DE3583829D1 - Verfahren zur raschen veraenderung der abgeschiedenen menge beim kontinuierlichen bedampfen. - Google Patents

Verfahren zur raschen veraenderung der abgeschiedenen menge beim kontinuierlichen bedampfen.

Info

Publication number
DE3583829D1
DE3583829D1 DE8585106511T DE3583829T DE3583829D1 DE 3583829 D1 DE3583829 D1 DE 3583829D1 DE 8585106511 T DE8585106511 T DE 8585106511T DE 3583829 T DE3583829 T DE 3583829T DE 3583829 D1 DE3583829 D1 DE 3583829D1
Authority
DE
Germany
Prior art keywords
rapidly changing
continuous steaming
separated quantity
separated
steaming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8585106511T
Other languages
English (en)
Inventor
Yoshio C O Hir Tech Shimozato
Tetsuyoshi C O Hir Tech I Wada
Kenichi C O Hiroshima T Yanagi
Mitsuo C O Hiroshima Tech Kato
Heizaburo C O Hir Sew Furukawa
Kanji C O Hiroshima S E W Wake
Arihiko C O Nisshin R D Morita
Norio C O Nisshin R D Tsukiji
Takuya C O Nisshin R D La Aiko
Toshiharu C O Nisshin Kittaka
Yasuji C O Nisshin R Nakanishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Nippon Steel Nisshin Co Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Nisshin Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd, Nisshin Steel Co Ltd filed Critical Mitsubishi Heavy Industries Ltd
Application granted granted Critical
Publication of DE3583829D1 publication Critical patent/DE3583829D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
DE8585106511T 1984-05-28 1985-05-24 Verfahren zur raschen veraenderung der abgeschiedenen menge beim kontinuierlichen bedampfen. Expired - Lifetime DE3583829D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59106396A JPS60251273A (ja) 1984-05-28 1984-05-28 真空蒸発装置の蒸発量制御方法

Publications (1)

Publication Number Publication Date
DE3583829D1 true DE3583829D1 (de) 1991-09-26

Family

ID=14432526

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585106511T Expired - Lifetime DE3583829D1 (de) 1984-05-28 1985-05-24 Verfahren zur raschen veraenderung der abgeschiedenen menge beim kontinuierlichen bedampfen.

Country Status (7)

Country Link
US (1) US4587134A (de)
EP (1) EP0166960B1 (de)
JP (1) JPS60251273A (de)
KR (1) KR890004044B1 (de)
AU (1) AU574469B2 (de)
CA (1) CA1249491A (de)
DE (1) DE3583829D1 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62267465A (ja) * 1986-05-16 1987-11-20 Mitsubishi Heavy Ind Ltd 連続真空蒸着装置の蒸着室内における溶融金属表面の汚れ検出方法
JPS62267471A (ja) * 1986-05-16 1987-11-20 Mitsubishi Heavy Ind Ltd 真空蒸発装置の蒸発量制御方法
JPS648265A (en) * 1987-06-30 1989-01-12 Mitsubishi Heavy Ind Ltd Method for controlling evaporation rate of vacuum deposition device
JPS6465257A (en) * 1987-09-07 1989-03-10 Mitsubishi Heavy Ind Ltd Method for controlling amount of evaporation in vacuum deposition device
US4898746A (en) * 1988-06-28 1990-02-06 Rca Licensing Corporation Material deposition process analysis system
DE4442733C2 (de) * 1994-12-01 2001-04-26 Ardenne Anlagentech Gmbh Einrichtung zur Bedampfung bandförmiger Substrate im Vakuum
TW340876B (en) * 1996-03-27 1998-09-21 Nisshin Steel Co Ltd Method and apparatus for controlling the deposition amount of a plating metal as well as method and apparatus for measuring the amount of a metal vapor
US5951769A (en) 1997-06-04 1999-09-14 Crown Roll Leaf, Inc. Method and apparatus for making high refractive index (HRI) film
US6254934B1 (en) * 1998-07-29 2001-07-03 Litton Systems, Inc. Method for controlled deposition of mirror layers
EP1174526A1 (de) * 2000-07-17 2002-01-23 Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek TNO Kontinuierliches Abscheiden aus der Gasphase
EP1972699A1 (de) * 2007-03-20 2008-09-24 ArcelorMittal France Verfahren zur Beschichtung eines Substrats unter Vakuum
WO2009083546A1 (fr) * 2007-12-21 2009-07-09 Industrial Plasma Services & Technologies - Ipst Gmbh Procede et dispositifs de controle d'un flux de vapeur en evaporation sous vide
EP2199425A1 (de) * 2008-12-18 2010-06-23 ArcelorMittal France Industrieller Dampferzeuger zum Aufbringen einer Legierungsschicht auf einem Metallband (II)
US20120052189A1 (en) * 2010-08-30 2012-03-01 Litian Liu Vapor deposition system
KR102007697B1 (ko) * 2013-02-28 2019-08-06 삼성에스디아이 주식회사 이차전지용 전극 제조 장치
TWI582251B (zh) * 2014-10-31 2017-05-11 財團法人工業技術研究院 蒸鍍系統以及蒸鍍方法
CN104988462B (zh) * 2015-07-23 2017-05-31 京东方科技集团股份有限公司 一种坩埚装置

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2440135A (en) * 1944-08-04 1948-04-20 Alexander Paul Method of and apparatus for depositing substances by thermal evaporation in vacuum chambers
GB1010456A (en) * 1962-10-02 1965-11-17 G V Planer Ltd Means for measuring and/or controlling the evaporation rate in vacuum evaporation processes
US3281265A (en) * 1963-09-17 1966-10-25 United States Steel Corp Method and apparatus for controlling coating thickness by electron beam evaporation
US3602190A (en) * 1968-10-30 1971-08-31 Western Electric Co Multiple vaporizing system
US3690933A (en) * 1970-05-21 1972-09-12 Republic Steel Corp Apparatus and method for continuously condensing metal vapor upon a substrate
BE789818A (fr) * 1971-10-07 1973-04-06 Du Pont Composes de polycetal
BE790940A (fr) * 1971-11-04 1973-03-01 Rca Corp Procede de reglage de la composition d'un film
GB1483966A (en) * 1974-10-23 1977-08-24 Sharp Kk Vapourized-metal cluster ion source and ionized-cluster beam deposition
US4061800A (en) * 1975-02-06 1977-12-06 Applied Materials, Inc. Vapor desposition method
US3971334A (en) * 1975-03-04 1976-07-27 Xerox Corporation Coating device
JPS5210869A (en) * 1975-07-15 1977-01-27 Toshinori Takagi Thin film forming method
DE2548357C2 (de) * 1975-10-29 1983-05-26 Robert Bosch Gmbh, 7000 Stuttgart Einrichtung zur kontinuierlichen Vakuumbedampfung eines bandförmigen Trägermaterials mit Zink
JPS5739172A (en) * 1980-08-19 1982-03-04 Matsushita Electric Ind Co Ltd Apparatus for preparing thin film
US4425871A (en) * 1981-02-09 1984-01-17 Applied Magnetics Corporation Apparatus for sensing deposition of a thin film layer of a material
CA1163231A (en) * 1981-07-24 1984-03-06 Don E. Brodie Reactive plating method and product
JPS5871370A (ja) * 1981-10-24 1983-04-28 Nippon Electric Ind Co Ltd ロ−ルフイルムの金属蒸着自動制御装置
US4495889A (en) * 1982-11-24 1985-01-29 Riley Thomas J Polymeric film coating apparatus
US4526802A (en) * 1983-03-31 1985-07-02 Clarion Co., Ltd. Film deposition equipment

Also Published As

Publication number Publication date
EP0166960B1 (de) 1991-08-21
KR850008503A (ko) 1985-12-18
CA1249491A (en) 1989-01-31
JPH037751B2 (de) 1991-02-04
US4587134A (en) 1986-05-06
AU4305685A (en) 1985-12-05
AU574469B2 (en) 1988-07-07
EP0166960A2 (de) 1986-01-08
KR890004044B1 (ko) 1989-10-18
EP0166960A3 (en) 1988-03-30
JPS60251273A (ja) 1985-12-11

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee