KR890004044B1 - 연속 증착 공정에서의 부착량 급속 변화 방법 - Google Patents

연속 증착 공정에서의 부착량 급속 변화 방법 Download PDF

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Publication number
KR890004044B1
KR890004044B1 KR1019850003652A KR850003652A KR890004044B1 KR 890004044 B1 KR890004044 B1 KR 890004044B1 KR 1019850003652 A KR1019850003652 A KR 1019850003652A KR 850003652 A KR850003652 A KR 850003652A KR 890004044 B1 KR890004044 B1 KR 890004044B1
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South Korea
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shutter
deposition
change
amount
aperture
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Expired
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KR1019850003652A
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English (en)
Korean (ko)
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KR850008503A (ko
Inventor
요시오 시모자또
데쯔요시 와다
겐이찌 야나기
미쯔오 가또
헤이자부로 후루까와
깐지 와께
아리히꼬 모리따
노리오 쯔끼지
다꾸야 아이꼬
도시하루 기따까
야스지 나까니시
Original Assignee
닛씬 세이꼬 가부시끼 가이샤
아베 유즈루
미쯔비시 쥬고교 가부시끼 가이샤
스에나가 소 이찌로
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Publication of KR850008503A publication Critical patent/KR850008503A/ko
Application granted granted Critical
Publication of KR890004044B1 publication Critical patent/KR890004044B1/ko
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
KR1019850003652A 1984-05-28 1985-05-28 연속 증착 공정에서의 부착량 급속 변화 방법 Expired KR890004044B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP106396 1984-05-28
JP106,396 1984-05-28
JP59106396A JPS60251273A (ja) 1984-05-28 1984-05-28 真空蒸発装置の蒸発量制御方法

Publications (2)

Publication Number Publication Date
KR850008503A KR850008503A (ko) 1985-12-18
KR890004044B1 true KR890004044B1 (ko) 1989-10-18

Family

ID=14432526

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019850003652A Expired KR890004044B1 (ko) 1984-05-28 1985-05-28 연속 증착 공정에서의 부착량 급속 변화 방법

Country Status (7)

Country Link
US (1) US4587134A (cg-RX-API-DMAC7.html)
EP (1) EP0166960B1 (cg-RX-API-DMAC7.html)
JP (1) JPS60251273A (cg-RX-API-DMAC7.html)
KR (1) KR890004044B1 (cg-RX-API-DMAC7.html)
AU (1) AU574469B2 (cg-RX-API-DMAC7.html)
CA (1) CA1249491A (cg-RX-API-DMAC7.html)
DE (1) DE3583829D1 (cg-RX-API-DMAC7.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20140108005A (ko) * 2013-02-28 2014-09-05 삼성에스디아이 주식회사 이차전지용 전극 제조 장치

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62267471A (ja) * 1986-05-16 1987-11-20 Mitsubishi Heavy Ind Ltd 真空蒸発装置の蒸発量制御方法
JPS62267465A (ja) * 1986-05-16 1987-11-20 Mitsubishi Heavy Ind Ltd 連続真空蒸着装置の蒸着室内における溶融金属表面の汚れ検出方法
JPS648265A (en) * 1987-06-30 1989-01-12 Mitsubishi Heavy Ind Ltd Method for controlling evaporation rate of vacuum deposition device
JPS6465257A (en) * 1987-09-07 1989-03-10 Mitsubishi Heavy Ind Ltd Method for controlling amount of evaporation in vacuum deposition device
US4898746A (en) * 1988-06-28 1990-02-06 Rca Licensing Corporation Material deposition process analysis system
DE4442733C2 (de) * 1994-12-01 2001-04-26 Ardenne Anlagentech Gmbh Einrichtung zur Bedampfung bandförmiger Substrate im Vakuum
TW340876B (en) * 1996-03-27 1998-09-21 Nisshin Steel Co Ltd Method and apparatus for controlling the deposition amount of a plating metal as well as method and apparatus for measuring the amount of a metal vapor
US5951769A (en) * 1997-06-04 1999-09-14 Crown Roll Leaf, Inc. Method and apparatus for making high refractive index (HRI) film
US6254934B1 (en) * 1998-07-29 2001-07-03 Litton Systems, Inc. Method for controlled deposition of mirror layers
EP1174526A1 (en) * 2000-07-17 2002-01-23 Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek TNO Continuous vapour deposition
EP1972699A1 (fr) * 2007-03-20 2008-09-24 ArcelorMittal France Procede de revetement d'un substrat et installation de depot sous vide d'alliage metallique
US9458533B2 (en) * 2007-12-21 2016-10-04 Advanced Galvanisation Ag Method and devices for controlling a vapour flow in vacuum evaporation
EP2199425A1 (fr) * 2008-12-18 2010-06-23 ArcelorMittal France Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique (II)
US20120052189A1 (en) * 2010-08-30 2012-03-01 Litian Liu Vapor deposition system
TWI582251B (zh) * 2014-10-31 2017-05-11 財團法人工業技術研究院 蒸鍍系統以及蒸鍍方法
CN104988462B (zh) * 2015-07-23 2017-05-31 京东方科技集团股份有限公司 一种坩埚装置

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2440135A (en) * 1944-08-04 1948-04-20 Alexander Paul Method of and apparatus for depositing substances by thermal evaporation in vacuum chambers
GB1010456A (en) * 1962-10-02 1965-11-17 G V Planer Ltd Means for measuring and/or controlling the evaporation rate in vacuum evaporation processes
US3281265A (en) * 1963-09-17 1966-10-25 United States Steel Corp Method and apparatus for controlling coating thickness by electron beam evaporation
US3602190A (en) * 1968-10-30 1971-08-31 Western Electric Co Multiple vaporizing system
US3690933A (en) * 1970-05-21 1972-09-12 Republic Steel Corp Apparatus and method for continuously condensing metal vapor upon a substrate
BE789818A (fr) * 1971-10-07 1973-04-06 Du Pont Composes de polycetal
BE790940A (fr) * 1971-11-04 1973-03-01 Rca Corp Procede de reglage de la composition d'un film
GB1483966A (en) * 1974-10-23 1977-08-24 Sharp Kk Vapourized-metal cluster ion source and ionized-cluster beam deposition
US4061800A (en) * 1975-02-06 1977-12-06 Applied Materials, Inc. Vapor desposition method
US3971334A (en) * 1975-03-04 1976-07-27 Xerox Corporation Coating device
JPS5210869A (en) * 1975-07-15 1977-01-27 Toshinori Takagi Thin film forming method
DE2548357C2 (de) * 1975-10-29 1983-05-26 Robert Bosch Gmbh, 7000 Stuttgart Einrichtung zur kontinuierlichen Vakuumbedampfung eines bandförmigen Trägermaterials mit Zink
US4425871A (en) * 1981-02-09 1984-01-17 Applied Magnetics Corporation Apparatus for sensing deposition of a thin film layer of a material
CA1163231A (en) * 1981-07-24 1984-03-06 Don E. Brodie Reactive plating method and product
US4495889A (en) * 1982-11-24 1985-01-29 Riley Thomas J Polymeric film coating apparatus
US4526802A (en) * 1983-03-31 1985-07-02 Clarion Co., Ltd. Film deposition equipment

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20140108005A (ko) * 2013-02-28 2014-09-05 삼성에스디아이 주식회사 이차전지용 전극 제조 장치

Also Published As

Publication number Publication date
US4587134A (en) 1986-05-06
EP0166960A2 (en) 1986-01-08
DE3583829D1 (de) 1991-09-26
AU574469B2 (en) 1988-07-07
KR850008503A (ko) 1985-12-18
EP0166960A3 (en) 1988-03-30
EP0166960B1 (en) 1991-08-21
JPS60251273A (ja) 1985-12-11
JPH037751B2 (cg-RX-API-DMAC7.html) 1991-02-04
AU4305685A (en) 1985-12-05
CA1249491A (en) 1989-01-31

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