KR850002651A - 진공인터라프터의 접촉전극의 제조방법 - Google Patents
진공인터라프터의 접촉전극의 제조방법 Download PDFInfo
- Publication number
- KR850002651A KR850002651A KR1019840005695A KR840005695A KR850002651A KR 850002651 A KR850002651 A KR 850002651A KR 1019840005695 A KR1019840005695 A KR 1019840005695A KR 840005695 A KR840005695 A KR 840005695A KR 850002651 A KR850002651 A KR 850002651A
- Authority
- KR
- South Korea
- Prior art keywords
- contact electrode
- silicon
- chromium
- iron
- carbon
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title claims 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 12
- 229910052710 silicon Inorganic materials 0.000 claims 7
- 239000010703 silicon Substances 0.000 claims 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims 6
- 229910052799 carbon Inorganic materials 0.000 claims 6
- 229910052804 chromium Inorganic materials 0.000 claims 6
- 239000011651 chromium Substances 0.000 claims 6
- 229910052742 iron Inorganic materials 0.000 claims 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 3
- 229910000604 Ferrochrome Inorganic materials 0.000 claims 3
- 229910052802 copper Inorganic materials 0.000 claims 3
- 239000010949 copper Substances 0.000 claims 3
- 239000000203 mixture Substances 0.000 claims 2
- 239000000843 powder Substances 0.000 claims 2
- 230000008595 infiltration Effects 0.000 claims 1
- 238000001764 infiltration Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 238000002844 melting Methods 0.000 claims 1
- 230000008018 melting Effects 0.000 claims 1
- 230000003647 oxidation Effects 0.000 claims 1
- 238000007254 oxidation reaction Methods 0.000 claims 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
- H01H1/00—Contacts
- H01H1/02—Contacts characterised by the material thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
- H01H1/00—Contacts
- H01H1/02—Contacts characterised by the material thereof
- H01H1/0203—Contacts characterised by the material thereof specially adapted for vacuum switches
- H01H1/0206—Contacts characterised by the material thereof specially adapted for vacuum switches containing as major components Cu and Cr
Landscapes
- High-Tension Arc-Extinguishing Switches Without Spraying Means (AREA)
- Powder Metallurgy (AREA)
- Contacts (AREA)
- Manufacture Of Switches (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명에 있어서, 한쌍의 접촉전극을 구비한 진공인터라프터의 종단면도이다.
Claims (6)
- 동이 29-74중량%, 크롬이 15-60중량%, 철이 10-35중량% 탄소가 0.5-15중량% 및 규소가 0.5-15중량%의 재료로 제조된 진공인터라프터의 접촉전극.
- 제1항에 기재된 접촉전극으로서, 상기 크롬, 철, 탄소 및 규소의 전부가 시판의 훼로크롬가루로부터 득할 수 있는 것을 특징으로 하는 것.
- 제1항에 기재한 접촉전극으로서, 상기 크롬, 철, 탄소 및 규소의 일부가 시판의 훼로크롬가루로부터 득할 수 있는 것을 특징으로 하는 것,
- 제1항에 기재한 접촉전극으로서, 상기 크롬, 철, 탄소 및 규소가 같이 다공질기재를 구성하고, 이 다공질기재에 동이 용침되는 것을 특징으로 하는 것.
- 제4항에 기재된 접촉전극으로서, 상기 크롬, 철, 탄소 및 규소가 시판의 훼로크롬의 형태로 다공질 기재중에 함유되는 것을 특징으로 하는 것.
- 최종조성비에서 크롬이 15-60중량%, 철이 10-35중량%, 탄소가 0.5-15중량%, 및 규소가 0.5-15중량%로서, 전성분합계의 최종조성비가 26-71중량%에 달하는 상기 전성분으로 되는 혼합물이 비산화성분위기중에 있어서 규소의 융점보다 낮은 온도로 가열되고, 상기 전성분으로 되는 다공질기재가 제조되는 공정하고, 이 다공질기재가 비산화성분위기중에 있어서, 최종조성비에서 29-74중량%의 동으로 용침되는 공정하고, 얻어진 재료가 기계가공되는 공정하고로 되는 진공인터라프터의 접촉전극의 제조방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58-176764 | 1983-09-24 | ||
JP58176764A JPS6067634A (ja) | 1983-09-24 | 1983-09-24 | 真空インタラプタの電極材料とその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR850002651A true KR850002651A (ko) | 1985-05-15 |
KR890002304B1 KR890002304B1 (ko) | 1989-06-28 |
Family
ID=16019403
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019840005695A KR890002304B1 (ko) | 1983-09-24 | 1984-09-18 | 진공인터라프터의 접촉전극의 제조방법 |
Country Status (6)
Country | Link |
---|---|
US (1) | US4554425A (ko) |
EP (1) | EP0137350B1 (ko) |
JP (1) | JPS6067634A (ko) |
KR (1) | KR890002304B1 (ko) |
DE (1) | DE3478533D1 (ko) |
IN (1) | IN163592B (ko) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4686338A (en) * | 1984-02-25 | 1987-08-11 | Kabushiki Kaisha Meidensha | Contact electrode material for vacuum interrupter and method of manufacturing the same |
DE3565907D1 (en) * | 1984-07-30 | 1988-12-01 | Siemens Ag | Vacuum contactor with contact pieces of cucr and process for the production of such contact pieces |
US4687515A (en) * | 1986-04-10 | 1987-08-18 | General Electric Company | Vacuum interrupter contact |
WO2000041227A1 (fr) * | 1998-12-28 | 2000-07-13 | Shin-Etsu Handotai Co.,Ltd. | Procede de recuit thermique d'une plaquette de silicium, et plaquette de silicium |
US20070080455A1 (en) * | 2005-10-11 | 2007-04-12 | International Business Machines Corporation | Semiconductors and methods of making |
US7863183B2 (en) * | 2006-01-18 | 2011-01-04 | International Business Machines Corporation | Method for fabricating last level copper-to-C4 connection with interfacial cap structure |
EP2760038B1 (en) * | 2011-09-19 | 2021-10-27 | Mitsubishi Electric Corporation | Electromagnetically operated device and switching device |
US9368301B2 (en) * | 2014-01-20 | 2016-06-14 | Eaton Corporation | Vacuum interrupter with arc-resistant center shield |
CN104815980A (zh) * | 2015-03-26 | 2015-08-05 | 海门市金易焊接材料有限公司 | 微碳铬铁粉 |
JP6090388B2 (ja) * | 2015-08-11 | 2017-03-08 | 株式会社明電舎 | 電極材料及び電極材料の製造方法 |
US10468205B2 (en) | 2016-12-13 | 2019-11-05 | Eaton Intelligent Power Limited | Electrical contact alloy for vacuum contactors |
CN114628178B (zh) * | 2022-03-16 | 2024-03-19 | 桂林金格电工电子材料科技有限公司 | 一种铜铬触头自耗电极的制备方法 |
CN116574937B (zh) * | 2023-05-08 | 2023-10-03 | 江苏爱斯凯电气有限公司 | 一种用作真空开关的触头材料及其制备方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE888178C (de) * | 1943-04-04 | 1953-08-31 | Degussa | Auf pulvermetallurgischem Wege hergestellter Kontaktwerkstoff aus Metallen mit guter elektrischer Leitfaehigkeit und einer Hartstoffkomponente |
GB1020914A (en) * | 1961-11-10 | 1966-02-23 | Gen Electric | Improvements in vacuum circuit interrupter |
US3596927A (en) * | 1969-10-10 | 1971-08-03 | Exxon Research Engineering Co | Production of 4-methylpentene-1 |
US3821505A (en) * | 1972-05-18 | 1974-06-28 | English Electric Co Ltd | Vacuum type electric circuit interrupting devices |
DE2346179A1 (de) * | 1973-09-13 | 1975-06-26 | Siemens Ag | Verbundmetall als kontaktwerkstoff fuer vakuumschalter |
DE2619459C3 (de) * | 1976-05-03 | 1978-11-09 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Sinterverbundwerkstoff als Kontaktwerkstoff für Vakuum-Mittelspannungs-Leistungsschalter |
-
1983
- 1983-09-24 JP JP58176764A patent/JPS6067634A/ja active Granted
-
1984
- 1984-09-07 US US06/648,362 patent/US4554425A/en not_active Expired - Lifetime
- 1984-09-14 DE DE8484111022T patent/DE3478533D1/de not_active Expired
- 1984-09-14 EP EP84111022A patent/EP0137350B1/en not_active Expired
- 1984-09-18 KR KR1019840005695A patent/KR890002304B1/ko not_active IP Right Cessation
- 1984-09-28 IN IN700/CAL/84A patent/IN163592B/en unknown
Also Published As
Publication number | Publication date |
---|---|
US4554425A (en) | 1985-11-19 |
JPH0534406B2 (ko) | 1993-05-24 |
EP0137350A3 (en) | 1985-12-18 |
DE3478533D1 (en) | 1989-07-06 |
IN163592B (ko) | 1988-10-15 |
EP0137350B1 (en) | 1989-05-31 |
EP0137350A2 (en) | 1985-04-17 |
KR890002304B1 (ko) | 1989-06-28 |
JPS6067634A (ja) | 1985-04-18 |
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Date | Code | Title | Description |
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A201 | Request for examination | ||
G160 | Decision to publish patent application | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 19970429 Year of fee payment: 9 |
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LAPS | Lapse due to unpaid annual fee |