KR890700695A - 활성의 금속표면의 제조방법. - Google Patents

활성의 금속표면의 제조방법.

Info

Publication number
KR890700695A
KR890700695A KR1019880701178A KR880701178A KR890700695A KR 890700695 A KR890700695 A KR 890700695A KR 1019880701178 A KR1019880701178 A KR 1019880701178A KR 880701178 A KR880701178 A KR 880701178A KR 890700695 A KR890700695 A KR 890700695A
Authority
KR
South Korea
Prior art keywords
metal surface
film
solvent
active metal
molecules
Prior art date
Application number
KR1019880701178A
Other languages
English (en)
Inventor
엑스.레이 다니엘
Original Assignee
원본 미기재
다이나믹 디스크, 인코오퍼레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 원본 미기재, 다이나믹 디스크, 인코오퍼레이티드 filed Critical 원본 미기재
Publication of KR890700695A publication Critical patent/KR890700695A/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C22/73—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals characterised by the process
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/72—Protective coatings, e.g. anti-static or antifriction
    • G11B5/722—Protective coatings, e.g. anti-static or antifriction containing an anticorrosive material
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/72—Protective coatings, e.g. anti-static or antifriction
    • G11B5/725—Protective coatings, e.g. anti-static or antifriction containing a lubricant, e.g. organic compounds
    • G11B5/7253—Fluorocarbon lubricant
    • G11B5/7257—Perfluoropolyether lubricant
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates

Abstract

내용 없음.

Description

활성의 금속표면의 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (13)

  1. a. 금속표면으로부터 산화성의 코팅을 제거하며 산화성 코팅들의 밑에 놓여 있는 활성금속을 노출시키는 작업을 금속표면에 시행하며, b. 상기의 활성의 금속표면에 직접 필름형성 분자들을 결합시키고 균일한 필름을 금속표면위에 형성하기 위하여 이 발명의 방법에 의하여 필름 형성 분자들과 상기 활성의 금속을 대체로 동시에 접촉시키는 단계를 포함하며, 금속표면위에 결합된 화학적으로 균일한 필름을 형성시키기 위하여 활성의 금속표면의 준비를 위한 방법.
  2. 제1항에 있어서, 상기의 금속표면은 가공유체에 의하여 피복되며 상기의 가공유체는 상기 필름형성분자들에 대한 용제를 포함하며 상기의 용제는 금속 표면에 관하여 불황성인것을 특징으로 하는 방법.
  3. 제2항에 있어서, 상기의 용제는 할로겐화된 액체 하이드로 카본인 것을 특징으로 하는 방법.
  4. 제3항에 있어서, 상기의 용체는 1,1,l-트리콜로르에세인인것을 특징으로 하는 방법.
  5. 제3항에 있어서, 상기의 용제는 트리콜로로트리후루오로에세인인 것을 특징으로 하는 방법.
  6. 제2항에 있어서, 상기의 용제는 광물질 제거된 물인것을 특징으로 하는 방법.
  7. 제6항에 있어서, 상기의 광물질 제거된 약 5.5 내지 약 8 사기의 PH치로 완충된 것을 특징으로 하는 방법.
  8. 제6항에 있어서, 상기의 필름형성분자들은 포스페이트,설페이트 및 크로메이트류로된 군으로부터 선택되어지는 것을 특징으로 하는 방법.
  9. 제3항에 있어서, 상기의 필름을 형성하는 분자들의 기부는 다음식을 가지는 분자들의 군으로부터 선택되며,
    [CX3-(CX2O)m-(C2X4O)n-CX2]
    [CX3-(CX2)n]-
    여기서 X는 후로오라인, 클로라인, 아이오다인 하이드로겐 또는 메틸을 포함하며 m 및 n은 0과 12사이의 정수이며, 그리고 X가 하이드로겐인 곳에서 하이드로카본 그룹은 에틸렌적으로 불포화되어 있을 수 있는 것을 특징으로 하는 방법.
  10. 제1항에 있어서, 금속표면은 알미늄이며, 상기 가공유체는 트리콜로로트리후로오호에세인이며 이안에 퍼후루오로폴리에텔로 한정된 하이드록시의 250피피엠이 용해 되어 있는 것을 특징으로 하는 방법.
  11. 제l항에 있어서, 금속표면은 알미늄이고 상기 가공표면은 완충된 공물질 제거된 물인것을 특징으로 하는 방법.
  12. 제10항에 있어서, 금속표면은 닉켈인 것을 특징으로 하는 방법.
  13. 제1항의 방법에 의하여 제조된 활성의 금속기질.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019880701178A 1987-01-27 1988-01-26 활성의 금속표면의 제조방법. KR890700695A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US006806 1987-01-27
US07/006,806 US4787942A (en) 1987-01-27 1987-01-27 Method for preparing reactive metal surface
PCT/US1988/000224 WO1988005474A2 (en) 1987-01-27 1988-01-26 Method for preparing reactive metal surface

Publications (1)

Publication Number Publication Date
KR890700695A true KR890700695A (ko) 1989-04-26

Family

ID=21722684

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019880701178A KR890700695A (ko) 1987-01-27 1988-01-26 활성의 금속표면의 제조방법.

Country Status (5)

Country Link
US (1) US4787942A (ko)
EP (1) EP0299049A1 (ko)
JP (1) JPH01503311A (ko)
KR (1) KR890700695A (ko)
WO (1) WO1988005474A2 (ko)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5049410A (en) * 1989-11-01 1991-09-17 International Business Machines Corporation Lubricant film for a thin-film disk
US5286300A (en) * 1991-02-13 1994-02-15 Man-Gill Chemical Company Rinse aid and lubricant
US5254369A (en) * 1991-04-17 1993-10-19 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Method of forming a silicon diffusion and/or overlay coating on the surface of a metallic substrate by chemical vapor deposition
ES2076783T3 (es) * 1991-10-04 1995-11-01 Alcan Int Ltd Estructuras estratificadas desprendibles y procedimiento para su produccion.
US6428715B1 (en) * 1998-12-22 2002-08-06 International Business Machines Corporation Method for producing sliders
US9169567B2 (en) 2012-03-30 2015-10-27 General Electric Company Components having tab members
US9671030B2 (en) 2012-03-30 2017-06-06 General Electric Company Metallic seal assembly, turbine component, and method of regulating airflow in turbo-machinery
US9587632B2 (en) 2012-03-30 2017-03-07 General Electric Company Thermally-controlled component and thermal control process
CN104480457A (zh) * 2014-12-25 2015-04-01 衡阳华菱钢管有限公司 油套管接箍的表面磷化处理方法
CN105220105A (zh) * 2015-11-11 2016-01-06 无锡清杨机械制造有限公司 一种镁合金表面处理方法
US20190189312A1 (en) * 2017-12-19 2019-06-20 National Cheng Kung University Pretreatment of Thick-Film Aluminum Electrode for Metal Plating

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1141629A (fr) * 1956-01-26 1957-09-04 Metallisation Soc Nouv Procédé de revêtement d'une surface métallique
US3071456A (en) * 1956-02-08 1963-01-01 William D Cheesman Barrel finishing
US2992131A (en) * 1957-03-21 1961-07-11 Jenolite Ltd Treatment of metal surfaces
NL245968A (ko) * 1958-12-06
US3651604A (en) * 1970-11-25 1972-03-28 Mill Polishing Corp Process for improving surface finish on clad aluminum sheets
US4029523A (en) * 1975-03-20 1977-06-14 Diamond Shamrock Corporation Solvent phosphatizing compositions yielding non water soluble coatings
DE2713162A1 (de) * 1977-03-25 1978-10-05 Merck Patent Gmbh Muffe fuer zur knochenstabilisierung dienende chirurgische naegel und deren verwendung
JPS5489389A (en) * 1977-12-27 1979-07-16 Fujimi Kenmazai Kougiyou Kk Composition for polishing of moldings in synthetic resin
US4268556A (en) * 1979-01-08 1981-05-19 Minnesota Mining And Manufacturing Company Rigid magnetic recording disks lubricated with fluorinated telechelic polyether
JPS5671821A (en) * 1979-11-14 1981-06-15 Hitachi Ltd Substrate for magnetic disc and its manufacture
FR2486392A1 (fr) * 1980-07-10 1982-01-15 Marcy Jean Perfectionnements apportes aux pates destinees a etre appliquees sur les muqueuses et notamment aux pates a usage stomatologique
EP0047054B1 (en) * 1980-07-30 1985-02-20 Secretary of State for Energy in Her Britannic Majesty's Gov. of the United Kingdom of Great Britain and Northern Ireland Surface pre-treatment prior to underwater bonding
PT75051B (pt) * 1981-07-02 1984-10-09 Akzo Nv Process for applying a coating composition to a substrate and the coated substrate thus obtained
US4590100A (en) * 1983-10-28 1986-05-20 The United States Of America As Represented By The Secretary Of The Navy Passivation of steel with aqueous amine solutions preparatory to application of non-aqueous protective coatings
US4491500A (en) * 1984-02-17 1985-01-01 Rem Chemicals, Inc. Method for refinement of metal surfaces
JPS6225187A (ja) * 1985-07-25 1987-02-03 Fujimi Kenmazai Kogyo Kk メモリ−ハ−ドデイスクの研磨用組成物

Also Published As

Publication number Publication date
WO1988005474A2 (en) 1988-07-28
US4787942A (en) 1988-11-29
EP0299049A1 (en) 1989-01-18
JPH01503311A (ja) 1989-11-09
WO1988005474A3 (en) 1988-08-25

Similar Documents

Publication Publication Date Title
KR890700695A (ko) 활성의 금속표면의 제조방법.
US3980587A (en) Stripper composition
RU95101851A (ru) Способ катализирования поверхности при нанесении покрытия методом химического восстановления
ES2136400T3 (es) Dispersion acuosa de laca transparente en polvo.
KR880002246A (ko) 기판면의 바람직하지 않은 입자 제거방법
KR890006709A (ko) 수-흡수 수지의 표면-처리방법
ATE181751T1 (de) Verfahren zur herstellung von hoch verstreuten metall-kolloiden und von auf einem substrat gebundenen metall-clusters durch elektrochemische reduktion von metallsalzen
ES8303482A1 (es) Procedimiento para preparar una disposicion seudoplastica otixotropica en un medio acuoso de microparticulas pohimericasreticuladas.
ES2116615T3 (es) Procedimiento simplificado de aplicacion de un barniz anti-corrosion con una buena adherencia, y piezas asi obtenidas.
ATE20599T1 (de) Fluessige zusammensetzungen zum aufbringen transparenter ueberzuege auf feste oberflaechen, anwendung des ueberzugsmittels und hergestellte ueberzuege.
ATE213846T1 (de) Nach-bedarf herstellung von filmen für laserablationsverfahren
JPS57209637A (en) Water treating material and preparation thereof
RU97114191A (ru) Способ обработки поверхности металла
BR8202748A (pt) Composicao de espuma adequada para aplicacao superficial a um substrato fibroso e processo para sua producao
DE59006157D1 (de) Verfahren zum beschichten elektrisch leitfähiger substrate, wässriger lack, verfahren zur herstellung eines urethangruppenhaltigen adduktes und urethangruppenhaltiges addukt.
KR960037871A (ko) 오염물 피막을 금속 표면으로부터 제거하는 방법
PT84140B (pt) Processo para o tratamento de particulas de catalisador por elutriacao
FR2411225A1 (fr) Composition, a base d'un derive de polymere acrylique et d'acide gras, pour depot electrolytique sur cathode, son procede d'application et substrat revetu obtenu
JPS5649526A (en) Manufacture of semiconductor device
GB1275471A (en) Improvements relating to photo-resists
JPS5524923A (en) Manufacture of transparent titanium oxide film
JPS56127615A (en) Board based on fluoroborate of paradiazodiphenyl amine and liquid epoxy resin
EP0182767A3 (en) Corrosion resistant tantalum pentaoxide coatings
US5658967A (en) Providing a surface with carboxyl groups and surface and product thus provided
JPS57182733A (en) Photosensitive composition

Legal Events

Date Code Title Description
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid