KR920019963A - 티탄산화물막 - Google Patents
티탄산화물막 Download PDFInfo
- Publication number
- KR920019963A KR920019963A KR1019920005615A KR920005615A KR920019963A KR 920019963 A KR920019963 A KR 920019963A KR 1019920005615 A KR1019920005615 A KR 1019920005615A KR 920005615 A KR920005615 A KR 920005615A KR 920019963 A KR920019963 A KR 920019963A
- Authority
- KR
- South Korea
- Prior art keywords
- titanium
- titanium oxide
- oxide film
- vacuum chamber
- tio
- Prior art date
Links
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 title claims description 7
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 title claims description 7
- 239000010936 titanium Substances 0.000 claims 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 2
- 229910052751 metal Inorganic materials 0.000 claims 2
- 239000002184 metal Substances 0.000 claims 2
- 239000000203 mixture Substances 0.000 claims 2
- KELHQGOVULCJSG-UHFFFAOYSA-N n,n-dimethyl-1-(5-methylfuran-2-yl)ethane-1,2-diamine Chemical compound CN(C)C(CN)C1=CC=C(C)O1 KELHQGOVULCJSG-UHFFFAOYSA-N 0.000 claims 2
- 229910052760 oxygen Inorganic materials 0.000 claims 2
- 239000001301 oxygen Substances 0.000 claims 2
- 229910052719 titanium Inorganic materials 0.000 claims 2
- DEIVNMVWRDMSMJ-UHFFFAOYSA-N hydrogen peroxide;oxotitanium Chemical compound OO.[Ti]=O DEIVNMVWRDMSMJ-UHFFFAOYSA-N 0.000 claims 1
- AZCUJQOIQYJWQJ-UHFFFAOYSA-N oxygen(2-) titanium(4+) trihydrate Chemical compound [O-2].[O-2].[Ti+4].O.O.O AZCUJQOIQYJWQJ-UHFFFAOYSA-N 0.000 claims 1
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical class [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 claims 1
- TWDJIKFUVRYBJF-UHFFFAOYSA-N Cyanthoate Chemical compound CCOP(=O)(OCC)SCC(=O)NC(C)(C)C#N TWDJIKFUVRYBJF-UHFFFAOYSA-N 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physical Vapour Deposition (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 혼합티탄산화물청색막을 성형하기 위한 타탄을 이온화하여 진공증착하는 장치의 개략도, 제2도는 혼하바티탄산화물청색막의 X선회전패턴을 나타내는 그래프.
Claims (2)
- 일산화티탄(TiO), 이산화티탄(TiO2), 삼산화티탄(Ti2O3), 오산화티탄(Ti3O5), 및 TinO2n-1(n:4-10의 정수)로 표시되는 기타의 티탄산화물 등의 혼합물로 이루어지며, 산소평균조성이 51-59원자%인 것을 특징으로 하는 티타산화물막.
- 진공실(1)내에 금속판(9)을 배치하고, 전기한 진공실내에서 티탄을 증발시키고, 티탄중기를 이온화시킨 다음에, 티탄산화물을 제조하기 위해 전기한 진공실내에 산소를 도입시키는 것으로 구성되어 있는 것을 특징으로 하는 금속판위에 티탄산화물막을 형성하는 방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP91-98283 | 1991-04-03 | ||
| JP3098283A JP3004760B2 (ja) | 1991-04-03 | 1991-04-03 | チタン酸化物青色膜 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR920019963A true KR920019963A (ko) | 1992-11-20 |
| KR0139619B1 KR0139619B1 (ko) | 1998-07-15 |
Family
ID=14215606
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019920005615A KR0139619B1 (ko) | 1991-04-03 | 1992-04-03 | 티탄산화물청색막 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US5225382A (ko) |
| EP (1) | EP0507545B1 (ko) |
| JP (1) | JP3004760B2 (ko) |
| KR (1) | KR0139619B1 (ko) |
| DE (1) | DE69218277T2 (ko) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5641719A (en) * | 1995-05-09 | 1997-06-24 | Flex Products, Inc. | Mixed oxide high index optical coating material and method |
| DE19607833A1 (de) * | 1996-03-01 | 1997-09-04 | Merck Patent Gmbh | Stabilisierte Aufdampfmaterialien auf Basis von Titanoxid |
| US5766784A (en) * | 1996-04-08 | 1998-06-16 | Battelle Memorial Institute | Thin films and uses |
| EP0816123B1 (en) * | 1996-06-27 | 2009-02-18 | Daiwa Seiko Inc. | Member for fishing or sport tool |
| JP3650079B2 (ja) * | 2002-04-25 | 2005-05-18 | 株式会社鈴寅 | 機能性繊維シート |
| JP5700622B2 (ja) * | 2010-05-21 | 2015-04-15 | 国立大学法人 東京大学 | 酸化チタン薄膜、その製造方法、磁気メモリ、光情報記録媒体及び電荷蓄積型メモリ |
| US8974896B2 (en) * | 2013-03-08 | 2015-03-10 | Vapor Technologies, Inc. | Coated article with dark color |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2028376B (en) * | 1978-08-23 | 1982-11-03 | Ppg Industries Inc | Electrically conductive coatings |
| JP2590464B2 (ja) * | 1986-11-17 | 1997-03-12 | セイコーエプソン株式会社 | 時計用外装部品 |
| JPS63161156A (ja) * | 1986-12-24 | 1988-07-04 | Shinko Seiki Kk | 硬質青色薄膜およびその製造方法 |
| US4931213A (en) * | 1987-01-23 | 1990-06-05 | Cass Richard B | Electrically-conductive titanium suboxides |
| JPH02270108A (ja) * | 1990-03-24 | 1990-11-05 | Sony Corp | 回転ヘッド型記録再生装置 |
-
1991
- 1991-04-03 JP JP3098283A patent/JP3004760B2/ja not_active Expired - Lifetime
-
1992
- 1992-03-27 US US07/858,456 patent/US5225382A/en not_active Expired - Fee Related
- 1992-03-31 DE DE69218277T patent/DE69218277T2/de not_active Expired - Fee Related
- 1992-03-31 EP EP92302824A patent/EP0507545B1/en not_active Expired - Lifetime
- 1992-04-03 KR KR1019920005615A patent/KR0139619B1/ko not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| DE69218277D1 (de) | 1997-04-24 |
| EP0507545A1 (en) | 1992-10-07 |
| KR0139619B1 (ko) | 1998-07-15 |
| EP0507545B1 (en) | 1997-03-19 |
| JPH04308074A (ja) | 1992-10-30 |
| JP3004760B2 (ja) | 2000-01-31 |
| DE69218277T2 (de) | 1997-07-17 |
| US5225382A (en) | 1993-07-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| E902 | Notification of reason for refusal | ||
| E701 | Decision to grant or registration of patent right | ||
| GRNT | Written decision to grant | ||
| LAPS | Lapse due to unpaid annual fee |