KR840002471A - 양이온 교환막의 보수방법 - Google Patents
양이온 교환막의 보수방법 Download PDFInfo
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- KR840002471A KR840002471A KR1019820004913A KR820004913A KR840002471A KR 840002471 A KR840002471 A KR 840002471A KR 1019820004913 A KR1019820004913 A KR 1019820004913A KR 820004913 A KR820004913 A KR 820004913A KR 840002471 A KR840002471 A KR 840002471A
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- 239000012528 membrane Substances 0.000 title claims 12
- 238000005341 cation exchange Methods 0.000 title claims 2
- -1 vinyl fluoride compound Chemical class 0.000 claims 16
- 239000006185 dispersion Substances 0.000 claims 9
- 238000000034 method Methods 0.000 claims 9
- 239000000178 monomer Substances 0.000 claims 8
- 229920001577 copolymer Polymers 0.000 claims 5
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims 4
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims 4
- 150000007942 carboxylates Chemical class 0.000 claims 4
- 239000002609 medium Substances 0.000 claims 4
- 239000002184 metal Chemical group 0.000 claims 4
- 229910052751 metal Inorganic materials 0.000 claims 4
- 125000004430 oxygen atom Chemical group O* 0.000 claims 4
- 150000003254 radicals Chemical class 0.000 claims 4
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 claims 4
- 229940124530 sulfonamide Drugs 0.000 claims 4
- 150000003456 sulfonamides Chemical group 0.000 claims 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims 3
- 230000001588 bifunctional effect Effects 0.000 claims 3
- 125000004432 carbon atom Chemical group C* 0.000 claims 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 claims 3
- 125000000524 functional group Chemical group 0.000 claims 3
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims 3
- ONUFSRWQCKNVSL-UHFFFAOYSA-N 1,2,3,4,5-pentafluoro-6-(2,3,4,5,6-pentafluorophenyl)benzene Chemical group FC1=C(F)C(F)=C(F)C(F)=C1C1=C(F)C(F)=C(F)C(F)=C1F ONUFSRWQCKNVSL-UHFFFAOYSA-N 0.000 claims 2
- XBNGYFFABRKICK-UHFFFAOYSA-N 2,3,4,5,6-pentafluorophenol Chemical compound OC1=C(F)C(F)=C(F)C(F)=C1F XBNGYFFABRKICK-UHFFFAOYSA-N 0.000 claims 2
- ZHZPKMZKYBQGKG-UHFFFAOYSA-N 6-methyl-2,4,6-tris(trifluoromethyl)oxane-2,4-diol Chemical compound FC(F)(F)C1(C)CC(O)(C(F)(F)F)CC(O)(C(F)(F)F)O1 ZHZPKMZKYBQGKG-UHFFFAOYSA-N 0.000 claims 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical group [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 claims 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 claims 2
- 229910052799 carbon Inorganic materials 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 239000002612 dispersion medium Substances 0.000 claims 2
- 235000011187 glycerol Nutrition 0.000 claims 2
- 150000008282 halocarbons Chemical class 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 claims 2
- 239000000203 mixture Substances 0.000 claims 2
- NZMAJUHVSZBJHL-UHFFFAOYSA-N n,n-dibutylformamide Chemical compound CCCCN(C=O)CCCC NZMAJUHVSZBJHL-UHFFFAOYSA-N 0.000 claims 2
- AJFDBNQQDYLMJN-UHFFFAOYSA-N n,n-diethylacetamide Chemical compound CCN(CC)C(C)=O AJFDBNQQDYLMJN-UHFFFAOYSA-N 0.000 claims 2
- MBHINSULENHCMF-UHFFFAOYSA-N n,n-dimethylpropanamide Chemical compound CCC(=O)N(C)C MBHINSULENHCMF-UHFFFAOYSA-N 0.000 claims 2
- IFTIBNDWGNYRLS-UHFFFAOYSA-N n,n-dipropylacetamide Chemical compound CCCN(C(C)=O)CCC IFTIBNDWGNYRLS-UHFFFAOYSA-N 0.000 claims 2
- PZYDAVFRVJXFHS-UHFFFAOYSA-N n-cyclohexyl-2-pyrrolidone Chemical compound O=C1CCCN1C1CCCCC1 PZYDAVFRVJXFHS-UHFFFAOYSA-N 0.000 claims 2
- IZUPBVBPLAPZRR-UHFFFAOYSA-N pentachloro-phenol Natural products OC1=C(Cl)C(Cl)=C(Cl)C(Cl)=C1Cl IZUPBVBPLAPZRR-UHFFFAOYSA-N 0.000 claims 2
- SNGREZUHAYWORS-UHFFFAOYSA-N perfluorooctanoic acid Chemical compound OC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F SNGREZUHAYWORS-UHFFFAOYSA-N 0.000 claims 2
- RVZRBWKZFJCCIB-UHFFFAOYSA-N perfluorotributylamine Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)N(C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F RVZRBWKZFJCCIB-UHFFFAOYSA-N 0.000 claims 2
- AQZYBQIAUSKCCS-UHFFFAOYSA-N perfluorotripentylamine Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)N(C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F AQZYBQIAUSKCCS-UHFFFAOYSA-N 0.000 claims 2
- 230000003014 reinforcing effect Effects 0.000 claims 2
- 150000003839 salts Chemical class 0.000 claims 2
- 125000001273 sulfonato group Chemical class [O-]S(*)(=O)=O 0.000 claims 2
- OBTWBSRJZRCYQV-UHFFFAOYSA-N sulfuryl difluoride Chemical group FS(F)(=O)=O OBTWBSRJZRCYQV-UHFFFAOYSA-N 0.000 claims 2
- WVWNIPRUWXKVCI-UHFFFAOYSA-N 1-(5-methyl-2-propan-2-ylcyclohexyl)pyrrolidin-2-one Chemical compound CC(C)C1CCC(C)CC1N1C(=O)CCC1 WVWNIPRUWXKVCI-UHFFFAOYSA-N 0.000 claims 1
- MEXUTNIFSHFQRG-UHFFFAOYSA-N 6,7,12,13-tetrahydro-5h-indolo[2,3-a]pyrrolo[3,4-c]carbazol-5-one Chemical compound C12=C3C=CC=C[C]3NC2=C2NC3=CC=C[CH]C3=C2C2=C1C(=O)NC2 MEXUTNIFSHFQRG-UHFFFAOYSA-N 0.000 claims 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical group [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 1
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical class O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 claims 1
- 239000002253 acid Substances 0.000 claims 1
- 150000003973 alkyl amines Chemical class 0.000 claims 1
- KMGARVOVYXNAOF-UHFFFAOYSA-N benzpiperylone Chemical compound C1CN(C)CCC1N1C(=O)C(CC=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 KMGARVOVYXNAOF-UHFFFAOYSA-N 0.000 claims 1
- 239000011737 fluorine Chemical group 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 235000019256 formaldehyde Nutrition 0.000 claims 1
- 238000011534 incubation Methods 0.000 claims 1
- 150000002739 metals Chemical class 0.000 claims 1
- GYLDXXLJMRTVSS-UHFFFAOYSA-N n-butylacetamide Chemical compound CCCCNC(C)=O GYLDXXLJMRTVSS-UHFFFAOYSA-N 0.000 claims 1
- 150000004760 silicates Chemical class 0.000 claims 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 claims 1
- 150000003457 sulfones Chemical class 0.000 claims 1
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B13/00—Diaphragms; Spacing elements
- C25B13/04—Diaphragms; Spacing elements characterised by the material
- C25B13/08—Diaphragms; Spacing elements characterised by the material based on organic materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
- C08J3/02—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques
- C08J3/09—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in organic liquids
- C08J3/091—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in organic liquids characterised by the chemical constitution of the organic liquid
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/20—Manufacture of shaped structures of ion-exchange resins
- C08J5/22—Films, membranes or diaphragms
- C08J5/2287—After-treatment
- C08J5/2293—After-treatment of fluorine-containing membranes
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L27/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
- C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
- C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
- C08L27/18—Homopolymers or copolymers or tetrafluoroethene
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D127/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers
- C09D127/02—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment
- C09D127/12—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
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- C25B13/00—Diaphragms; Spacing elements
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2327/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers
- C08J2327/02—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment
- C08J2327/12—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
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- C08J2327/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers
- C08J2327/02—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment
- C08J2327/12—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
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- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
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Abstract
내용 없음.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (9)
- 술포닐 및 카르보닐중 하나로부터 유도된 매달린 관능기를 갖고 당량이 높은 파플루오로탄소 공중합막의 손상된 막을 보수하는 방법에 있어서, 1) 패칭 파플루오로탄소를 선택한 후, 패칭 파플루오로탄소와 막 파플루오로탄소 모두를 적어도 부분적으로 용해할 수 있는 매체에 패칭 파플루오로탄소를 분산하고, 2) 분산된 패칭 파플루오로탄소를 보수될 막의 손상부분에 이용한 후, 3) 가열 및 진공하에 분산매체를 제거한 다음, 4) 손상된 막부분에 원하는 두께로 보수될 때까지 상기 2 및 3단계를 반복하는 것을 특징으로 하는 양이온 교환막의 보수방법.
- 제1항에 있어서, 분산액이 이용될 때 보강용 직조 메시가 적어도 손상된 부분을 연결하면서 패칭분산액에 매립되는 것을 특징으로 하는 방법.
- 제1항에 있어서, 분산액이 승온에서 이용되는 것을 특징으로 하는 방법.
- 적어도 하나의 플루오르화 비닐화합물로 구성된 단량체와 구조식 CF2=CFX, CF2CFR1X 및 CF2=CFOR1X(여기서 R1은 산소원자에 의해 단속될 수 있는 탄소수 2-8의 이기능 파플루오르화 라디칼이고, X는 플루오르화 술포닐, 플루오르화 카르보닐, 술포네이트 에스테르, 카르복실레이트 에스테르, 술폰아마이드와 카르복실레이트 및 술포네이트 관능기의 금속, 암모늄 또는 아민염임)로 표시되는 적어도 하나의 단량체로부터 중합되고 당량이 높은 과플루오로 탄소 공중합체로 이루어진 막의 손상부분을 보수하는 방법에 있어서, 1) 적어도 하나의 플루오르화 비닐 화합물로 구성된 단량체와 구조식 CF2=CFX2, CF2=CFOR1X 및 CF2=CFOR1X(여기서 R1은 산소원자에 의해 단속될 수 있는 탄소수 2-8의 이기능 과플루오르화 라디칼이고, X는 플루오르화 술포닐, 플루오르화 카르보닐, 술포네이트 에스테르, 카르복실레이트 에스테르, 술폰아마이드와 카르복실레이트 및 술포네이트 관능기의 금속염으로 부터 선택되는 매달린 관능 기임)으로 표시되는적어도 하나의 단량체로부터 중합된 패칭 과플루오로탄소 공중합체를 선택한 다음, 패칭 및 막 모두를 적어도 부분적으로 용해할 수 있는 매체에체에 패칭플루오로 탄소를 분산하여 약 5-25중량%의 용해된 과플루오로탄소를 포함하는 분산액을 만들며, 상기 분산매체는 할로카본 오일, 과플루오로옥타노산, 과플루오로데카노산, 과플루오로트리부틸아민, 3M사 제품인 FC-70(과플루오로트리알킬아민), 과플루오로-1-메틸데카린, 데카플루오로비페닐, 펜타플루오로페놀, 펜타플루오토벤조산, N-부틸아세트아마이드, 테트라하이드로티오펜-1,1-디옥사이드(테트라메틸렌술폰, 술포란), N,N-디메틸 아세트 아마이드, N,N-디에틸 아세트 아마이드, N,N-디메틸프로피온 아마이드, N,N-디부틸 포름아마이드, N,N-디프로필아세트 아마이드, N,N-디메틸 포름 아마이드, 1-메틸-2-피롤리디는, 디에틸렌글리콜 에틸아세트 아미도 아세테이트, 1-시클로헥실-2-피롤리돈, 글리세린, 에틸-헥실-디-페닐포스페이트 및 이들의 혼합물로부터 선정되고; 2)분산된 패칭 과플루오로탄소를 막의 손상된 부분에 이용하고; 3) 가열 또는 진공하에 분산매체를 제거한 다음; 4) 보수될 부분이 원하는 두께로 될때까지 상기 2및 3단계를 반복하는 것을 특징으로 하는 막의 손상된 부분을 보수하는 방법.
- 제4항에 있어서, 분산액이 이용될 때 보강용 직조 메시가 적어도 손상된 부분을 연결하면서 패칭 분산액에 매립되는 것을 특징으로 하는 방법.
- 제4항에 있어서, 분산액이 125℃에서 막에 이용되는 것을 특징으로 하는 방법.
- 제5항에 있어서, 메시가 테프론(TELON)으로부터 직조된 것을 특징으로 하는 방법.
- 적어도 하나의 플루오르화 비닐화합물로 구성된 단량체와 CF2=CFX, CF2CFR1X 및 CF2=CFOR1X(여기서 R1은 산소원자에 의해 단속될 수 있는 탄소수 2-8의 이기능 과플루오르화 라디칼이고, X는 플루오르화 술포닐, 플루오르화 카르보닐, 술포네이트 에스테르, 카르복실레이트 에스테르, 술폰아마이드와 술포네이트 및 카르복실레이트 관능기의 금속염 임)로 나타내는 적어도 하나의 단량체로부터 중합되고 당량이 높은 과플루오로탄소 공중합체로부터 제조된 전해조막을 보수하는데 유용하고, a) 적어도 하나의 플루오르화 비닐 화합물로 구성된 단량체와 CF2=CFX, CF2CFR1X 및 CF2=CFOR1X(여기서 R1은 산소원자에 의해 단속될 수 있는 탄소수 2-8의 이기능 과플루오르화 라디칼이고, X는 플루오르화 술포닐, 플루오르화 카르보닐, 술포네이트 에스테르, 카르복실레이트 에스테르, 술폰아마이드와 술포네이트 및 카르복실레이트 관능기의 금속, 암모늄 또는 아민염으로부터 선택된 매달린 관능기임)로 나타내는 적어도 하나의 단량체로부터 중합된 패칭 과플루오로탄소 공중합체와 b) 패칭 과플루오로탄소와 막의 과플루오로탄소 모두를 적어도 부분적으로 용해할 수 있으며, 할로카본 오일, 과플루오로옥타노산, 과플루오로데카노산, 과플루오로 트리부틸아민, 3M사 제품인 FC-70(과플루오로트리알킬아민), 과플루오로-1-메틸데카린, 데카플루오로비페닐, 펜타플루오로페놀, 펜타플루오로벤조산, -부틸아세트아마이드, 테트라하이드로티오펜-1,1-디옥사이드(테트라멘틸렌술폰, 술포란), N,N-디메틸 아세트 아마이드, N,N-디에틸 아세트 아마이드, N,N-디메틸프로피온 아마이드, N,N-디부틸 포름아마이드, N,N-디프로필아세트 아마이드, N,N-디메틸 포름 아마이드, 1-멘틸-2-피롤리디논, 디에틸렌 글리콜, 에틸아세트 아미도 아세레이트, 1-시클로헥실-2-피롤리디논, 글리세린, 에틸-헥실-디-페닐포스페이트와 이들의 혼합물로부터 선택된 매체로 구성된 분산액을 함유하고, 상기 분산액이 분산매체에 의해 용이되는 약 5-25중량%의 패칭 과플루오로탄소를 포함하는 패칭 화합물.
- 제8항에 있어서, 온도가 약 125-280℃인 화합물.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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US31896781A | 1981-11-06 | 1981-11-06 | |
US318967 | 1981-11-06 |
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KR840002471A true KR840002471A (ko) | 1984-07-02 |
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KR1019820004913A KR840002471A (ko) | 1981-11-06 | 1982-11-01 | 양이온 교환막의 보수방법 |
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EP (1) | EP0079218A1 (ko) |
JP (1) | JPS5887286A (ko) |
KR (1) | KR840002471A (ko) |
BR (1) | BR8206298A (ko) |
DK (1) | DK493782A (ko) |
FI (1) | FI823797L (ko) |
IL (1) | IL67183A0 (ko) |
NO (1) | NO823690L (ko) |
PL (1) | PL238882A1 (ko) |
ZA (1) | ZA828098B (ko) |
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US5069974A (en) * | 1989-02-06 | 1991-12-03 | Monsanto Company | Metals coated with protective coatings of annealed perfluorinated cation-exchange polymers and method for making same |
US5266350A (en) * | 1992-07-14 | 1993-11-30 | The Dow Chemical Company | Processes and materials for treatment and repair of electrolytic cell separators |
US5458955A (en) * | 1993-10-21 | 1995-10-17 | Monsanto Company | Metal/polymer laminates having an anionomeric polymer film layer |
DE4446675C2 (de) * | 1994-12-12 | 1997-10-23 | Daramic Inc | Verfahren zur Reparatur von Separatorenbahnen für Akkumulatoren |
WO2000052085A1 (en) * | 1999-03-03 | 2000-09-08 | E.I. Du Pont De Nemours And Company | Continuous melt process for fabricating ionically conductive articles |
US20060194703A1 (en) | 2003-03-03 | 2006-08-31 | Masayoshi Tatemoto | Liquid fluoropolymer composition, process for producing organosol, film, and fuel cell |
US20070282023A1 (en) * | 2006-06-01 | 2007-12-06 | Lousenberg Robert D | Fluoropolymer dispersions and membranes |
US8058319B2 (en) | 2006-06-01 | 2011-11-15 | E.I. Du Pont De Nemours And Company | Process to prepare fluoropolymer dispersions and membranes |
JP6043728B2 (ja) * | 2011-01-21 | 2016-12-14 | ソルヴェイ・スペシャルティ・ポリマーズ・イタリー・エッセ・ピ・ア | フッ素化陰イオン交換ポリマーの液体組成物 |
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GB1286859A (en) * | 1968-11-26 | 1972-08-23 | Du Pont | Solutions of fluorinated polymers |
US4208455A (en) * | 1975-12-03 | 1980-06-17 | Oronzio Denora Impianti Elettrochimici S.P.A. | Method of shaping an organic polymer insoluble in a polar solvent |
JPS54107949A (en) * | 1978-02-14 | 1979-08-24 | Asahi Glass Co Ltd | Solution of fluorine-containing polymer bearing carboxyl group as side chain |
US4304799A (en) * | 1979-04-26 | 1981-12-08 | Dankese Joseph P | Processes for making membranes |
US4266036A (en) * | 1979-10-23 | 1981-05-05 | Diamond Shamrock Corporation | Recovery of polymeric cation exchange materials for reuse by converting by reaction to the precursor form |
US4272560A (en) * | 1979-10-23 | 1981-06-09 | Diamond Shamrock Corporation | Method of depositing cation exchange membrane on a foraminous cathode |
US4433082A (en) * | 1981-05-01 | 1984-02-21 | E. I. Du Pont De Nemours And Company | Process for making liquid composition of perfluorinated ion exchange polymer, and product thereof |
-
1982
- 1982-10-27 BR BR8206298A patent/BR8206298A/pt unknown
- 1982-11-01 KR KR1019820004913A patent/KR840002471A/ko unknown
- 1982-11-04 ZA ZA828098A patent/ZA828098B/xx unknown
- 1982-11-05 JP JP57194493A patent/JPS5887286A/ja active Pending
- 1982-11-05 FI FI823797A patent/FI823797L/fi not_active Application Discontinuation
- 1982-11-05 EP EP82305904A patent/EP0079218A1/en not_active Withdrawn
- 1982-11-05 IL IL67183A patent/IL67183A0/xx unknown
- 1982-11-05 PL PL23888282A patent/PL238882A1/xx unknown
- 1982-11-05 NO NO823690A patent/NO823690L/no unknown
- 1982-11-05 DK DK493782A patent/DK493782A/da not_active Application Discontinuation
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BR8206298A (pt) | 1983-09-20 |
DK493782A (da) | 1983-05-07 |
PL238882A1 (en) | 1983-05-23 |
IL67183A0 (en) | 1983-03-31 |
ZA828098B (en) | 1983-09-28 |
EP0079218A1 (en) | 1983-05-18 |
NO823690L (no) | 1983-05-09 |
FI823797L (fi) | 1983-05-07 |
JPS5887286A (ja) | 1983-05-25 |
FI823797A0 (fi) | 1982-11-05 |
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