KR890001459B1 - 문서 작성 장치의 외부 기억제어 방식 - Google Patents

문서 작성 장치의 외부 기억제어 방식 Download PDF

Info

Publication number
KR890001459B1
KR890001459B1 KR1019830006110A KR830006110A KR890001459B1 KR 890001459 B1 KR890001459 B1 KR 890001459B1 KR 1019830006110 A KR1019830006110 A KR 1019830006110A KR 830006110 A KR830006110 A KR 830006110A KR 890001459 B1 KR890001459 B1 KR 890001459B1
Authority
KR
South Korea
Prior art keywords
document
document data
data
external storage
written
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
KR1019830006110A
Other languages
English (en)
Korean (ko)
Other versions
KR850000087A (ko
Inventor
마노쓰도무
타까시 이노야마
Original Assignee
가부시기가이샤 샤켄
이시이 히로고
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시기가이샤 샤켄, 이시이 히로고 filed Critical 가부시기가이샤 샤켄
Publication of KR850000087A publication Critical patent/KR850000087A/ko
Application granted granted Critical
Publication of KR890001459B1 publication Critical patent/KR890001459B1/ko
Expired legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • H10D84/85Complementary IGFETs, e.g. CMOS
    • H10D84/854Complementary IGFETs, e.g. CMOS comprising arrangements for preventing bipolar actions between the different IGFET regions, e.g. arrangements for latchup prevention
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76Making of isolation regions between components
    • H01L21/763Polycrystalline semiconductor regions

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Document Processing Apparatus (AREA)
  • Information Retrieval, Db Structures And Fs Structures Therefor (AREA)
KR1019830006110A 1983-06-07 1983-12-22 문서 작성 장치의 외부 기억제어 방식 Expired KR890001459B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP58-101391 1983-06-07
JP58101391A JPS59226928A (ja) 1983-06-07 1983-06-07 文書作成装置の外部記憶制御方式

Publications (2)

Publication Number Publication Date
KR850000087A KR850000087A (ko) 1985-02-25
KR890001459B1 true KR890001459B1 (ko) 1989-05-03

Family

ID=14299446

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019830006110A Expired KR890001459B1 (ko) 1983-06-07 1983-12-22 문서 작성 장치의 외부 기억제어 방식

Country Status (2)

Country Link
JP (1) JPS59226928A (enrdf_load_stackoverflow)
KR (1) KR890001459B1 (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0658628B2 (ja) * 1987-05-26 1994-08-03 オークマ株式会社 プログラム編集装置

Also Published As

Publication number Publication date
JPS59226928A (ja) 1984-12-20
KR850000087A (ko) 1985-02-25
JPH0157382B2 (enrdf_load_stackoverflow) 1989-12-05

Similar Documents

Publication Publication Date Title
US4764965A (en) Apparatus for processing document data including voice data
KR890001459B1 (ko) 문서 작성 장치의 외부 기억제어 방식
JPS5913771B2 (ja) デイスプレイ装置の編集表示方式
JPH04112344A (ja) データベースの疑似更新方式
JP2599433Y2 (ja) マルチプロセッサシステムにおける各メモリボードの記憶保護装置
JPH02230375A (ja) 電子ファイルシステム
JPS6367215B2 (enrdf_load_stackoverflow)
JPS5826031B2 (ja) 編集処理方式
KR950000540B1 (ko) 윈도우 생성방법 및 장치
KR960010866B1 (ko) 전전자 교환기의 과금데이타 복구방법
JPH02139616A (ja) 情報処理装置の入力方式
JPS61231661A (ja) 情報処理装置
JPH064167A (ja) ディスク媒体障害の復旧方式
JP2713942B2 (ja) かな漢字変換装置
JPH0525139B2 (enrdf_load_stackoverflow)
JPH0210987B2 (enrdf_load_stackoverflow)
JPS62143182A (ja) 画像情報検索装置
JPH02165384A (ja) 情報処理装置
JPH02250166A (ja) 情報処理装置
JPS60150091A (ja) 文書表示装置
JPS59111520A (ja) 文章処理装置におけるデ−タ抹消制御方式
JPH0778791B2 (ja) 文字処理装置
JPS608513B2 (ja) ディスプレイ装置のガイダンス文字表示方式
JPH046993B2 (enrdf_load_stackoverflow)
JPS57147750A (en) Japanese input device

Legal Events

Date Code Title Description
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

A201 Request for examination
PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

G160 Decision to publish patent application
PG1605 Publication of application before grant of patent

St.27 status event code: A-2-2-Q10-Q13-nap-PG1605

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

FPAY Annual fee payment

Payment date: 19920408

Year of fee payment: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 19950504

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 19950504

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000