KR850002850A - 아연-니켈 합금 전기 도금 강판의 후처리 방법 - Google Patents

아연-니켈 합금 전기 도금 강판의 후처리 방법 Download PDF

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KR850002850A
KR850002850A KR1019840005283A KR840005283A KR850002850A KR 850002850 A KR850002850 A KR 850002850A KR 1019840005283 A KR1019840005283 A KR 1019840005283A KR 840005283 A KR840005283 A KR 840005283A KR 850002850 A KR850002850 A KR 850002850A
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South Korea
Prior art keywords
steel sheet
post
zinc
treatment method
heated
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KR1019840005283A
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KR890003020B1 (ko
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다이스께 이리에 (외 4)
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아베 유즈루
닛씬 세이꼬 가부시끼 가이샤
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48After-treatment of electroplated surfaces
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48After-treatment of electroplated surfaces
    • C25D5/50After-treatment of electroplated surfaces by heat-treatment
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/562Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/565Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10Electroplating with more than one layer of the same or of different metals
    • C25D5/12Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C25D5/14Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Coating With Molten Metal (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Abstract

내용 없음

Description

아연-니켈 합금 전기 도금 강판의 후처리 방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (14)

  1. 개량된 아연-니켈 합금 전기 도금 강판의 후처리 방법에 있어서, 10 내지 40g/ℓZn2+과 15 내지 160g/ℓNi2+과 0.2 내지 10g/1ℓTi4+를 함유하고 Al3+, Mg3+, Fe3+, Cr3+, In3+및 Sb3+중 적어도 하나를 2g/ℓ보다 적게 함유하며 여기서 Ni2+/(Zn2++Ni2+) 비율은 몰농도에서 약 0.2 내지 0.8로 조절되는 산성 도금조에서 전기 도금하는 단계와, 수분속에서 강판을 가열시키는 단계를 구비하는 것을 특징으로 하는 후처리 방법.
  2. 제1항에 있어서, 도금강판은 가열수에서 가열되는 것을 특징으로 하는 후처리 방법.
  3. 제2항에 있어서, 도금강판은 PH10 이상의 알칼리성 가열수에서 가열되는 것을 특징으로 하는 후처리 방법.
  4. 제1항에 있어서, 도금강판은 증기속에서 가열되는 것을 특징으로 하는 후처리 방법.
  5. 제1항에 있어서, 도금조는 12 내지 25g/ℓ Zn과 20 내지 60g/ℓ Ni과 1 내지 8g/ℓ Ti을 함유하는 것을 특징으로 하는 후처리 방법.
  6. 제5항에 있어서, 도금조는 13 내지 21g/ℓ Zn과 30 내지 50g/ℓ Ni과 3 내지 7g/ℓ Ti을 함유하는 것을 특징으로 하는 후처리 방법.
  7. 제1항에 있어서, 주도금조는 Al3+, Mg2+, Fe3+, Cr3+, Im3+및 Sb3+중 적어도 하나를 0.05 내지 1.0g/ℓ 함유하는 것을 특징으로 하는 후처리 방법.
  8. 개량된 아연-니켈 전기도금 강판을 후처리하는 방법에 있어서, Nn2+와 Ni2+을 함유하고 여기서 Ni2+/(Zn2++Ni2+) 비율은 몰농도에서 약 0.72 내지 0.86로 조절되는 도금조에서 강판을 예비전기도금하며, 상기 전기도금 강판을 10 내지 40g/ℓZn2+과 15 내지 160g/ℓNi2+과 0.2 내지 10g/1ℓTi4+를 함유하고 Al3+, Mg2+, Fe3+, In3+및 Sb3+중 적어도 하나를 2g/ℓ보다 적게 함유하며 여기서 Ni2+/(Zn2++Ni2+) 비율은 몰농도에서 약 0.2 내지 0.8로 조절되는 산성도금조에서 전기 도금하며, 수분속에서 도금강판을 가열하는 것을 특징으로 하는 후처리 방법.
  9. 제8항에 있어서, 도금강판은 가열수에서 가열되는 것을 특징으로 하는 후처리 방법.
  10. 제9항에 있어서, 도금강판은 PH10 이상의 알칼리성 가열수에서 가열되는 것을 특징으로 하는 후처리 방법.
  11. 제8항에 있어서, 도금강판은 증기속에서 가열되는 것을 특징으로 하는 후처리 방법.
  12. 제8항에 있어서, 예비도금조는 11 내지 34g/ℓ 아연과 62 내지 79g/ℓ 니켈을 함유하며, 도금조는 12 내지 25g/ℓ 아연과 20 내지 60g/ℓ 니켈과 1 내지 8g/ℓ 티타늄을 함유하는 것을 특징으로 하는 후처리 방법.
  13. 제12항에 있어서, 예비 도금조는 15 내지 30g/ℓ 아연과 85 내지 70g/ℓ 니켈을 함유하며, 주도금조는 13 내지 21g/ℓ 아연과 30 내지 50g/ℓ 니켈과 3 내지 7g/ℓ 티타늄을 함유하는 것을 특징으로 하는 후처리 방법.
  14. 제8항에 있어서, 주도금조는 Al3+, Mg2+, Fe3+, Cr3+, In3+및 Sb3+중 적어도 하나를 0.05 내지 1.0g/ℓ 함유하는 것을 특징으로 하는 후처리 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019840005283A 1983-09-02 1984-08-29 아연-니켈 합금 전기도금강판의 후처리 방법 KR890003020B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP58161596A JPS6052592A (ja) 1983-09-02 1983-09-02 Zn−Ni系合金電気めっき鋼板の製造方法
JP161596 1983-09-02

Publications (2)

Publication Number Publication Date
KR850002850A true KR850002850A (ko) 1985-05-20
KR890003020B1 KR890003020B1 (ko) 1989-08-18

Family

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KR1019840005283A KR890003020B1 (ko) 1983-09-02 1984-08-29 아연-니켈 합금 전기도금강판의 후처리 방법

Country Status (8)

Country Link
US (1) US4581107A (ko)
JP (1) JPS6052592A (ko)
KR (1) KR890003020B1 (ko)
CA (1) CA1242987A (ko)
DE (1) DE3432141A1 (ko)
FR (1) FR2551466B1 (ko)
GB (1) GB2145739B (ko)
IT (1) IT1179075B (ko)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4707415A (en) * 1985-03-30 1987-11-17 Sumitomo Metal Industries, Ltd. Steel strips with corrosion resistant surface layers having good appearance
JPH0765231B2 (ja) * 1985-06-24 1995-07-12 住友金属工業株式会社 燃料タンク用積層めつき鋼板
JPH0765211B2 (ja) * 1985-06-24 1995-07-12 住友金属工業株式会社 自動車の袋閉じ構造部材
JP2534280B2 (ja) * 1987-02-05 1996-09-11 日本パーカライジング株式会社 亜鉛系複合めっき金属材料およびめっき方法
US5236413B1 (en) * 1990-05-07 1996-06-18 Andrew J Feiring Method and apparatus for inducing the permeation of medication into internal tissue
US5330091A (en) * 1992-10-09 1994-07-19 The Boc Group, Inc. Seamless cylinder shell construction
JP3223829B2 (ja) * 1997-01-29 2001-10-29 新光電気工業株式会社 電気ニッケルめっき浴又は電気ニッケル合金めっき浴及びそれを用いためっき方法
US7442286B2 (en) * 2004-02-26 2008-10-28 Atotech Deutschland Gmbh Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys
CN109642337B (zh) * 2016-05-24 2021-07-13 科文特亚股份有限公司 三元锌-镍-铁合金和用于电镀这种合金的碱性电解液

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1117894A (en) * 1977-01-13 1982-02-09 Richard J. Clauss Production of multiple zinc-containing coatings
US4314893A (en) * 1978-06-02 1982-02-09 Hooker Chemicals & Plastics Corp. Production of multiple zinc-containing coatings
US4313802A (en) * 1979-02-15 1982-02-02 Sumitomo Metal Industries, Ltd. Method of plating steel strip with nickel-zinc alloy
JPS56293A (en) * 1979-06-18 1981-01-06 Toyo Kohan Co Ltd Production of dark color zinc electroplated steel plate
US4388160A (en) * 1980-02-20 1983-06-14 Rynne George B Zinc-nickel alloy electroplating process
JPS586995A (ja) * 1981-07-03 1983-01-14 Kawasaki Steel Corp 加工後の密着性の優れた亜鉛−ニツケル合金めつき鋼板
JPS6027757B2 (ja) * 1981-12-14 1985-07-01 日新製鋼株式会社 高耐食性電気亜鉛めつき鋼板およびその製造方法
JPS58207389A (ja) * 1982-05-28 1983-12-02 Nisshin Steel Co Ltd 耐食性に優れた電気亜鉛合金めつき鋼板の製造法
JPS5985889A (ja) * 1982-11-10 1984-05-17 Nisshin Steel Co Ltd めつき層の密着性に優れたZn−Ni−Ti合金めつき鋼板の製造法

Also Published As

Publication number Publication date
CA1242987A (en) 1988-10-11
IT8467849A0 (it) 1984-08-27
KR890003020B1 (ko) 1989-08-18
FR2551466B1 (fr) 1989-06-02
GB2145739A (en) 1985-04-03
US4581107A (en) 1986-04-08
FR2551466A1 (fr) 1985-03-08
DE3432141A1 (de) 1985-04-11
GB8422040D0 (en) 1984-10-03
GB2145739B (en) 1987-09-03
JPS6052592A (ja) 1985-03-25
JPS626754B2 (ko) 1987-02-13
DE3432141C2 (ko) 1992-04-30
IT8467849A1 (it) 1986-02-27
IT1179075B (it) 1987-09-16

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