KR860000342A - 고분자 감온체 - Google Patents

고분자 감온체 Download PDF

Info

Publication number
KR860000342A
KR860000342A KR1019850004232A KR850004232A KR860000342A KR 860000342 A KR860000342 A KR 860000342A KR 1019850004232 A KR1019850004232 A KR 1019850004232A KR 850004232 A KR850004232 A KR 850004232A KR 860000342 A KR860000342 A KR 860000342A
Authority
KR
South Korea
Prior art keywords
polymer
component
thermal element
aldehyde
acid ester
Prior art date
Application number
KR1019850004232A
Other languages
English (en)
Other versions
KR890003442B1 (ko
Inventor
도미하루 호사카
Original Assignee
야마시다 도시히꼬
마쓰시다덴기산교 가부시기 가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP12304784A external-priority patent/JPH0247086B2/ja
Priority claimed from JP12304684A external-priority patent/JPH0247085B2/ja
Priority claimed from JP21950384A external-priority patent/JPH0247087B2/ja
Application filed by 야마시다 도시히꼬, 마쓰시다덴기산교 가부시기 가이샤 filed Critical 야마시다 도시히꼬
Publication of KR860000342A publication Critical patent/KR860000342A/ko
Application granted granted Critical
Publication of KR890003442B1 publication Critical patent/KR890003442B1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/04—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material having negative temperature coefficient
    • H01C7/049—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material having negative temperature coefficient mainly consisting of organic or organo-metal substances
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/13—Phenols; Phenolates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L77/00—Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L77/00—Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers
    • C08L77/12—Polyester-amides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S525/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S525/926—Polyamide containing a plurality of oxyalkylene groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Measuring Temperature Or Quantity Of Heat (AREA)

Abstract

내용 없음

Description

고분자 감온체
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 폴리아미드와 N-치환아미드성분을 함유한 폴리아미드의 비율을 변경했을때의 페놀계축중합체의 비율을 변경했을때의 조성물의 30℃에서의 체적고유 임피이던스를 나타내는 그래프.
제3도는 폴리아미드와 N-치환아미드 성분을 함유한 폴리아미드로 이루어진 고분자 매트릭스에, 페놀계수지를 첨가하고 또 페놀계올리고머를 첨가했을때의 체전고유 임피이던스의 온도특성의 변화를 나타내는 그래프.

Claims (13)

  1. N-알킬치환아미드 성분 또는 에텔아미드성분을 포함한 폴리아미드를 함유한 고분자 메트릭스속에 페놀계 화합물의 알데히드축 중합체를 첨가하여 이루어지는 고분자 감온체.
  2. 제1항에 있어서, 폴리아미드가, 운데칸아미드 또는 도데칸아미드 성분을 함유하고 있는 고분자 감온체.
  3. 제1항 또는 제2항에 있어서, 에텔아미드 성분의 알킬렌옥시가 종합체인 고분자 감온체.
  4. 제3항에 있어서, 알킬렌옥시 종합체가 폴리(에틸렌옥시), 폴리(프로필렌옥시), 폴리(부틸렌옥시)로부터 선택된 적어도 1가지인 고분자 감온체.
  5. 제1항에서부터 제4항의 어느 것인가에 있어서, 고분자 메트릭스가, N-알킬치환아미드 성분 또는 에텔아미드성분을 함유한 폴리아미드와 폴리운데칸아비드 또는 폴리도데칸 아미드와의 혼련물로 이루어지는 고분자 감온체.
  6. 제1항에 있어서, 페놀계 화합물이, 옥시안식향산에스텔, 알킬페놀, 할로겐화페놀으로부터 선택된 적어도 1가지인 고분자 감온체.
  7. 제6항에 있어서, 옥시안식향산에스텔이, p-옥시안식향산에스텔이고, 알데히드가 포리알데히드인 고분자 감온체.
  8. 제1항에서부터 제7항의 어느것인가에 있어서, 페놀계 화합물의 알데히드축 중합체가 고분자 메트릭스 100중량부에 대하여 5~30중량부 첨가된 고분자 감온체.
  9. 제5항에서부터 제8항의 어느 것인가에 있어서, 고분자 메트릭스가, 폴리운데칸아미드 혹은 폴리도데칸아미드 0~8%와 N-알킬치환아미드 성분 또는 에텔아미드 성분을 함유한 폴리아미드 100~20%로 이루어지고, 페놀계 화합물의 알데히드축 중합체가 중합도 @10 의 축중합체 A와 중합도 @ 10 의 축중합체 B로 이루어지고, B/A = 0~5 의 범위에서 첨가된 고분자 감온체.
  10. 제9항에 있어서, 축 중합체 A가, 알킬페놀 알데히드축 중합체인 고분자 감온체.
  11. 제10항에 있어서, 알킬페놀의 알킬기가, 탄소수 4~12의 알킬기인 고분자 감온체.
  12. 제9항에서부터 제11항의 어느것인가에 있어서, 축중합체가 B가 옥시안식향산에스텔 알데히드축 중합체인 고분자 감온체.
  13. 제12항에 있어서, 옥시안식향산에스텔의 알킬기가, 탄소수 6~18의 알킬기인 고분자 감온체.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019850004232A 1984-06-15 1985-06-15 고분자 감온체 KR890003442B1 (ko)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP12304784A JPH0247086B2 (ja) 1984-06-15 1984-06-15 Kobunshikanontai
JP12304684A JPH0247085B2 (ja) 1984-06-15 1984-06-15 Kobunshikanontai
JP59-123046 1984-06-15
JP123047 1984-06-15
JP21950384A JPH0247087B2 (ja) 1984-10-19 1984-10-19 Kobunshikanontai
JP219503 1984-10-19
JP123046 1988-09-20

Publications (2)

Publication Number Publication Date
KR860000342A true KR860000342A (ko) 1986-01-28
KR890003442B1 KR890003442B1 (ko) 1989-09-21

Family

ID=27314618

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019850004232A KR890003442B1 (ko) 1984-06-15 1985-06-15 고분자 감온체

Country Status (2)

Country Link
US (1) US4617356A (ko)
KR (1) KR890003442B1 (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5492980A (en) * 1992-10-12 1996-02-20 Kishimoto Sangyo Co., Ltd. Thermoplastic molding resin composition
JP3037525B2 (ja) * 1993-04-12 2000-04-24 松下電器産業株式会社 発熱シート
US5443867A (en) * 1993-10-25 1995-08-22 E. I. Du Pont De Nemours And Company Articles incorporating barrier resins
MY120047A (en) * 1997-06-30 2005-08-30 Kisco Ltd Polyamide resin composition

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3901952A (en) * 1971-12-14 1975-08-26 Matsushita Electric Ind Co Ltd Polymeric thermo-detective material
US3899462A (en) * 1974-03-29 1975-08-12 Gen Motors Corp Reinforced polyamide molding composition
JPS5522013B2 (ko) * 1974-09-11 1980-06-13
JPS5141237A (en) * 1974-10-05 1976-04-07 Yasuro Ito Satsushumataha wakutaishusokunitaisuru suikoseibutsushitsukonrenbutsuno chunyusochi
JPS53117A (en) * 1976-06-24 1978-01-05 Mitsubishi Paper Mills Ltd Photographic paper support
JPS6019516B2 (ja) * 1977-08-31 1985-05-16 カシオ計算機株式会社 画面編集方式
JPS55128203A (en) * 1979-03-28 1980-10-03 Daicel Ltd High molecular heat sensitive material
JPS55145757A (en) * 1979-05-02 1980-11-13 Daicel Chem Ind Ltd High-molecular heat-sensitive material
JPS55145756A (en) * 1979-05-02 1980-11-13 Daicel Chem Ind Ltd High-molecular heat-sensitive material
DE3029744A1 (de) * 1980-08-06 1982-03-11 Basf Ag, 6700 Ludwigshafen Desublimator fuer die gewinnung von sublimationsprodukten aus reaktionsgasen
JPS57206001A (en) * 1981-06-15 1982-12-17 Toray Industries Heat sensitive element
JPS58136624A (ja) * 1982-02-08 1983-08-13 Toray Ind Inc 感熱性素子

Also Published As

Publication number Publication date
KR890003442B1 (ko) 1989-09-21
US4617356A (en) 1986-10-14

Similar Documents

Publication Publication Date Title
Liang et al. Enhancement of processability of cyanate ester resin via copolymerization with epoxy resin
KR910018511A (ko) 저 점도 저 작용온도 열 용융형 접착제용 스티렌-이소프렌-스티렌 블록 공중합체 조성물
KR910014462A (ko) 용융 성형을 위한 중합체 혼합 조성물
KR960014242A (ko) 전자 부품 봉입용 에폭시 수지 성형 재료 및 그것을 이용한 봉입 반도체 장치
KR910018510A (ko) 저 점도 저 작용온도 열 용융형 접착제용 스티렌- 이소프렌- 스티렌 블록 공중합체 조성물
KR930017971A (ko) 열 경화성 수지 조성물
KR860000342A (ko) 고분자 감온체
Wetton et al. DMTA studies of polymer blends and compatibility
KR870007446A (ko) 감광성 조성물
US3086946A (en) Fluoroamidines and condensation products thereof
KR860000547A (ko) 고분자 감온 체
KR910021446A (ko) 폴리페닐렌 술피드 수지 조성물
Escher Thermal expansion of epoxy resins with different cross-link densities at low temperatures
Merrill et al. Block copolymers based on 2, 2‐bis (4‐hydroxyphenyl) propane polycarbonate. II. Effect of block length and composition on physical properties
JPS5692908A (en) High-molecular novolak type substituted phenolic resin, its preparation and application
Duffy et al. Aromatic Imide-Quinoxaline Copolymers
JPS63314264A (ja) ポリアセタ−ル樹脂組成物
Augl et al. Synthesis and Evaluation of New Phenylated Polyquinoxalines
Guozheng et al. Synthesis and characteristic of allyl novolac and its copolymer with bismaleimide
Johnson et al. Thianthrene-Based Poly (Benzoxazole) s
Augl et al. Synthesis of Co-Imide-Quinoxalines
KR890701642A (ko) 지점도, 반결정질 염소화폴리에틸렌 수지 및 이로부터 제조된 제품
KR970070041A (ko) 방향족 폴리카보디이미드 및 그의 필름
JPH0247086B2 (ja) Kobunshikanontai
Augl et al. Synthesis of Polyquinoxalines Containing Carbonyl Groups in the Polymer Chain

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
G160 Decision to publish patent application
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 19980917

Year of fee payment: 10

LAPS Lapse due to unpaid annual fee