KR860003625A - X선 원(源)과 함께 사용되는 여과장치 - Google Patents

X선 원(源)과 함께 사용되는 여과장치 Download PDF

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Publication number
KR860003625A
KR860003625A KR1019850007488A KR850007488A KR860003625A KR 860003625 A KR860003625 A KR 860003625A KR 1019850007488 A KR1019850007488 A KR 1019850007488A KR 850007488 A KR850007488 A KR 850007488A KR 860003625 A KR860003625 A KR 860003625A
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South Korea
Prior art keywords
ray
baffle
hatch
window
ray source
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KR1019850007488A
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English (en)
Inventor
시이 라이오던 존 (외 1)
Original Assignee
앨런 시이 코울브
맥스웰 라보라토리이즈 인코포레이팃드
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Application filed by 앨런 시이 코울브, 맥스웰 라보라토리이즈 인코포레이팃드 filed Critical 앨런 시이 코울브
Publication of KR860003625A publication Critical patent/KR860003625A/ko

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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/10—Scattering devices; Absorbing devices; Ionising radiation filters
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/16—Vessels; Containers; Shields associated therewith
    • H01J35/18—Windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/16—Vessels
    • H01J2235/165—Shielding arrangements
    • H01J2235/168—Shielding arrangements against charged particles

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)

Abstract

내용 없음

Description

X선 원(原)과 함께 사용되는 여과장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 여과장치를 부착한 X선 발생장치의 도면.
제2도는 소프트 X선을 발생시키기 위한 가스 분사기와 전극을 나타내는 단면도.
제3도는 제1도의 여과장치의 도면.
도면의 주요부분에 대한 부호의 설명
20:필터장치, 22:X선 발생 시스템, 24:X선원, 26:창구, 30:진공실, 32,34,36:배플(baffle), 38:자석 아스템, 40:자외선 흡수 시스템, 42:노즐, 44:가스 밸브, 46:전송선, 48,50:도전체, 51:전극, 52:벽 54:진공펌프, 58:흡수 플라스틱필름, 60:공급 스푸울, 62:권취 스푸울 64:중앙 구멍.

Claims (14)

  1. 플라즈마 핀치 X선 원, X선 원에 의해 발생된 X선을 조사(照射)될 목표물을 전송하는 창구, 상기 X선 원 및 여과장치를 내포하고 상기 창구에 의해 부분적으로 한정되는 진공실을 포함하는 X선 장비에 사용하도록 상기 X선 원과 창구사이에 배치된 여과장치로서, 열가스들을 확산시키고 그것들을 상기 창구로부터 멀어지게 보내는 배플과, 상기 X선 원에 의해 X선과 함께 발생된 불필요한 성분들이 창구에 이르기 전에 실질적으로 제거되도록 상기 X선 전원으로부터 상기창구를 통과하는 X선 비임에서 자외선을 흡수하는 수단을 포함하는 여과 장치.
  2. 제1항에 있어서, 전하입자를 상기 창구로부터 멀어지게 편향시키는 수단을 더 포함하고, 상기배플과 상기 편향수단이 X선 원과 창구사이에서 X선 경로를 이루는 여과장치.
  3. 제1항에 있어서, 상기 배플이 상기 X선 원에 인접히 배치되고 소프트 X선의 흡수물질로 형성되는 여과장치.
  4. 제3항에 있어서, 상기 배플은 상기 X선 경로의 일부분을 형성하는 중심구멍을 가지며 축선이 있고 대개 원추형인 여과장치.
  5. 제4항에 있어서, 패플의 축선이 상기 X선 경로의 축선과 일치하고, 배플이 상기 X선 경로의 축선에 대해서 30° 내지 60°사이의 각도로 열려있는 여과장치.
  6. 제2항에 있어서, 상기 편향수단이 상기 패플과 흡수수단 사이에 배치된 적어도 하나의 자석을 포함하는 여과장치.
  7. 제6항에 있어서, 상기 배플이 제1배플이고, 상기 자석의 하류측에 그리고 상기 흡수수단의 상류측에 위치한 제2배플을 포함하는 여과장치.
  8. 제7항에 있어서, 상기 제1배플과 상기 자석사이에 위치한 제3배플을 더 포함하는 여과장치.
  9. 제8항에 있어서, 상기 제1배플이 소프트 방사선을 흡수하는 텅스텐 합금과 같은 물질로 만들어지고, 상기 제2 및 제3배플은 다른 물질로 형성되는 여과장치.
  10. 제1항에 있어서, 여러개의 흡수부분을 갖고 있으며 매번그중 하나의 부분만이 상기 원(原)과 상기 창구사이에 위치하는 상기 흡수수단과 다른 흡수부분을 상기의 창구를 덮도록 이동시키는 수단을 포함하는 여과장치.
  11. 제1항에 있어서, 상기 흡수수단은 스푸울들 위에 장착된 일정길이의 자외선 흡수물질로 되어 있는 여과장치.
  12. 제11항에 있어서, 상기 창구가 베릴륨으로 형성되는 여과장치.
  13. X선들을 전송하는 창구와 정렬되어 있고 상기 창구에 의해 부분적으로 형성된 진공실에 배치되는 X선 원에 의한 X선 발생의 좋지못한 부산물을 여과하는 방법에 있어서, (a) 상기 X선 원의 작동에 의해 야기된 열가스들을 확산하고 그 열가스들을 상기 창구에서 멀어지게 보내는 단계, (b) 상기 창구에서 멀어지게 전하입자들을 편향시키는 단계, 및 (c) 상기 창구를 자외선 방사로부터 보호하는 단계를 포함하는 여과방법.
  14. 제13항에 있어서, 상기 창구를 보호하는 단계는 상기 창구를 흡수부분으로 피복하고 이 흡수부분을 주기적으로 교체하는 하위단계들을 포함하는 여과방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019850007488A 1984-10-12 1985-10-11 X선 원(源)과 함께 사용되는 여과장치 KR860003625A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US660,447 1984-10-12
US06/660,447 US4837794A (en) 1984-10-12 1984-10-12 Filter apparatus for use with an x-ray source

Publications (1)

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KR860003625A true KR860003625A (ko) 1986-05-28

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US (1) US4837794A (ko)
EP (1) EP0182477A3 (ko)
JP (1) JPS61158656A (ko)
KR (1) KR860003625A (ko)
CA (1) CA1233918A (ko)
IL (1) IL76664A0 (ko)

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IL76664A0 (en) 1986-02-28
JPS61158656A (ja) 1986-07-18
EP0182477A3 (en) 1988-05-04
CA1233918A (en) 1988-03-08
US4837794A (en) 1989-06-06
EP0182477A2 (en) 1986-05-28

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