KR920000965A - 알루미늄 기판상의 내식성 보호코팅 및 그 형성방법 - Google Patents

알루미늄 기판상의 내식성 보호코팅 및 그 형성방법 Download PDF

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KR920000965A
KR920000965A KR1019910009383A KR910009383A KR920000965A KR 920000965 A KR920000965 A KR 920000965A KR 1019910009383 A KR1019910009383 A KR 1019910009383A KR 910009383 A KR910009383 A KR 910009383A KR 920000965 A KR920000965 A KR 920000965A
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fluorine
aluminum
high purity
aluminum oxide
oxide layer
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KR1019910009383A
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KR100213397B1 (ko
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에이치. 로리머 다아시
에이. 베르카우 크라이그
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제임스 조셉 드롱
어플라이드 머티어리얼스, 인코포레이티드
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/34—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases more than one element being applied in more than one step
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/80—After-treatment

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Vapour Deposition (AREA)
  • Preventing Corrosion Or Incrustation Of Metals (AREA)

Abstract

내용 없음

Description

알루미늄 기판상의 내식성 보호코팅 및 그 형성방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 알루미늄 기판의 표면위에 형성된 내식성 보호코팅을 가진 알루미늄 기판의 부분단면도,
제2도는 알루미늄 진공챔버의 알루미늄 내부면상에 형성된 고순도의 보호코팅을 가진 반도체 웨이퍼 처리용 알루미늄 진공챔버의 부분 수직단면도,
제3도는 본 발명의 방법을 설명하는 흐름도.

Claims (10)

  1. 알루미늄 기판상에 내식성 보호코팅을 형성하는 방법에 있어서, 고온에서 하나 또는 둘이상의 불소함유가스를 상기 알루미늄 기판상의 산화 알루미늄층에 접촉시키는 단계를 포함함을 특징으로 하는 방법.
  2. 제1항에 있어서, 상기 하나 또는 둘이상의 불소함유가스를 산화알루미늄층에 접촉시키는 단계전에 상기 기판상에 약0.1㎛(1000Å) 내지 20㎛의 두께를 가진 산화 알루미늄층을 형성시키는 단계를 포함함을 특징으로 하는 방법.
  3. 제2항에 있어서, 상기 하나 또는 둘이상의 불소함유가스를 산화 알루미늄층에 접촉시킴으로써 보호코팅을 형성하는 단계가 약30 내지 120분 동안 약375내지 500℃온도에서 HF, F2, NF3, CF4, CHF3및 C2F6를 구성하는 그룹으로부터 선택한 상기 하나이상의 불소함유가스를 산화 알루미늄층에 접촉시키는 단계를 포함함을 특징으로 하는 방법.
  4. 알루미늄 기판상에 내식성 보호코팅을 형성하는 방법에 있어서, (a) 상기 알루미늄 기판상에 약 0.1㎛(1000Å) 이상의 초소두께를 가진 산화 알루미늄층을 형성하는 단계, 및 (b) 약30내지 120분동안 약375내지 500℃의 온도, 1토르 내지 대기압의 압력에서 5내지 100부피%농도의 하나 또는 둘이상의 불소함유가스를 상기 알루미늄기판상의 산화 알루미늄층에 접촉시키는 단계를 포함하고, 3내지 18wt.%불소를 함유하는 보호층이 상기 기판상에 형성될것임을 특징으로 하는 방법.
  5. 알루미늄 기판상에 고순도의 내식성 보호코팅을 형성하는 방법에 있어서, 상기 고순도의 내식성 보호코팅을 형성하기 위해 고온에서 하나 또는 둘이상의 고순도 불소함유가스를 상기 알루미늄 기판상의 고순도 산화 알루미늄층에 접촉시키는 단계를 포함함을 특징으로 하는 방법.
  6. 제5항에 있어서, 1000Å 이상의 최소두께를 가진 고순도의 열산화 알루미늄층이 약10내지 200시간동안 15내지 100wt.%산소를 함유하는 고순도 산화가스를 상기 알루미늄 기판에 접촉시킴으로써 하나 또는 둘이상의 고순도 불소함유가스에 의해 접촉되고 약350내지 500℃온도에서 가열된, 먼저 99wt.%이상의 순도를 가진 상기 알루미늄 기판상에 상기 고순도의 열산화 알루미늄 층을 형성하는 단계를 포함함을 특징으로 하는 방법.
  7. 제5항에 있어서, 약 99wt.%의 순도를 가진 알루미늄 기판상에 전류가 약10내지 60암페아/ft2로 떨어질때까지 약15내지 45볼트의 직류양극전압을 사용하여 약0내지 30℃온도의 양극욕내의 양극에서 산화 알루미늄층을 형성하는 단계를 포함함을 특징으로 하는 방법.
  8. 제5항에 있어서, 상기 하나 또는 둘이상의 고순도를 불소함유가스를 고순도의 산화 알루미늄층에 접촉시킴으로써 고순도의 내식성 보호코팅을 형성하는 단계가 운반가스보다는 100ppm이하의 불순물을 함유하는 상기하나 또는 둘이상의 고순도 불소함유가스를 상기 산화 알루미늄층에 접촉시키는 단계를 포함함을 특징으로 하는 방법.
  9. 제8항에 있어서, 상기 하나 또는 둘이상의 고순도 불소함유가스를 고순도의 산화 알루미늄층에 접촉시킴으로써 고순도의 내식성 보호코팅을 형성하는 단계가 약30내지 120분동안 약 375내지 500℃에서 HF, F2, NF3, CF4, CHF3및 C2F6를 구성하는 그룹으로부터 선택한 상기 하나 또는 둘이상의 고순도 불소함유가스를 상기 산화 알루미늄층에 접촉시키는 단계를 포함함을 특징으로 하는 방법.
  10. 알루미늄 기판상에 알루미늄, 수소, 산소 및 불소보다는 3wt.%이하의 다른 원소를 함유하는 내식성 보호코팅을 형성하는 방법에 있어서, (a) 약97wt.%이상의 순도를 가지고 약0.1㎛(1000Å)이상의 최소 두께를 가진 산화 알루미늄층을 약97wt.%이상의 순도를 가진 알루미늄 기판상에 형성시키는 단계, 및 (b) 약30내지 120분동안 1토르 내지 약 대기압의 기압, 약374내지 500℃의 온도에서 5내지 100부피% 불소함유가스의 농도인 100ppm이하의 불소물(운반가스와는 다른)을 함유하는 하나 또는 둘이상의 불소함유가스를 상기 알루미늄 기판상의 산화 알루미늄층에 접촉시키는 단계를 포함하고, 3내지 18wt.%의 불소, 와 알루미늄, 산소, 수소 및 불소보다는 약3wt.%이하의 다른 원소를 함유하는 고순도의 내식성 보호층이 상기 기판상에 형성될 것임을 특징으로 하는 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019910009383A 1990-06-07 1991-06-07 알루미늄 기판상에 내식성 보호코팅을 형성하는 방법 KR100213397B1 (ko)

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US07/534,807 1990-06-07
US07/534,807 US5069938A (en) 1990-06-07 1990-06-07 Method of forming a corrosion-resistant protective coating on aluminum substrate
US7/534,807 1990-06-07

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KR100213397B1 KR100213397B1 (ko) 1999-08-02

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