized in that: be provided with magnetron sputtering target (10) at the opposite slightly to the right or left of one of cathode arc target, consist of rotary electric arc ion plating, the multi-functional plasma body enhancing of magnetron sputtering coat system by rotational workpieces platform (12), two cathode arc targets, magnetron sputtering target (10), auxiliary anode device 11 and vacuum chambers (1).
3. a kind of multi-functional plasma body according to claim 2 strengthens coat system, it is characterized in that: vacuum chamber (1) is tubular, its cross section is hexagon shape, eight limit shapes, odd plots of land that can be cultivated shape or twelve edge shape, wherein there are two adjacent limits respectively to be provided with a recess, one of cathode arc target is built in one of recess, two of cathode arc target is built in two of recess, auxiliary anode device (11) is arranged on the right opposite of one of cathode arc target, and magnetron sputtering target (10) is arranged on the bottom place adjacent with auxiliary anode device (11); Stop that screen (3) is positioned at the opening part of one of cathode arc target recess and leaves the gap at this opening part.
4. a kind of multi-functional plasma body according to claim 2 strengthens coat system, it is characterized in that: vacuum chamber (1) is cylindric, the rounded shape in cross section of vacuum chamber (1), the inwall place on X-axis is provided with one of recess, and one of cathode arc target is built in one of this recess; Below one of recess, be provided with two of recess, two of cathode arc target be built in recess two in, auxiliary anode device (11) is arranged on the right opposite of one of cathode arc target, magnetron sputtering target (10) is arranged on the place with the bottom of auxiliary anode device (11); Stop that screen (3) is positioned at the opening part of electric arc target one recess and leaves the gap at this opening part.
5. a kind of multi-functional plasma body according to claim 1 strengthens coat system, it is characterized in that: vacuum chamber (1) is tubular, the cross section of vacuum chamber (1) is hexagon shape, eight limit shapes, odd plots of land that can be cultivated shape or twelve edge shape, wherein there are two adjacent limits respectively to be provided with a recess, one of cathode arc target is built in one of recess, two of cathode arc source is built in two of recess, and auxiliary anode device (11) is arranged on the right opposite of one of cathode arc target; Stop that screen (3) is positioned at the opening part of one of recess and leaves the gap at this opening part.
6. a kind of multi-functional plasma body according to claim 5 strengthens coat system, it is characterized in that: vacuum chamber (1) is cylindric, the rounded shape in cross section of vacuum chamber (1), the inwall place on X-axis is provided with one of recess, and one of cathode arc target is built in one of this recess; Below one of recess, be provided with two of recess, two of cathode arc source be built in recess two in, auxiliary anode device (11) is arranged on the right opposite of one of cathode arc target; Stop that screen (3) is positioned at the opening part of one of recess and leaves the gap at this opening part.
According to claim 2 or 5 described a kind of multi-functional plasma bodys strengthen coat systems, it is characterized in that: in vacuum chamber (1) electric heating panel is set, rotary table (12) is equipped with planetary mechanism and off-set facility.
According to claim 2 or 5 described a kind of multi-functional plasma bodys strengthen coat systems, it is characterized in that: vacuum obtains device and is made of the vacuum pump unit, and its connecting passage is arranged on a side of vacuum chamber.
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| CN105385994A (en) * | 2015-11-27 | 2016-03-09 | 广州巴达精密刀具有限公司 | Film coating system and method for improving coating adhesion of cutting tool |
| CN107365963A (en) * | 2017-05-03 | 2017-11-21 | 四川大学 | PVD oxide coating preparation methods |
| CN107937877A (en) * | 2017-11-15 | 2018-04-20 | 温州职业技术学院 | DLC coating apparatus based on anode technology |
| CN108281618A (en) * | 2017-12-19 | 2018-07-13 | 成都亦道科技合伙企业（有限合伙） | A method of preparing metal oxide cathode |
| CN113564517A (en) * | 2021-07-23 | 2021-10-29 | 哈尔滨工业大学 | Device and method for in-situ deposition of PVD (physical vapor deposition) coating after low-temperature rapid toughness nitriding |
| CN114540779A (en) * | 2022-02-17 | 2022-05-27 | 东莞市华升真空镀膜科技有限公司 | Composite cathode, magnetron sputtering coating equipment and coating method |
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| CN105385994A (en) * | 2015-11-27 | 2016-03-09 | 广州巴达精密刀具有限公司 | Film coating system and method for improving coating adhesion of cutting tool |
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| CN107937877A (en) * | 2017-11-15 | 2018-04-20 | 温州职业技术学院 | DLC coating apparatus based on anode technology |
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| CN113564517A (en) * | 2021-07-23 | 2021-10-29 | 哈尔滨工业大学 | Device and method for in-situ deposition of PVD (physical vapor deposition) coating after low-temperature rapid toughness nitriding |
| CN114540779A (en) * | 2022-02-17 | 2022-05-27 | 东莞市华升真空镀膜科技有限公司 | Composite cathode, magnetron sputtering coating equipment and coating method |
| CN114540779B (en) * | 2022-02-17 | 2022-12-30 | 东莞市华升真空镀膜科技有限公司 | Composite cathode, magnetron sputtering coating equipment and coating method |
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