KR920001939B1 - Soft magnetic compound metal and magnetic head thereof - Google Patents

Abstract

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Description

Magnetic head using soft magnetic alloy film and soft magnetic alloy film

1 is a graph showing X-ray diffraction patterns performed to identify metal structures of the alloy films of Examples and Comparative Examples of the present invention.

2 is a graph showing the relationship between the concentration of CH ₄ in the sputter gas and the concentration of C in the resulting film.

3 is a graph showing the frequency characteristics for the super-permeability of the embodiment of the present invention.

4 is a graph showing an X-ray diffraction pattern performed to identify the metal structure of the alloy film of the embodiment of the present invention.

5 and 6 are diagrams showing one embodiment of the magnetic head of the present invention.

5 is an enlarged view of the main part.

6 is a perspective view.

7 shows the regeneration output of the magnetic head according to the present invention.

8 is a diagram showing the reproduction output of the conventional magnetic head.

* Explanation of symbols for main parts of the drawings

11, 12: magnetic core half 13: gap portion

14: soft magnetic film 15: amorphous soft magnetic film

16: home 17: bonding material

The present invention relates to a magnetic head used in a magnetic recording apparatus such as a soft magnetic alloy film and a video tape deck suitable for a magnetic head or the like.

In the field of magnetic recording, in order to increase the recording density, high-magnetization of recording media such as magnetic tape is being promoted, but a high saturation magnetic flux density (B _s ) is required as a material of the magnetic head corresponding thereto.

A conventional high magnetic flux density soft magnetic material (film) is a typical Fe-Si-Al alloy (sender dust), but in recent years, an amorphous alloy film mainly composed of Co, a ferromagnetic metal element, has been developed.

In recent years, the crystallization of Fe by an alloy film (Fe-C, Fe-Si, etc.) composed of microcrystals containing Fe as a main component reduces anisotropic effects (bad effects on soft magnetic properties) by miniaturizing crystals. There is an example of obtaining a film having excellent saturation magnetic flux density and excellent soft magnetic properties. In addition, in this type of magnetic head, it is required to have magnetic properties that can cope with the increase in density of the magnetic recording medium and to be excellent in terms of mechanical properties such as wear resistance or moldability.

Therefore, a composite magnetic head (commonly known as a MIG head) having a soft magnetic film having a higher saturation magnetic flux density than that of ferrite is provided on the surface of ferrite, which is conventionally used as a head material, as a magnetic head having a structure capable of meeting these requirements. have. This composite magnetic head has a structure in which a pair of magnetic core bodies made of ferrite are generally bonded by glass bonding through a soft magnetic film and a gap therebetween. By the way, the device in which the magnetic head is assembled tends to be miniaturized, light weighted, and is often used under the influence of vibration or adverse effects due to movement. Therefore, the magnetic head is required to have excellent magnetic properties, excellent wear resistance to the magnetic tape, high resistance to heat and corrosive atmosphere, that is, high wear resistance and vibration resistance. For this reason, it is necessary to perform gap formation, assembly to a case, etc. by glass welding, and the raw material of a magnetic head needs to be able to withstand the high temperature of the glass welding process in a head manufacturing process.

However, the soft magnetic alloy film of the prior art has a saturation magnetic flux density of about 10000 G (Gaussian), which is insufficient for the demand for further densification in the future. Co-based amorphous alloy films also have a high saturation magnetic flux density of 13000 G or more. However, when the saturation magnetic flux density of the conventional amorphous alloy is increased, the amount of addition of Ti, Zr, Hf, Nb, Ta, Mo, and W, which are amorphous forming elements, is increased. Although it is necessary to reduce the amount of addition is small, the stability of the amorphous structure is lowered there is a problem that can not withstand the temperature (about 500 ℃ or more) required for glass welding.

In addition, it is difficult to say that the alloy film (Fe-C, Fe-Si, etc.) composed of microcrystals containing Fe as a main component is also suitable for glass welding because the soft magnetic properties deteriorate due to crystal growth at high temperature.

The present invention solves the above problems and provides a soft magnetic alloy film having a small coercive force, a high permeability, a stable property thereof, and a high saturation magnetic flux density.

In the manufacture of the magnetic head of the above structure, it is necessary to join a pair of magnetic core halves by glass bonding, so that the magnetic core halves are usually heated to a high temperature of 520 ° C. or higher during glass bonding. However, when attempting to manufacture a magnetic head using a conventional Co-MrP amorphous soft magnetic film (M is at least one of Ti, Zr, Hf, Nb, Ta, Mo, w) such as Co-Ta-Hf-based glass Bonding causes a diffusion reaction in which oxygen is involved at the interface between the magnetic core half and the soft magnetic film, thereby degrading the magnetic properties of the boundary portion. That is, since M (Ta, Hf, etc.) in the soft magnetic film has a high affinity with oxygen, oxygen atoms in the ferrite constituting the magnetic core half body diffuse to the soft magnetic film side at a high temperature, and oxygen atoms in the ferrite are insufficient to form a ferrite composition. It causes change and deteriorates magnetic properties. When the deteriorated portion is formed by the soft magnetic film due to such magnetic properties, the portion may form a pseudo gap, which may cause noise to increase due to the formation of the pseudo gap, thereby degrading the performance of the magnetic head.

The present invention has been made to solve the above problems, and an object of the present invention is to provide a magnetic head capable of suppressing diffusion of oxygen during glass bonding, suppressing the formation of a pseudo gap, and reducing noise generated in the pseudo gap.

x

96, 2

z

25, 0.1

w

20, x+z+w=100의 관계를 만족시킴과 동시에 그 금속조직이 기본적으로 평균입경 0.05㎛ 이하의 결정립으로 이루어지고 그 일부에 원소 M의 탄화물의결정상을 포함시킨 것이다.In order to solve the above problems, the present invention described in claim 1 is represented by Co x MzCw, and M is a metal element consisting of one or two or more of Ti, Zr, Hf, Nb, Ta, Mo, and W. Or a mixture thereof and the composition ratio x, z, w is 5 with atoms 5

x

96, 2

z

25, 0.1

w

While satisfying the relationship of 20, x + z + w = 100, the metal structure is basically composed of grains having an average particle diameter of 0.05 µm or less, and a part of which contains the crystal phase of the carbide of element M.

In order to solve the above problems, the invention described in claim 4 is made so that the metal structure described in claim 1 is basically composed of grains and amorphous structures having an average particle diameter of 0.05 μm or less.

x

96, 0.1

y

20, 2

z

25, 0.1

w

20, x+y+z+w=100이 되는 관계를 만족시킴과 동시에 그 금속조직이 기본적으로 평균입경 0.05㎛ 이하의 결정립으로 이루어지고 그 일부에 원소 M의 탄화물의 결정상을 포함시킨 것이다.In order to solve the above problems, the invention described in claim 3 is represented by a composition formula of Co x TyMzCw, T is Fe, Ni, a metal element consisting of two or more of Mn, or a mixture M thereof is Ti, Metal element or mixture thereof consisting of one or two or more of Zr, Hf, Nb, Ta, Mo, and W; composition ratios x, y, z, w are 50% by atom

x

96, 0.1

y

20, 2

z

25, 0.1

w

20, x + y + z + w = 100 is satisfied, and the metal structure is basically composed of crystal grains having an average particle diameter of 0.05 µm or less, and a part of the crystal phase of the carbide of element M is included.

In order to solve the above problems, the invention described in claim 4 is made so that the metal structure described in claim 3 is basically composed of grains and amorphous structures having an average particle diameter of 0.05 µm or less.

a

93, 5

c

25, 0.5

e

25, a+c+e=100의 관계를 만족함과 동시에 그 금속조직이 평균입경 0.05m 이하의 결정립으로 이루어지고 결정립의 일부에 V의 탄화물의 결정상을 포함시킨 것이다.In order to solve the above problems, the invention described in claim 5 is represented by the composition formula Co a V c C e and the composition ratios a, c, e are represented by 5 atoms.

a

93, 5

c

25, 0.5

e

The relationship of 25, a + c + e = 100 is satisfied, and the metal structure is composed of crystal grains having an average particle diameter of 0.05 m or less, and the crystal phase of V carbide is included in part of the grains.

In order to solve the above problem, the invention described in claim 6 is made so that the metal structure described in claim 5 is composed of crystal grains and amorphous structures having an average particle diameter of 0.05 μm or less.

a

96, 0.5

c

25, 0.5

d

25, 0.5

e

25, 2

c+d, a+c+d+e=100이 되는 관계를 만족시킴과 동시에 그 금속조직이 평균입경 0.05㎛ 이하의 결정립으로 이루어지고 결정립의 일부에 V의 탄화물과 M의 탄화물의 결정상을 포함시킨 것이다.In order to solve the above problems, the invention described in claim 7 is represented by the composition formula Co a V c M d C e and the composition ratios a, c, d, e are represented by 5 atoms.

a

96, 0.5

c

25, 0.5

d

25, 0.5

e

25, 2

It satisfies the relationship of c + d and a + c + d + e = 100, and the metal structure is composed of grains having an average particle diameter of 0.05 µm or less, and the crystal phases of carbides of V and carbides of M are included in a part of the grains. It is.

In order to solve the above problems, the invention described in claim 8 is to make the metal structure described in claim 7 composed of grains and amorphous structures having an average particle diameter of 0.05 μm or less.

a

93, 0.1

b

20, 5

c

25, 0.5

e

25, a+b+c+e=100의 관계를 만족시킴과 동시에 그 금속조직이 평균입경 0.05㎛ 이하의 결정립으로 이루어지고 결정립의 일부에 V의 탄화물의 결정상을 포함시킨 것이다.In order to solve the above problems, the invention described in claim 9 is represented by the composition formula Co a T b V c C e and the composition ratios a, b, c, e are 50% by atom.

a

93, 0.1

b

20, 5

c

25, 0.5

e

The relationship of 25, a + b + c + e = 100 is satisfied, and the metal structure is composed of crystal grains having an average particle diameter of 0.05 μm or less, and a part of the crystal grains includes a V carbide phase.

In order to solve the above problems, the invention described in claim 10 is made so that the metal structure described in claim 9 is composed of crystal grains and amorphous structures having an average particle diameter of 0.05 μm or less.

a

96, 0.1

b

20, 0.5

c

25, 0.5

d

25, 0.5

e

25, 2

a+d, a+b+c+e=100의 관계를 만족시킴과 동시에 그 금속조직이 평균입경 0.05㎛ 이하의 결정립으로 이루어지고 결정립의 일부에 V의 탄화물과 M의 탄화물의 결정상을 포함시킨 것이다.In order to solve the above problems, the invention described in claim 11 is represented by the composition ratio Co a T b V c M d C e and the composition ratios a, b, c, d, e are 50% by atom.

a

96, 0.1

b

20, 0.5

c

25, 0.5

d

25, 0.5

e

25, 2

While satisfying the relationship of a + d, a + b + c + e = 100, the metal structure is composed of grains having an average particle diameter of 0.05 μm or less, and a part of the crystal grains includes a carbide phase of V and a carbide phase of M. will be.

In order to solve the above problems, the invention described in claim 12 is made so that the metal structure described in claim 11 is composed of crystal grains and amorphous structures having an average particle diameter of 0.05 μm or less.

The present invention is explained in more detail below.

As a method for producing the metal film, an alloy film is produced by a thin film forming apparatus such as sputtering or intermediate bonding. As the sputtering apparatus, conventional ones such as RF two-pole sputter, DC sputter, magnetron sputter, three-pole sputter, ion beam sputter, and counter-target sputter can be used. In addition, as a method of adding C to the film, a graphite pellet is placed on a target plate to be a composite target, and sputtering is carried out, or a target (Co-TM system) containing no C is used. The reactive sputtering method, which is sputtered in a gas atmosphere mixed with hydrocarbons such as CH ₄ ), can be used. In the reactive sputtering method, the C concentration in the film can be easily controlled, so that an excellent film having a desired C concentration can be obtained.

The film thus produced contains an amorphous phase in a considerable proportion and is unstable, so that the microcrystals are precipitated by performing a heat treatment for heating at about 400 to 700 ° C. And this heat treatment is obtained in a static magnetic field or a rotor field. This heat treatment can also be performed in combination with the glass welding step in the manufacturing process of the magnetic head.

In addition, the precipitation process of the microcrystals does not need to be carried out completely, and a large number of microcrystals (preferably 50% or more) need to be precipitated, so that even if some of the amorphous components remain, the remaining amorphous components do not interfere with characteristics. .

55% 또는 a

55%가 필요하다. 단 청구의 범위 제 3, 4, 9, 10, 11, 12항의 발명의 경우는 원소 T가 자성을 보충하므로 x

50% 또는 a

50%이면 된다. 또 청구의 범위 제 1, 2, 3, 4항의 발명에 있어서 양호한 연자기특성을 얻기 위해서는 x

96%가 아니면 안된다.Hereinafter, the reason which limited the component as mentioned above is demonstrated. Co is the main component and the element that is responsible for the magnetism. To obtain a saturation magnetic flux density of at least ferrite (B _s = 5000G), x

55% or a

55% is required. However, in the case of the invention of claims 3, 4, 9, 10, 11 and 12, the element T supplements the magnetism, so that x

50% or a

50% is sufficient. In addition, in order to obtain a good soft magnetic property in the invention of Claims 1, 2, 3, and 4, x

It must be 96%.

93%가 된다.In the case of not including the element M but including V as in the invention of claims 5, 6, 9, and 10, the range for obtaining good soft magnetic properties is narrowed.

93%.

2%로 할 필요가 있고, 청구의 범위 제7, 8, 11, 12항의 발명에서는 d

0.5% 또는 c+d

2%로 할 필요가 있으나 너무 많으면 포화 자기밀도가 저하되어 버리므로 청구의 범위 제1~4항의 발명에 있어서는 z

25%, 청구의 범위 제7, 8, 11, 12항의 발명에서는 d

25%로 할 필요가 있다.Element M is necessary for good soft magnetic properties and combines with C to form carbide microcrystals. In the invention of claims 1 to 4, in order to maintain good soft magnetic properties,

It is necessary to set it as 2%, and in the invention of claims 7, 8, 11 and 12, d

0.5% or c + d

It is necessary to set it as 2%, but if it is too much, since the saturation magnetic density will fall, in the invention of Claims 1-4, it is z

25%, in the invention of claims 7, 8, 11 and 12, d

It needs to be 25%.

96%가 된다.In the case of the compound addition of elements M and V as in the invention of claims 7, 8, 11 and 12, in order to obtain good soft magnetic properties, a

96%.

0.1%, 청구의 범위 제5 12항의 발명에서는 e

0.5%로 할 필요가 있다. 또 너무많으면 포화자속밀도가 저하되어 버리므로 청구의 범위 제1~4항의 발명에서는 w

20%, 청구의 범위 제5 12항의 발명에서는 e

25%로 할 필요가 있다.C is necessary to improve soft magnetic properties and to improve heat resistance, and is combined with elemental MV to form carbide microcrystals. In order to maintain good soft magnetic properties and thermal stability, in the invention of claims 1 to 4, w

0.1%, claim 5 In the invention of claim 12, e

It is necessary to make it to 0.5%. In addition, since too much saturation magnetic flux density falls, in invention of Claim 1-4, it is w

20%, claim 5 in the invention of claim 12

It needs to be 25%.

The microcrystals of carbides of the elements M and V act as pinning sites of the magnetic walls to improve the high frequency characteristics of the magnetic permeability and to disperse uniformly in the film, thereby decreasing the soft magnetic properties due to the growth of Co crystals by heat treatment. There is an action to prevent. In other words, as Co grain grows and grows, the adverse effect of crystalline anisotropy is increased, and the soft magnetic properties deteriorate. However, the microcrystals of carbides of elements M and V act as a barrier for the grains of Co to prevent deterioration of soft magnetic properties.

In addition, since the metal structure is basically microcrystals of 0.05 µm or less, it is excellent in thermal stability as compared to amorphous, so that the added element can be reduced and the saturation magnetic flux density can be increased.

20%로 하지 않으면 안된다. 또한 Fe, Ni, Mn은 Co의 결정구조를 fcc(면심입방구조)로하여 안정화하는 작용이 있고 이 fcc는 Co의 다른 결정구조인 hcp(조밀6방구조)보다도 연자성에 뛰어나 있음과 동시에 결정자기 이방성이 작고 연자성합금막으로서 바람직한 특성을 발휘시킨다.Elements T (Fe, Ni, Mn) are elements added for the purpose of adjusting magnetostriction. In the Co x M z V c C w system, magnetostriction is a negative value in the range of 10 ^-6 and can be used, but magnetostriction is minimized to minimize the deterioration of magnetic properties due to processing distortion due to processing on the magnetic head or thermal distortion due to glass welding. It is preferable to be zero, and for this, addition of Fe, Ni, and Mn, which has an effect of defining magnetostriction, is effective. In the invention of claims 1 to 4, the upper limit of the amount to be added is such that the magnetostriction is not more than +10 ^-6 units.

You must make it 20%. In addition, Fe, Ni, and Mn stabilize the Co crystal structure by fcc (face-centered cubic structure), and this fcc is superior in soft magnetic properties to other magnetic structures of Co, such as hcp (dense hexagonal structure). The anisotropy is small and exhibits desirable characteristics as the soft magnetic alloy film.

20%로 하지 않으면 안된다.In addition, by combining a plurality of elements from among Fe, Ni, and Mn, the magnetostriction is adjusted and the soft magnetic properties are improved. In order not to damage the soft magnetic properties by these combinations, the total amount of element T is defined in the claims. In the inventions 1 to 4, y

You must make it 20%.

c

25로 한 것은 원소 M을 함유하지 않고 V를 함유시킨 합금막의 경우 V가 소량일때는 열처리후의 결정립이 원소 M의 첨가일때만큼 미세하게되지 않기 때문에 5

c로 할 필요가 있기 때문이다.Meanwhile, in the inventions of claims 5, 6, 9 and 10, the composition ratio c of 5 is 5

c

In the case of an alloy film containing V and not containing element M, when the amount of V is small, the crystal grains after heat treatment are not as fine as that of the addition of element M.

This is because it needs to be c.

c

25로 한 것은 원소 M와 V의 복합효과에서는 원소 M의 첨가에 의하여 결정립이 충분히 미세화하므로 0.5

c이면 좋다.In the invention of claims 7, 8, 11 and 12, the composition ratio c of V is 0.5.

c

25 is 0.5 because the crystal grains are sufficiently refined by the addition of the element M in the composite effect of the elements M and V.

c is sufficient.

In the magnetic head of the present invention, the soft magnetic film has a soft core film on the magnetic core half side thereof, and Co x M z C w (M is at least one of Ti, Zr, Hf, Nb, Ta, Mo, and W, and x, z, w are composition ratios (atoms). %)) And predominantly formed into a microcrystalline structure with a grain size of 0.05 µm or less,

Co x M z

(M is at least one of Ti, Zr, Hf, Nb, Ta, Mo, and W, and x and z are amorphous and have a composition having a composition ratio (atomic%)). In addition, the soft magnetic film

Co x t y M z C w

(T is at least one of Fe, Ni, Mn, M is at least one of Ti, Zr, Hf, Nb, Ta, Mo, W, and x, y, z, w is the composition ratio (atomic%)) Predominantly with a microcrystalline structure with a grain size of 0.05 µm or less,

Co x M z

(M is at least one of Ti, Zr, Hf, Nb, Ta, Mo, and W, and x and z are formed in an amorphous form having a composition of composition ratio (atomic%)).

In addition, all of the soft magnetic films have a composition of Co x M y C z and are predominantly formed of microcrystalline structures having a grain size of 0.05 µm or less.

In addition, the entire soft magnetic film has a composition of Co x T y M z C w and predominantly forms a fine crystalline structure having a grain size of 0.05 µm or less.

In the above soft magnetic film, since the composition is mainly limited to the addition of a component that reduces the saturation magnetic flux density, a high saturation magnetic flux density of up to 16000 G is obtained. In addition, the elements M or V and C are included, and the metal structure is made of fine grains, and the adverse effect on the soft magnetic properties due to the magnetic anisotropy is reduced, so that a good soft magnetic property is obtained. Further, carbides of the element M or V are precipitated to suppress the growth of grains containing Co as a main component, so that the grains do not coarsen even when heated to 600 ° C or higher in the glass welding process.

In the magnetic head, M (Ta, Hf, etc.) in a microcrystalline structure having a composition of Co x M z CW Co x T y M z CW and predominantly having a grain size of 0.05 µm or less chemically bonds with carbon to carbide (TaC, HfC, etc.), the affinity with oxygen of the magnetic core half is weakened, so that the diffusion of oxygen from the magnetic core half side to the soft magnetic film side at the time of glass bonding is suppressed, and the formation of the pseudo gap is suppressed.

EXAMPLE

`` Soft magnetic film 1 ''

(1) the tabernacle

The alloy film of the composition shown in Table 1 which was mentioned later was formed using the RF2 pole sputter apparatus.

① An alloy target having a composition of Co ₈₄ Ta ₁₀ H _f6 (the additive number is atomic%) for sample A ₁ is used, and a ferret of Fe is placed on the alloy target having a composition of Co ₈₄ Ta ₁₀ Hf ₆ for sample B ₁ . C (carbon) was distributed in the film by using a composite target and sputtering in a mixed gas atmosphere of Ar gas and CH ₄ gas. 2 shows the relationship between the concentration of CH ₄ in the sputter gas (% by volume) and the concentration of carbon in the obtained film (atomic%).

It was found that the carbon concentration in the film can be arbitrarily controlled by changing the concentration (partial pressure) of CH ₄ from FIG. In addition, the film-forming thickness was 5 micrometers.

(2) heat treatment

After film formation, the mixture was maintained at 550 ° C. for 20 minutes.

(3) measurement

Measurement of saturation magnetic flux density (B _s ), permeability (μ) and coercive force (Hc) and measurement of magnetostriction after heat treatment with respect to the alloy film produced as described above and the sender alloy film (comparatively) formed by sputtering Was done. The above result was shown in Table 1.

Sample A ₁ in Table 1 is an example containing no element T (Fe, Mn, Ni), and the same magnetic permeability as the sender film and higher saturation magnetic flux density and lower coercive force than the sender film are obtained. In the conventional amorphous alloy, the saturation magnetic flux density exhibits such a high value is crystallized in heat treatment under equivalent conditions and the permeability is lowered to 100 or less. Therefore, the magnetic properties after the glass bonding deteriorate, so that a satisfactory characteristic as the magnetic head cannot be obtained.

Sample B ₁ in Table 1 contains Fe in the alloy film, which suppresses low magnetostriction, increases saturation magnetic flux density, and decreases coercive force.

Sample C ₁ in Table 1 is an example in which the components of Co and Fe are increased compared to sample B ₁ , and a high saturation magnetic flux density of 15600 G is obtained.

Next, an X-ray diffraction pattern was measured to identify the metal structure of the alloy film. FIG. 1 shows a diffraction pattern of an amorphous film (Sample E ₁ ) having a composition of C ₈₄ Ta ₁₀ Hf ₆ after the heat treatment of Sample A ₁ and Sample C ₁ after the heat treatment.

The diffraction pattern of the film of Sample A ₁ shows the apparent peaks indicating the presence of Co and Ta C crystals of Co and hcp (hexagonal dense structure) of fcc (faceted cubic structure), which can be seen in comparison with Sample E ₁ of amorphous film. Crystallinity is confirmed as it is.

TABLE 1

TABLE 2

That is, it shows that the metal structure of the alloy film is not fully amorphous but is crystallized. When the crystal grain size is calculated from the peak width of the peak in Fig. 1, the crystal structure is 30 to 40 GPa in fcc-Co and about 20 GPa in Ta C, and all are composed of extremely fine grains.

The samples A ₁ and C ₁ were almost entirely microcrystalline, but exhibited approximately good magnetic properties even when heat treatment was performed at a lower temperature to maintain 50% or less of the amorphous phase. Sample C ₁ contains Fe, and as the Fe is added, the peak of hcp-Co disappears as shown in FIG. 1, and the fcc-Co peak is mainly used to support the results shown in Table 1. Again, an alloy film having a thickness of 5 μm having the same composition as that of Sample A ₁ was heat-treated in a rotor field at 570 ° C., and the frequency characteristic of the magnetic permeability was measured. The results are shown in FIG. In spite of the thickness of 5㎛, it shows high magnetic permeability of more than 1000 up to 10MHz, which proved to be excellent soft magnetic properties.

`` Soft magnetic film 2 ''

(1) the tabernacle

The alloy film shown in Table 2 was formed using the Rf2 electrode sputtering device.

(1) Using a composite target formed by appropriately arranging V, Nb, and Fe pellets on a Co target, sputtering was performed in a mixed gas atmosphere of Ar gas and CH ₄ gas to form a thin film having a thickness of 5 to 6 µm.

(2) heat treatment

After film formation, it is kept at 550 ° C for 20 minutes in the rotor field.

(3) measurement

Measurement and magnetostriction of the saturation magnetic flux density (B _s ), the magnetic permeability (μ), and the coercive force (H _c ) after heat treatment of the alloy film and the sender alloy film (comparative example) formed by sputtering as described above The measurement was made.

The above results are shown in Table 2.

Sample A ₂ in Table 2 shows a particularly high saturation magnetic flux density (13500 G) than the sender film. Generally, in an amorphous alloy having a saturation magnetic flux density of 13000 G, a saturation magnetic flux density having such a high value is crystallized under heat treatment (550 ° C. for 20 minutes) under the same conditions, and the permeability is lowered to 100 or less. In other words, in the amorphous alloy, the magnetic properties after glass bonding deteriorate, so that satisfactory properties as the magnetic head cannot be obtained. Therefore, it is clear that sample A ₂ of the present invention is an excellent alloy film showing a high saturation magnetic flux density even when high temperature is subjected to heat treatment. However, the film of Sample A ₂ has a slight decrease in the characteristics of permeability and coercive force as compared to the Sendust alloy film, but these properties can be improved in Samples B ₂ and C ₂ .

Sample B ₂ of Table 2 is the addition of Nb to the alloy film to maintain the saturation magnetic flux density after heat treatment by the addition of Nb, and as shown in Table 2, the magnetic permeability and coercive force that is equal to or higher than that of the sendust alloy film. I could get it.

Sample C ₂ of Table 2 is the addition of Nb and Fe to the alloy film to maintain a high saturation magnetic flux density after heat treatment, excellent magnetic permeability and coercive force, it was possible to reduce the magnetostriction constant to 10 ^-7 by addition of Fe.

Next, an X-ray diffraction pattern was measured to identify the metal structure of the alloy film. Figure 4 A ₂ sample the state of the film X-ray diffraction pattern of the film formation as in the film of the composition of the film ① and exhibited a rotation pattern ② obtained after the heat treatment.

In the pattern of ① in FIG. 4, the diffraction peaks of very clear Co crystals (hcp-Co: Co of 6-dense dense structure and fcc-Co: Co of face-centered impregnated structure) are shown. Lower than the value shown in FIG. 2).

In the pattern of ② in FIG. 4, a peak indicating the presence of microcrystals of carbides of V, such as V ₄ C ₃ and V ₂ C, in addition to the microcrystalline peaks of Co is shown. (2) In this pattern, when the average grain size of Co is calculated from the half width of the diffraction pits, it is found to be about 60 to 70 microns and extremely fine. In this case, Co crystal grains do not grow and coarse grains do not occur even when heat treatment is performed at a high temperature. Thus, since carbide microcrystals of thermally stable V are uniformly dispersed, this carbide prevents the growth of Co grains. Because there is. It is understood that when the grains of Co become finer, the magnetic anisotropy of Co is averaged, so that the anisotropic dispersion decreases and the soft magnetic property becomes good as a result.

`` Magnetic head ''

5 and 6 show the magnetic head of the present invention, in which Mn-Zn ferrites and the like are formed so as to face magnetic core halves 11 and 12 made of ferrite via the gap portion 13.

x

96%, 2%

z

25%, 0.1

w

20%, x+z+w=100%의 관계를 만족시킴과 동시에 우위적으로 결정입경이 0.05㎛이하의 미세결정조직으로 이루어진 연자성막(14)과 종래부터 사용되고 있는 Co x M z(M은 Ti, Zr, Hf, Nb, Ta, Mo, W중 적어도 1종이상으로 이루어진 것이고 x, z는 조성비(원자%)를 나타낸다)로 표시되는 조성을 가지는 비정질연자성막(15)에 순차형성되고 자기코어반체(11, 12)는 각 비정질연자성막(15)의 사이에 SiO₂등으로 이루어진 갭스페이서층을 개재시켜 갭부(13)를 형성함과 동시에 이 상태에서 갭부(13)를 형성함과 동시에 이 상태에서 갭부(13)를 사이에 끼우도록 자기코어반체(11, 12)에 형성된 홈(16)에 유리등의 본딩재(17)를 충전하여 접합되어 있다.On the gap portion 13 side of these magnetic core halves 11, 12, Co x M z C w (M is formed of at least one of Ti, Zr, Hf, Nb, Ta, Mo, and W). Composition ratio x, z, w in atomic%: 55%

x

96%, 2%

z

25%, 0.1

w

20%, x + z + w = 100%, and soft magnetic film 14 composed of a microcrystalline structure with a grain size of 0.05 µm or less, and Co x M z (M It consists of at least one of Ti, Zr, Hf, Nb, Ta, Mo, and W, and x and z are sequentially formed on the amorphous soft magnetic film 15 having a composition represented by the composition ratio (atomic%), and the magnetic core. The half bodies 11 and 12 form a gap portion 13 between the amorphous soft magnetic films 15 by interposing a gap spacer layer made of SiO ₂ or the like, and simultaneously form the gap portion 13 in this state. In the state, the bonding material 17, such as glass, is filled and bonded to the groove | channel 16 formed in the magnetic core half bodies 11 and 12 so that the gap part 13 may be interposed between them.

Here, the components of the soft magnetic film 14 are set to the above composition ratios for the following reasons.

55at%가 필요하다. 또 연자성을 얻기 위해서는 x

96at%가 아니면 안된다.Co is a main component and an element responsible for magnetism, and in order to obtain B _s (saturated magnetic flux density) of at least ferrite (B _s ≒ 5000G), x

55at% is required. Also, to get soft magnetic, x

It should be 96at%.

2at%로 할 필요가 있으나 너무 많으면 B_s가 저하되어 버리므로 z

25at%로 할 필요가 있다.M is required in order to improve soft magnetic properties, and combines with C to form carbide microcrystals. Z to maintain soft magnetic

It is necessary to set it to 2at%, but if it is too much, B _s will be lowered, so z

It is necessary to set it to 25at%.

0.1at%로 할 필요가 있다. 너무 많으면 B_s가 저하되어 버리므로 w

20at%로 할 필요가 있다.C is necessary to improve soft magnetic properties and to improve heat resistance, and M is bonded to form microcrystals of carbides. W to maintain soft magnetic and thermal stability

It is necessary to be 0.1 at%. Too much will decrease B _s , so w

It is necessary to set it to 20at%.

Next, an example of a method of forming the magnetic core halves 11 and 12 by appropriately forming the soft magnetic film 14 and the amorphous soft magnetic film 15 on the surface of the core substrate made of ferrite will be described.

By using sputtering device which has more than 2 system of gas introduction system and can independently control the flow rate, Co, Ta, Hf alloy target is used for the initial 50 ~ 2000Å, and Ar and CH4 are sputtered in mixed gas. -Hf-C film is formed, and the remaining thickness (several mu m) is sputtered in pure Ar to form a Co-Ta-Hf film.

As the sputtering method, high frequency two-pole sputters, magnetron (RF, DC) sputters, three-pole sputters, opposing target sputters, and ion beam sputters are used.

In such a magnetic head, M (Ta, Hf) in the soft magnetic film 14 made of Co x M z CW chemically bonds with carbon and is present as carbide MC (Ta C, Hf C, etc.). Since the affinity with carbon of 12) is weakened, it is possible to support the diffusion of oxygen from the magnetic core half bodies 11 and 12 to the soft magnetic film 14 and the amorphous soft magnetic film 15 side during glass bonding. Formation of the gap can be suppressed. In addition, since the soft magnetic film 14 is made of fine crystal grains and the influence of soft magnetic properties due to crystal magnetic anisotropy is reduced, good ductility is obtained.

In addition, the microcrystal of MC of the soft magnetic film 14 acts as a pinning site of the magnetic wall to increase the high frequency of permeability, and is uniformly dispersed in the film. There is action to prevent damage. In other words, as Co grain grows and grows, the adverse effect of the crystal anisotropy increases, and the soft magnetic deteriorates. However, MC prevents this because microcrystals act as a grain barrier of Co. In addition, since the metal structure is predominantly microcrystalline, the thermal stability is superior to that of amorphous, so that the number of participating elements can be reduced, thereby increasing B _s .

In addition, in the case of forming the soft magnetic material 14 and the amorphous soft magnetic film 15, if the sputtering device having two or more gas introduction systems is used, only the structure of stopping the CH ₄ gas on one system in the middle without changing the sputter target or the like There is an advantage that can be produced in the same way.

[Production example]

A film sputtered with Co _78.1 Ta _9.0 Hf _4.6 C _8.3 in a mixed gas of Ar and CH _{4 to} a thickness of 300 kPa was formed on the surface of a core gas made of Mn-Zn ferrite by a high frequency bipolar sputter, followed by sputtering in pure Ar to form Co _84.0. Ta _10.0 Hf was formed _6.0 5㎛ film.

Subsequently, a pair of magnetic core semiconductors obtained were bonded together, glass bonded at 550 ° C., and a gap was formed to prepare a magnetic head.

The frequency characteristics of the regeneration output of the magnetic head are shown in FIG. 3 and the frequency characteristics of the regeneration output of the magnetic head using an amorphous soft magnetic film of Co _84.0 Ta _10.0 Hf _{6.0, which} is known in the prior art, are shown in FIG.

According to FIG. 7 and FIG. 8, in the conventional magnetic head, output drop can be seen at every constant frequency. This is considered to be due to the output loss caused by the interference between the main gap and the pseudo gap, and the pseudo gap noise was 4 to 6 dB.

On the other hand, in the magnetic head according to the present invention, it became clear that smooth output was obtained in all frequencies and the pseudogap noise was within 0.7 dB and was greatly improved.

In addition, in the above embodiment, the soft magnetic film has a two-layer structure of the soft magnetic film 14 and the amorphous soft magnetic film 15, but instead of forming the soft magnetic film 14 alone, the diffusion of oxygen is prevented in the same manner as in the above embodiment to prevent pseudogap. The formation of can be suppressed, and good soft magnetic properties can be obtained, and even when heated at the time of glass bonding, crystal grains do not coarsen and soft magnetic properties can be maintained.

x

96%, 0.1%

y

20%, 2%

z

25%, 0.1%

w

20%, x+y+z+w=100%의 관계를 만족시킴과 동시에 우위적으로 결정입경이 0.05㎛이하의 미세결정조직으로 이루어진 연자성막으로 형성해도 좋다.In addition to the soft magnetic film 14 of the above embodiment, T (Fe, Ni, Mn) was added to adjust the magnetostriction and stabilize the crystal lattice structure, that is, Co x T y Mz cw (T is Fe, Ni, Co, and M is made of at least one of Ti, Zr, Hf, Nb, Ta, Mo, and W), and the composition ratio x, z, w is atomic%: 50%

x

96%, 0.1%

y

20%, 2%

z

25%, 0.1%

w

20% and x + y + z + w = 100% may be satisfied and a soft magnetic film composed of a microcrystalline structure with a crystal grain size of 0.05 mu m or less may be advantageously formed.

T, that is, the components of Fe, Ni, and Mn in the above composition ratios are for the following reasons.

20at%로 하지 않으면 안된다. 또 Fe, Ni는 Co의 결정구조를 fcc(면심입방구조)로 하여 안정화하는 작용이 있고 이 fcc는 Co의 다른 결정구조인 hcp(조밀6방구조)보다도 연자성에 뛰어나 있음과 동시에 결정자기 이방성이 작아 연자성합금막으로 바람직한 특성을 발휘시킨다.T, that is, Fe, Ni, and Mn are elements added for the purpose of magnetostrictive composition. In Co x M z CW, the magnetostriction is a negative value of 10 ^-6 and can be used. The magnetostriction is zero (0) to minimize the deterioration of magnetic properties due to the processing distortion due to the processing of the magnetic head or the thermal distortion due to the glass volume. It is preferable to add Fe and Mn, which are effective for the magnetostriction. The upper limit of the addition is to prevent magnetostrictive pigs for more than +10 ^-5 y

You have to do it at 20at%. In addition, Fe and Ni have a function of stabilizing Co crystal structure as fcc (face-centered cubic structure), and fcc has superior soft magnetic property as well as crystal magnetic anisotropy than hcp (dense hexagonal structure), which is another crystal structure of Co. It is small and exhibits desirable characteristics as a soft magnetic alloy film.

20at%로 하지 않으면 안된다.Ni is an element that causes magnetostriction, and it is possible to form magnetostrictive by combining with Fe or Mn that has magnetostriction, and in order not to damage soft magnetism by these combinations, the total amount of T is y.

You have to do it at 20at%.

50t%이면 좋다.When T is added, T (Fe, Ni, Mn) supplements the magnetism, so Co is x

50t% is good.

In such a magnetic head, the same effects as those of the above embodiment can be obtained, and by adding T (Fe, Ni, Mn) to adjust magnetostriction and to adjust the crystal structure, better soft magnetic properties can be obtained.

x

96%, 0.1%

y

20%, 2%

z

25%, 0.1%

w

20%, x+y+z+w=100%의 관계를 만족시킴과 동시에 우위적으로 결정입경이 0.05㎛이하의 미세결정조직으로 연자성막전부를 형성해도 좋다.In addition, to participate in the T, that is, Co x T y M z C w (T is Fe, Ni, Mn and M is at least one of Ti, Zr, Hf, Nb, Ta, Mo, W) With the composition shown, the composition ratios x, z, and w are atomic%: 50%

x

96%, 0.1%

y

20%, 2%

z

25%, 0.1%

w

20% and x + y + z + w = 100%, while satisfy | filling the relationship and predominantly, the soft magnetic film whole part may be formed by the microcrystal structure whose crystal grain size is 0.05 micrometer or less.

As described in detail above, in the present invention, the soft magnetic alloy film is a soft magnetic alloy film composed mainly of Co and has a higher saturation magnetic flux than the sender alloy film because the addition of a component that lowers the saturation magnetic flux density is limited. A high saturation magnetic flux density of 16000 G is obtained.

In addition, the components M (Ti, Zr, Hf, Nb, Ta, Mo, W), V, and C, which improve soft magnetic properties are added, and the metal structure is composed of fine crystal grains, and the soft magnetic properties due to crystal magnetic anisotropy. Since adverse effects are reduced, good soft magnetic properties are obtained. In addition, since the element M or V, which is made up of fine grains and forms carbides with C, the grains do not coarsen even when heated to 600 ° C. or higher in the glass welding process, and the above characteristics are maintained. It is suitable as an element of a magnetic head having high performance.

In addition, the above effects can be further enhanced by adding magnetism T (Fe, Ni, Mn) to the composition to adjust the magnetostriction and the crystal structure.

In the present invention, the magnetic head has a composition in which at least the magnetic core half side of the soft magnetic film has a composition of Co x M z C w and Co x T y M z C w and is predominantly formed of a microcrystalline structure having a grain size of 0.05 µm or less. Therefore, oxygen diffusion from the magnetic core half side to the soft magnetic film side can be prevented during glass bonding. Therefore, formation of a pseudo gap can be suppressed, and noise resulting from a pseudo gap can be reduced.

In addition, the part consisting of the microcrystalline structure is M (Ti, Zr, Hf, Nb, Ta, Mo, W) and C is added to the components to improve the soft magnetic properties and at the same time the metal structure is composed of fine grains and crystal magnetic anisotropy Since the influence on the soft magnetic properties is reduced, good soft magnetic properties are obtained. In addition, since M is formed of fine crystal grains and carbides with C, soft magnetism can be maintained without coarsening even when heated during glass bonding.

In addition, in the case of the microcrystalline structure to which T (Fe, Ni, Mn) is added, the soft magnetic property can be further improved by adjusting the magnetostriction and the crystal structure.

Claims (16)

The composition formula is represented by Co x M z C w, M is a metal element or a mixture of one or two or more of Ti, Zr, Hf, Nb, Ta, Mo, and W, and the composition ratio x, z, w is atomic% To 55

x

96, 2

z

25, 0.1

w

Satisfying the relationship of 20, x + z + w = 100%, and the metal structure is basically composed of crystal grains having an average particle diameter of 0.05 µm or less, and a part thereof includes a crystal phase of carbide of element M Soft magnetic alloy film. The soft magnetic alloy film according to claim 1, wherein the metal structure is basically composed of grains and amorphous structures having an average particle diameter of 0.05 µm or less. The composition formula is represented by Co x T y M z C w and T is a metal element or mixture thereof consisting of one or two or more of Fe, Ni and Mn, and M is Ti, Zr, Hf, Nb, Ta, Mo, W A metal element consisting of one or two or more thereof or a mixture thereof, and the composition ratios x, y, z, w are 50% by atom

x

96, 0.1

y

20, 2

z

25, 0.1

w

Satisfying the relationship of 20, x + y + z + w = 100, and the metal structure is basically composed of crystal grains having an average particle diameter of 0.05 µm or less, and a part thereof includes a crystal phase of carbide of element M Soft magnetic alloy film. 4. The soft magnetic alloy film according to claim 3, wherein the metal structure basically comprises crystal grains and amorphous structures having an average particle diameter of 0.05 mu m or less. The composition formula is expressed as Co a V c C e and the composition ratios a, c and e are atomic% 55

a

93, 5

c

25, 0.5

e

25, a + c + e = 100, and the metal structure is composed of crystal grains and amorphous structures having an average particle diameter of 0.05 µm or less, and a portion of the grains includes a solid phase of carbide of V. Magnetic alloy film. The soft magnetic alloy film according to claim 5, wherein the metal structure is composed of grains and amorphous structures having an average particle diameter of 0.05 µm or less. The composition formula is represented by Co avc M d C e, M is a metal element or mixture consisting of one or two or more of Ti, Zr, Hf, Nb, Ta, Mo, and W, and the composition ratios a, c, d, and e are atoms 55%

a

96, 0.5

c

25, 0.5

d

25, 0.5

e

25, 2

While satisfying the relationship of C + d and a + c + d + e = 100, the metal structure is composed of crystal grains having an average particle diameter of 0.05 µm or less, and part of the crystal grains include carbides of V and carbides of the element M containing crystal phases. Soft magnetic alloy film, characterized in that. The soft magnetic alloy film according to claim 7, wherein the metal structure is composed of grains and amorphous structures having an average particle diameter of 0.05 µm or less. The composition formula is represented by Co a T b V c C e and T is a metal element or mixture thereof consisting of one or two or more of Fe, Ni, and Mn, and the composition ratios a, c, d, and e are 50% by atom.

a

96, 0.1

b

20, 5

c

25, 0.5

e

25, 2

satisfying the relationship of c + e and a + b + c + e = 100, the metal structure is composed of crystal grains having an average particle diameter of 0.05 µm or less, and part of the crystal grains include carbides of V and carbides of the element M Soft magnetic alloy film, characterized in that. 10. The soft magnetic alloy film of claim 9, wherein the metal structure is composed of grains and amorphous structures having an average particle diameter of 0.05 µm or less. The composition formula is expressed as Co a T b V c M d C e and the composition ratios a, b, c, d and e are atomic%

a

93, 0.1

b

20, 0.5

c

25, 0.5

d

25, 0.5

e

25, a + b + c + d + e = 100, while satisfying the relation of 100, the metal structure is composed of grains with an average particle diameter of 0.05 µm or less, and part of the grains contains carbides of V and carbides of element M Soft magnetic alloy film, characterized in that. 12. The soft magnetic alloy film according to claim 11, wherein the metal structure is composed of grains and amorphous structures having an average particle diameter of 0.05 mu m or less. A magnetic head in which a pair of magnetic core halves having a soft magnetic film formed on a gap portion side are bonded by glass bonding through the soft magnetic film and the gap portion, wherein the soft magnetic film has Co x M z C on the magnetic core half side. microcrystalline having a composition of w (M is at least one of Ti, Zr, Hf, Nb, Ta, Mo, and W and x, z, w are composition ratios (atomic%)) and has a grain size of 0.05 µm or less. Amorphous furnace consisting of a structure and the gap portion side has a composition of Co x M z (M is at least one or more of Ti, Zr, Hf, Nb, Ta, Mo, W, x, z is the composition ratio (atomic%)) Magnetic head, characterized in that made. In a magnetic head in which a pair of magnetic core halves having a soft magnetic film formed on a gap part side is bonded by glass bonding through the soft magnetic film and the gap part, the soft magnetic film has Co x T y M on the magnetic core half side. z C w (T is at least one of Fe, Ni, Mn, M is at least one of Ti, Zr, Hf, Nb, Ta, Mo, W and x, y, z, w is the composition ratio (atomic%)). And the crystal grain size is predominantly made of microcrystalline structure with a diameter of 0.05 µm or less, and the gap portion is Co x M z (M is at least one of Ti, Zr, Hf, Nb, Ta, Mo, and W). , x, z is an amorphous magnetic head having a composition having a composition ratio (atomic%). In a magnetic head in which a pair of magnetic core bodies having a soft magnetic film formed on a gap portion is bonded by glass bonding through the soft magnetic film and the gap portion, the soft magnetic film is formed by Co x M z C w (M is Ti, At least one of Zr, Hf, Nb, Ta, Mo, and W, x, z, w has a composition of composition ratio (atomic%) and predominantly comprises a microcrystalline structure with a crystal grain size of less than 0.05㎛ Magnetic head to make. In a magnetic head formed by bonding a pair of magnetic core halves having a soft magnetic film formed on a gap side by glass bonding through the soft magnetic film and the gap part, the soft magnetic film is formed by Co x T y M z C w (T is At least one of Fe, Ni, and Mn, M is at least one of Ti, Zr, Hf, Nb, Ta, Mo, W, x, y, z, w is the composition ratio (atomic%) is superior The magnetic head, characterized in that consisting of a microcrystalline structure of less than 0.05㎛ grain size.

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