DE3580127D1 - Verfahren zur kontrolle der verteilung der abgeschiedenen menge beim aufdampfen. - Google Patents

Verfahren zur kontrolle der verteilung der abgeschiedenen menge beim aufdampfen.

Info

Publication number
DE3580127D1
DE3580127D1 DE8585106881T DE3580127T DE3580127D1 DE 3580127 D1 DE3580127 D1 DE 3580127D1 DE 8585106881 T DE8585106881 T DE 8585106881T DE 3580127 T DE3580127 T DE 3580127T DE 3580127 D1 DE3580127 D1 DE 3580127D1
Authority
DE
Germany
Prior art keywords
evaporation
distribution
controlling
determined amount
determined
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8585106881T
Other languages
English (en)
Inventor
Yoshio Hiroshima Tec Shimozato
Tetsuyoshi Hiroshima Tech Wada
Kenichi Hiroshima Techn Yanagi
Mitsuo Hiroshima Technica Kato
Heizaburo Hiroshima S Furukawa
Janji Hiroshima Shipyard Wake
Arihiko C O Nisshin R D Morita
Norio C O Nisshin R D Tsukiji
Takuya C O Nisshin R D La Aiko
Toshiharu C O Nisshin Kittaka
Yasuji C O Nisshin R Nakanishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Nippon Steel Nisshin Co Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Nisshin Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd, Nisshin Steel Co Ltd filed Critical Mitsubishi Heavy Industries Ltd
Application granted granted Critical
Publication of DE3580127D1 publication Critical patent/DE3580127D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
DE8585106881T 1984-06-04 1985-06-03 Verfahren zur kontrolle der verteilung der abgeschiedenen menge beim aufdampfen. Expired - Lifetime DE3580127D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59113195A JPS60258467A (ja) 1984-06-04 1984-06-04 真空蒸着装置における付着量分布制御法

Publications (1)

Publication Number Publication Date
DE3580127D1 true DE3580127D1 (de) 1990-11-22

Family

ID=14605956

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585106881T Expired - Lifetime DE3580127D1 (de) 1984-06-04 1985-06-03 Verfahren zur kontrolle der verteilung der abgeschiedenen menge beim aufdampfen.

Country Status (7)

Country Link
US (1) US4612206A (de)
EP (1) EP0166991B1 (de)
JP (1) JPS60258467A (de)
KR (1) KR890002655B1 (de)
AU (1) AU571975B2 (de)
CA (1) CA1249492A (de)
DE (1) DE3580127D1 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4717596A (en) * 1985-10-30 1988-01-05 International Business Machines Corporation Method for vacuum vapor deposition with improved mass flow control
US4723507A (en) * 1986-01-16 1988-02-09 Energy Conversion Devices, Inc. Isolation passageway including annular region
JPS62270772A (ja) * 1986-05-20 1987-11-25 Mitsubishi Heavy Ind Ltd 連続式真空蒸着装置の付着量のオンライン学習制御方法
US4898746A (en) * 1988-06-28 1990-02-06 Rca Licensing Corporation Material deposition process analysis system
US20070137653A1 (en) * 2000-03-13 2007-06-21 Wood Thomas J Ventilation interface for sleep apnea therapy
US20100129548A1 (en) * 2003-06-27 2010-05-27 Sundew Technologies, Llc Ald apparatus and method
EP1649076B1 (de) * 2003-06-27 2010-05-19 Sundew Technologies, LLC Vorrichtung und verfahren zur steuerung des dampfdrucks einer chemikalienquelle
US20050052118A1 (en) * 2003-09-05 2005-03-10 Shuit-Tong Lee Organic electroluminescent devices formed with rare-earth metal containing cathode
AT501143B1 (de) * 2004-05-14 2006-11-15 Hueck Folien Gmbh Sputterkathode zum einsatz im hochvakuum
US7165863B1 (en) 2004-09-23 2007-01-23 Pricilla G. Thomas Illumination system
US7518880B1 (en) 2006-02-08 2009-04-14 Bi-Link Shielding arrangement for electronic device
US8956005B2 (en) * 2006-06-30 2015-02-17 Electraled, Inc. Low-profile elongated LED light fixture
US8235539B2 (en) * 2006-06-30 2012-08-07 Electraled, Inc. Elongated LED lighting fixture
US8201977B2 (en) 2008-10-07 2012-06-19 Electraled, Inc. LED illuminated member within a refrigerated display case
US8985795B2 (en) 2006-06-30 2015-03-24 Electraled, Inc. Elongated LED lighting fixture
US20100257732A1 (en) * 2009-04-14 2010-10-14 Ziberna Frank J Shielding Arrangement for Electronic Device
US9702618B2 (en) 2014-10-30 2017-07-11 Electraled, Inc. LED lighting array system for illuminating a display case
TWI827786B (zh) * 2019-01-29 2024-01-01 日商東洋紡Ｍｃ股份有限公司 含有二聚物二醇共聚聚醯亞胺胺甲酸酯樹脂之黏接劑組成物

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3040702A (en) * 1958-06-19 1962-06-26 Nat Res Corp Vacuum coating apparatus having sealing means formed of membranes and fibers
US3420707A (en) * 1964-12-28 1969-01-07 Rca Corp Deposition of niobium stannide
DE1521248A1 (de) * 1965-03-10 1969-07-24 Fujitsu Ltd Verfahren zur Dickenregelung von aufgedampften Duennschichtbauelementen
DE1621267A1 (de) * 1967-07-20 1971-09-16 Licentia Gmbh Verfahren zur Herstellung von Kondensaten,insbesondere von Aufdampfschichten,aus Substanzen mit mehreren moeglichen Partikelsorten in der Gasphase
US4051270A (en) * 1969-02-18 1977-09-27 Jones & Laughlin Steel Corporation Method of measuring vapor deposited coating thickness
DE2141723B2 (de) * 1971-08-20 1976-03-04 Robert Bosch Gmbh, 7000 Stuttgart Vakuum-bedampfungsanlage zur kontinuierlichen bedampfung von baendern
JPS5210869A (en) * 1975-07-15 1977-01-27 Toshinori Takagi Thin film forming method
JPS53106391A (en) * 1977-02-28 1978-09-16 Nec Corp Fill-forming apparatus
JPS5428781A (en) * 1977-08-09 1979-03-03 Fuji Photo Film Co Ltd Continuous physical vapor depositing device
DE2747061A1 (de) * 1977-10-20 1979-04-26 Leybold Heraeus Gmbh & Co Kg Verfahren und vorrichtung zum beschichten von baendern in vakuumanlagen mit schleuseneinrichtungen
JPS57211613A (en) * 1981-06-22 1982-12-25 Hitachi Ltd Vacuum pressure controller
EP0082654A1 (de) * 1981-12-19 1983-06-29 General Engineering Radcliffe 1979 Limited Vorrichtung und Verfahren zum Beschichten einer langen Materialstrecke
US4526802A (en) * 1983-03-31 1985-07-02 Clarion Co., Ltd. Film deposition equipment

Also Published As

Publication number Publication date
EP0166991B1 (de) 1990-10-17
CA1249492A (en) 1989-01-31
EP0166991A3 (en) 1988-03-30
KR890002655B1 (ko) 1989-07-22
EP0166991A2 (de) 1986-01-08
JPS60258467A (ja) 1985-12-20
KR860000408A (ko) 1986-01-28
US4612206A (en) 1986-09-16
AU4319785A (en) 1985-12-12
JPS6365755B2 (de) 1988-12-16
AU571975B2 (en) 1988-04-28

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee