KR900002312A - 저온에서 고공간 분해도를 갖는 광루미네슨스로 반도체 샘플을 특정짓는 장치 - Google Patents

저온에서 고공간 분해도를 갖는 광루미네슨스로 반도체 샘플을 특정짓는 장치 Download PDF

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Publication number
KR900002312A
KR900002312A KR1019890009729A KR890009729A KR900002312A KR 900002312 A KR900002312 A KR 900002312A KR 1019890009729 A KR1019890009729 A KR 1019890009729A KR 890009729 A KR890009729 A KR 890009729A KR 900002312 A KR900002312 A KR 900002312A
Authority
KR
South Korea
Prior art keywords
optical
optical means
wafer
vacuum chamber
detector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1019890009729A
Other languages
English (en)
Korean (ko)
Inventor
르 브리스 쟝
에르망 마르코
질라댕 제라르
Original Assignee
이반 밀러 레르너
엔.브이.필립스 글로아이람펜파브리켄
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 이반 밀러 레르너, 엔.브이.필립스 글로아이람펜파브리켄 filed Critical 이반 밀러 레르너
Publication of KR900002312A publication Critical patent/KR900002312A/ko
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26—Testing of individual semiconductor devices
    • G01R31/265—Contactless testing
    • G01R31/2656—Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

Landscapes

  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
KR1019890009729A 1988-07-08 1989-07-08 저온에서 고공간 분해도를 갖는 광루미네슨스로 반도체 샘플을 특정짓는 장치 Withdrawn KR900002312A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR8809296 1988-07-08
FR8809296A FR2634026B1 (enExample) 1988-07-08 1988-07-08

Publications (1)

Publication Number Publication Date
KR900002312A true KR900002312A (ko) 1990-02-28

Family

ID=9368247

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019890009729A Withdrawn KR900002312A (ko) 1988-07-08 1989-07-08 저온에서 고공간 분해도를 갖는 광루미네슨스로 반도체 샘플을 특정짓는 장치

Country Status (6)

Country Link
US (1) US4954713A (enExample)
EP (1) EP0350123B1 (enExample)
JP (1) JPH0786460B2 (enExample)
KR (1) KR900002312A (enExample)
DE (1) DE68914733T2 (enExample)
FR (1) FR2634026B1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04294255A (ja) * 1991-03-22 1992-10-19 Shimadzu Corp フォトルミネッセンス測定装置
US5878072A (en) * 1997-03-25 1999-03-02 Seh America, Inc. Laser alignment cross hair
GB2339019B (en) * 1998-06-30 2000-06-14 Khaled Karrai Sample holder apparatus
CN100353171C (zh) * 2004-12-23 2007-12-05 中国科学院半导体研究所 用于电调制光致发光光谱测量的样品架
DE102007028865B3 (de) 2007-06-22 2009-01-29 Vericold Technologies Gmbh Tieftemperaturvorrichtung
DE102011115303B4 (de) * 2011-09-29 2013-06-27 Entropy GmbH Tieftemperaturvorrichtung
DE102014015665B4 (de) * 2014-10-23 2016-05-19 Attocube Systems Ag Optischer Tisch

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3800161A (en) * 1972-12-19 1974-03-26 Atomic Energy Commission Portable dynamic multistation photometer-fluorometer
SU1029053A1 (ru) * 1979-12-07 1983-07-15 Ленинградское научно-производственное объединение "Буревестник" Спектрофлуориметр
JPS58210551A (ja) * 1982-06-01 1983-12-07 Fujitsu Ltd フオトルミネツセンス測定方法
SE455646B (sv) * 1984-10-22 1988-07-25 Radians Innova Ab Fluorescensanordning
JPS61194307A (ja) * 1985-02-25 1986-08-28 Hitachi Ltd プリント基板パタ−ン検査装置
JPS61290311A (ja) * 1985-06-19 1986-12-20 Hitachi Ltd はんだ付部の検査装置及びその方法
US4703260A (en) * 1985-09-23 1987-10-27 International Business Machines Corporation Full chip integrated circuit tester
JPH0660873B2 (ja) * 1985-12-06 1994-08-10 日本電信電話株式会社 ルミネツセンス測定装置
US4859063A (en) * 1986-02-11 1989-08-22 University Of Massachusetts Medical Center Imaging microspectrofluorimeter
JPS62263451A (ja) * 1986-05-12 1987-11-16 Hitachi Electronics Eng Co Ltd 配線パタ−ン検査装置

Also Published As

Publication number Publication date
FR2634026A1 (enExample) 1990-01-12
DE68914733D1 (de) 1994-05-26
DE68914733T2 (de) 1994-10-20
EP0350123B1 (fr) 1994-04-20
US4954713A (en) 1990-09-04
JPH0786460B2 (ja) 1995-09-20
FR2634026B1 (enExample) 1990-11-09
JPH0254149A (ja) 1990-02-23
EP0350123A1 (fr) 1990-01-10

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