KR930000552B1 - 할로겐가스 레이저의 가스 제어장치 - Google Patents
할로겐가스 레이저의 가스 제어장치 Download PDFInfo
- Publication number
- KR930000552B1 KR930000552B1 KR1019890013643A KR890013643A KR930000552B1 KR 930000552 B1 KR930000552 B1 KR 930000552B1 KR 1019890013643 A KR1019890013643 A KR 1019890013643A KR 890013643 A KR890013643 A KR 890013643A KR 930000552 B1 KR930000552 B1 KR 930000552B1
- Authority
- KR
- South Korea
- Prior art keywords
- gas
- halogen
- laser
- halogen gas
- storage tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
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- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Abstract
Description
Claims (2)
- 할로겐가스 레이저 발진부(1)과 상기 레이저 발진부(1)로 동작가스를 환류하는 가스환류로(2)를 포함하여, 할로겐가스로서, 플루오르가스를 사용하는 할로겐가스 엑사이머 레이저 장치에 있어서, 그 안에 수소화칼슘 또는 탄산수소나트륨의 반응물질(9a)가 채워져 있고, 상기 가스환류로(2)의 상류측으로 통하는 제어용 가스유로(7)을 거쳐서 열화한 할로겐가스를 흡입하여 상기 반응물질(9a)와 반응시켜 저비등점가스로 변화시키는 필터(9), 상기 필터로부터의 상기 저비등점가스를 저장하는 가스저장조(11), 상기 가스저장조(11)로부터의 저비등점가스를 분기로(14)를 거쳐서 유입하여 할로겐가스 농도에 비례하는 저비등점가스 농도를 검출하고, 이 농도가 소정값 이하인 경우에 전자밸브(20)에 개방신호를 보내 제2의 할로겐가스 저장조(19)내의 혼합가스를 제1의 할로겐가스 저장조(17)로 이동시킨후 상기 전자밸브(20)을 닫고, 이어서 전자밸브(18)을 개방하여 레이저장치계의 가스압에 변동이 없도록 레이저장치계의 전체의 5%이하의 용량으로 설정된 제1의 할로겐가스저장조(17)내의 혼합가스를 상기 가스환류로(2)의 하류로 보급하도록 하여 레이저장치계의 플루오르가스 농도를 항상 소정값으로 유지시키는 열전도도형의 기체검출기(16)을 포함하는 할로겐가스 레이저의 가스제어장치.
- 특허청구의 범위 제1항에 있어서, 상기 필터(9)내에서 저비등점 가스로 변화된 가스가 수소인 것을 특징으로 하는 할로겐가스 레이저의 가스제어장치.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP88-265470 | 1988-10-20 | ||
| JP63265470A JPH02112292A (ja) | 1988-10-20 | 1988-10-20 | ハロゲンガスレーザのガス制御装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR900007144A KR900007144A (ko) | 1990-05-09 |
| KR930000552B1 true KR930000552B1 (ko) | 1993-01-25 |
Family
ID=17417617
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019890013643A Expired - Fee Related KR930000552B1 (ko) | 1988-10-20 | 1989-09-22 | 할로겐가스 레이저의 가스 제어장치 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US5005181A (ko) |
| JP (1) | JPH02112292A (ko) |
| KR (1) | KR930000552B1 (ko) |
| CA (1) | CA2001035A1 (ko) |
| DE (1) | DE3935084A1 (ko) |
| GB (1) | GB2224879B (ko) |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02228086A (ja) * | 1989-02-28 | 1990-09-11 | Central Glass Co Ltd | フッ素系エキシマレーザーの出力安定化制御方法およびその装置 |
| DE4009850C1 (ko) * | 1990-03-27 | 1991-11-07 | Lambda Physik Gesellschaft Zur Herstellung Von Lasern Mbh, 3400 Goettingen, De | |
| US5214658A (en) * | 1990-07-27 | 1993-05-25 | Ion Laser Technology | Mixed gas ion laser |
| EP0575324A1 (en) * | 1990-07-27 | 1993-12-29 | Ion Laser Technology | Mixed gas ion laser |
| DE4206803C2 (de) * | 1992-03-04 | 1994-02-10 | Lambda Physik Gmbh | Verfahren zum Nachfüllen von Halogengas in das Gasreservoir eines Excimer-Lasers |
| GB2269266B (en) * | 1992-07-30 | 1995-11-22 | Eev Ltd | Metal vapour laser apparatus |
| DE19613502C2 (de) * | 1996-04-04 | 1998-07-09 | Heraeus Noblelight Gmbh | Langlebiger Excimerstrahler und Verfahren zu seiner Herstellung |
| US6282013B1 (en) | 1997-04-30 | 2001-08-28 | Lasermed, Inc. | System for curing polymeric materials, such as those used in dentistry, and for tailoring the post-cure properties of polymeric materials through the use of light source power modulation |
| US6008264A (en) | 1997-04-30 | 1999-12-28 | Laser Med, Inc. | Method for curing polymeric materials, such as those used in dentistry, and for tailoring the post-cure properties of polymeric materials through the use of light source power modulation |
| WO1999021505A1 (en) | 1997-10-29 | 1999-05-06 | Bisco, Inc. | Dental composite light curing system |
| US6116900A (en) * | 1997-11-17 | 2000-09-12 | Lumachem, Inc. | Binary energizer and peroxide delivery system for dental bleaching |
| US6200134B1 (en) | 1998-01-20 | 2001-03-13 | Kerr Corporation | Apparatus and method for curing materials with radiation |
| US5978406A (en) * | 1998-01-30 | 1999-11-02 | Cymer, Inc. | Fluorine control system for excimer lasers |
| US6240117B1 (en) | 1998-01-30 | 2001-05-29 | Cymer, Inc. | Fluorine control system with fluorine monitor |
| US6490307B1 (en) | 1999-03-17 | 2002-12-03 | Lambda Physik Ag | Method and procedure to automatically stabilize excimer laser output parameters |
| US6965624B2 (en) * | 1999-03-17 | 2005-11-15 | Lambda Physik Ag | Laser gas replenishment method |
| US6389052B2 (en) | 1999-03-17 | 2002-05-14 | Lambda Physik Ag | Laser gas replenishment method |
| US6727731B1 (en) | 1999-03-12 | 2004-04-27 | Lambda Physik Ag | Energy control for an excimer or molecular fluorine laser |
| US6157661A (en) * | 1999-05-12 | 2000-12-05 | Laserphysics, Inc. | System for producing a pulsed, varied and modulated laser output |
| US6609540B1 (en) | 1999-06-24 | 2003-08-26 | Showa Denko Kabushiki Kaisha | Method and apparatus for supplying fluorine gas |
| JP2001024265A (ja) * | 1999-07-05 | 2001-01-26 | Komatsu Ltd | 超狭帯域化フッ素レーザ装置 |
| DE10190427T1 (de) | 2000-01-25 | 2002-06-06 | Lambda Physik Ag | Energieüberwachungsvorrichtung für einen Fluormolekül-Laser |
| JP3985416B2 (ja) * | 2000-03-02 | 2007-10-03 | 松下電器産業株式会社 | ガスレーザ発振装置 |
| US6998620B2 (en) * | 2001-08-13 | 2006-02-14 | Lambda Physik Ag | Stable energy detector for extreme ultraviolet radiation detection |
| US20080130701A1 (en) * | 2006-12-05 | 2008-06-05 | Asml Netherlands B.V. | Gas laser apparatus and method |
| US9066777B2 (en) | 2009-04-02 | 2015-06-30 | Kerr Corporation | Curing light device |
| US9072572B2 (en) | 2009-04-02 | 2015-07-07 | Kerr Corporation | Dental light device |
| WO2013078456A2 (en) | 2011-11-23 | 2013-05-30 | Ipg Microsystems Llc | Continuous mass flow gas replenishment for gas lasing devices |
| US20170133813A1 (en) * | 2015-11-09 | 2017-05-11 | Transformation Point Technologies, LLC | Lasing gas recycling |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4723254A (en) * | 1984-05-01 | 1988-02-02 | Turner Robert E | Recycling apparatus for an excimer laser |
| US4674099A (en) * | 1984-05-01 | 1987-06-16 | Turner Robert E | Recycling of gases for an excimer laser |
| US4722090A (en) * | 1985-03-18 | 1988-01-26 | Mitsubishi Denki Kabushiki Kaisha | Excimer laser equipment |
| CA1298959C (en) * | 1985-09-28 | 1992-04-21 | Kohzo Hakuta | Method of refining rare gas halide excimer laser gas |
| IT1229210B (it) * | 1988-03-31 | 1991-07-25 | Central Glass Co Ltd | Metodo e dispositivo per analizzare gas contenenti fluoro. |
-
1988
- 1988-10-20 JP JP63265470A patent/JPH02112292A/ja active Pending
-
1989
- 1989-09-20 US US07/409,916 patent/US5005181A/en not_active Expired - Fee Related
- 1989-09-22 GB GB8921491A patent/GB2224879B/en not_active Expired - Fee Related
- 1989-09-22 KR KR1019890013643A patent/KR930000552B1/ko not_active Expired - Fee Related
- 1989-10-19 CA CA002001035A patent/CA2001035A1/en not_active Abandoned
- 1989-10-20 DE DE3935084A patent/DE3935084A1/de not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02112292A (ja) | 1990-04-24 |
| GB2224879B (en) | 1993-04-14 |
| GB8921491D0 (en) | 1989-11-08 |
| US5005181A (en) | 1991-04-02 |
| DE3935084A1 (de) | 1990-04-26 |
| KR900007144A (ko) | 1990-05-09 |
| CA2001035A1 (en) | 1990-04-20 |
| GB2224879A (en) | 1990-05-16 |
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