KR840000069A - 광도전막 - Google Patents
광도전막 Download PDFInfo
- Publication number
- KR840000069A KR840000069A KR1019820002439A KR820002439A KR840000069A KR 840000069 A KR840000069 A KR 840000069A KR 1019820002439 A KR1019820002439 A KR 1019820002439A KR 820002439 A KR820002439 A KR 820002439A KR 840000069 A KR840000069 A KR 840000069A
- Authority
- KR
- South Korea
- Prior art keywords
- added
- tellurium
- concentration
- weight
- range
- Prior art date
Links
- 229910052714 tellurium Inorganic materials 0.000 claims 5
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims 5
- 238000000034 method Methods 0.000 claims 4
- 229910016569 AlF 3 Inorganic materials 0.000 claims 2
- 229910016036 BaF 2 Inorganic materials 0.000 claims 2
- 229910052684 Cerium Inorganic materials 0.000 claims 2
- 229910052785 arsenic Inorganic materials 0.000 claims 2
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims 1
- 229910005269 GaF 3 Inorganic materials 0.000 claims 1
- 101100020663 Neurospora crassa (strain ATCC 24698 / 74-OR23-1A / CBS 708.71 / DSM 1257 / FGSC 987) ppm-1 gene Proteins 0.000 claims 1
- 229910052787 antimony Inorganic materials 0.000 claims 1
- 229910052797 bismuth Inorganic materials 0.000 claims 1
- 229910052794 bromium Inorganic materials 0.000 claims 1
- 229910052801 chlorine Inorganic materials 0.000 claims 1
- 150000002222 fluorine compounds Chemical class 0.000 claims 1
- 229910052733 gallium Inorganic materials 0.000 claims 1
- 229910052732 germanium Inorganic materials 0.000 claims 1
- 229910052738 indium Inorganic materials 0.000 claims 1
- 229910052740 iodine Inorganic materials 0.000 claims 1
- 238000002156 mixing Methods 0.000 claims 1
- 229910052725 zinc Inorganic materials 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 2
- 206010047571 Visual impairment Diseases 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J31/00—Cathode ray tubes; Electron beam tubes
- H01J31/08—Cathode ray tubes; Electron beam tubes having a screen on or from which an image or pattern is formed, picked up, converted, or stored
- H01J31/26—Image pick-up tubes having an input of visible light and electric output
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/02—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
- H01J29/10—Screens on or from which an image or pattern is formed, picked up, converted or stored
- H01J29/36—Photoelectric screens; Charge-storage screens
- H01J29/39—Charge-storage screens
- H01J29/45—Charge-storage screens exhibiting internal electric effects caused by electromagnetic radiation, e.g. photoconductive screen, photodielectric screen, photovoltaic screen
- H01J29/451—Charge-storage screens exhibiting internal electric effects caused by electromagnetic radiation, e.g. photoconductive screen, photodielectric screen, photovoltaic screen with photosensitive junctions
- H01J29/456—Charge-storage screens exhibiting internal electric effects caused by electromagnetic radiation, e.g. photoconductive screen, photodielectric screen, photovoltaic screen with photosensitive junctions exhibiting no discontinuities, e.g. consisting of uniform layers
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Light Receiving Elements (AREA)
- Image-Pickup Tubes, Image-Amplification Tubes, And Storage Tubes (AREA)
- Luminescent Compositions (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도와 제4도는 촬상관에 사용하기 위한 타게트의 원리적인 구조도. 제2도는 종래의 촬상관 타게트의 증감영역(增減領域)의 성분분포의 1예를 나타낸 도면. 제3도는 본 발명에 의한 광도전막의 제1부분의 성분분포의 1예를 나타낸 도면. 제5도는 고강도의 입사광에 의하여 생긴 잔상이 시간에 따라 변화하거나 없어지는 것을 설명하기 위한 도면이다.
Claims (7)
- 주로 세레륨으로 만들어진 광도전층과 층의 두께 방향으로 텔루르가 첨가된 부위로 구성 되었고, 텔루르가 첨가된 부위의 구멍 흐름 방향내의 일부와 텔루르가 첨가된 부위에 인접하여 위치한 다른 부위의 구멍흐름 방향내의 일부중 어느 하나는 세레륨내의 부공간 전하를 형성할 수 있는 산화물, 불화물 및 Ⅱ,Ⅲ과 Ⅶ족에 속하는 원소들로 부터 선택한 적어도 한 물질과 중량으로 10ppm-1%의 농도로 배합시킴을 특징으로 하는 광도전막.
- 제1항에 있어서, 농도가 중량으로 30ppm-5000ppm인 것을 특징으로 하는 광도전막.
- 제1항 또는 제2항에 있어서, Cuo,In2O3,SeO2,V2O5및 WO3로 부터 선택한 것이고, 불화물은 GaF3와 InF3의 적어도 하나를 포함하고 적어도 선택한 한 원소는 Zn,Ga,In,Cl,I 및 Br로 부터 선택한 것을 특징으로 하는 광도전막.
- 제1항 또는 제2항에 있어서, 텔루르가 첨가된 부위에 인접하여 위치하고, 50Å∼5000Å 범위의 두께를 가진 부위의 한 부위에 As,Bi,Ge 및 Si로 부터 선택한 적어도 한개의 원소를 중량으로 1%∼30%농도 범위로 첨가한 것을 특징으로 하는 광도전막.
- 제1항 또는 제2항에 있어서, 신호전류의 주부분을 만들기 위하여 투사광을 흡수하는 부위의 적어도 한 부분이 LiF,MgF2,AlF3,CrF3,MnF2,CoF2,MnF2,CoF|2,PbF2,BaF2,CeF3및 TlF로 부터 선택한 적어도 한 성분과 중량으로 50ppm∼5% 범위 농도로 배합시키는 것을 특징으로 하는 광도전막.
- 제3항에 있어서, 텔루르가 첨가된 부위에 인접하여 위치하고 50Å∼5000Å범위의 두께를 가진 부위에 As,Bi,Sb,Ge 및 Si로 부터 선택한 적어도 한개의 원소를 중량으로 1∼30% 농도 범위를 첨가하는 것을 특징으로 하는 광도전막.
- 제3항에 있어서, 신호 전류의 주부분을 참조하기 위하여 입사광을 흡수하는 부위의 적어도 일부분을 중량으로 50ppm∼5% 농도 범위로서 LiF,MgF2,AlF3,CrF3,MnF2,CoF2,MnF2,CoF|2,PbF2,BaF2,CeF3및 TlF로 부터 선택한 적어도 한 성분과 배합시키는 것을 특징으로 하는 광도전막.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56080914A JPS57197876A (en) | 1981-05-29 | 1981-05-29 | Photoconductive film |
JP???81-80914 | 1981-05-29 | ||
JP80914 | 1981-05-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR840000069A true KR840000069A (ko) | 1984-01-30 |
KR860000815B1 KR860000815B1 (ko) | 1986-06-28 |
Family
ID=13731655
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR8202439A KR860000815B1 (ko) | 1981-05-29 | 1982-05-28 | 광도전막 |
Country Status (5)
Country | Link |
---|---|
US (1) | US4463279A (ko) |
EP (1) | EP0067015B1 (ko) |
JP (1) | JPS57197876A (ko) |
KR (1) | KR860000815B1 (ko) |
DE (1) | DE3273528D1 (ko) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59132541A (ja) * | 1983-01-19 | 1984-07-30 | Hitachi Ltd | 撮像管タ−ゲツト |
US4587456A (en) * | 1984-01-17 | 1986-05-06 | Hitachi, Ltd. | Image pickup tube target |
JPH0648616B2 (ja) * | 1984-05-21 | 1994-06-22 | 株式会社日立製作所 | 光導電膜 |
JPS62223951A (ja) * | 1986-03-26 | 1987-10-01 | Hitachi Ltd | 光導電膜 |
US4816715A (en) * | 1987-07-09 | 1989-03-28 | Hitachi, Ltd. | Image pick-up tube target |
DE3925483A1 (de) * | 1988-08-05 | 1990-02-08 | Fuji Electric Co Ltd | Elektrofotografisches aufzeichnungsmaterial |
US5017989A (en) * | 1989-12-06 | 1991-05-21 | Xerox Corporation | Solid state radiation sensor array panel |
CA2184667C (en) * | 1996-09-03 | 2000-06-20 | Bradley Trent Polischuk | Multilayer plate for x-ray imaging and method of producing same |
JP5521030B2 (ja) * | 2010-03-05 | 2014-06-11 | 健 岡野 | 太陽電池の製造方法 |
WO2015198388A1 (ja) * | 2014-06-24 | 2015-12-30 | パイオニア株式会社 | 光電変換膜およびこれを備えた撮像装置 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3391297A (en) * | 1965-03-29 | 1968-07-02 | Westinghouse Electric Corp | Photoconductive target having arsenicselenium layers of different densities on cryolite layer |
US3922579A (en) * | 1970-04-22 | 1975-11-25 | Hitachi Ltd | Photoconductive target |
JPS5240809B2 (ko) * | 1972-04-07 | 1977-10-14 | ||
US3890525A (en) * | 1972-07-03 | 1975-06-17 | Hitachi Ltd | Photoconductive target of an image pickup tube comprising graded selenium-tellurium layer |
JPS5246772B2 (ko) * | 1973-05-21 | 1977-11-28 | ||
JPS51120611A (en) * | 1975-04-16 | 1976-10-22 | Hitachi Ltd | Photoconducting film |
JPS5488720A (en) * | 1977-12-26 | 1979-07-14 | Sony Corp | Image pick up tube unit |
IT1141339B (it) * | 1979-04-25 | 1986-10-01 | Hofsass P | Corpo di bobina con un interruttore di protezione dal calore o interruttore di isolamento termico |
-
1981
- 1981-05-29 JP JP56080914A patent/JPS57197876A/ja active Granted
-
1982
- 1982-05-21 US US06/380,779 patent/US4463279A/en not_active Expired - Lifetime
- 1982-05-27 DE DE8282302745T patent/DE3273528D1/de not_active Expired
- 1982-05-27 EP EP82302745A patent/EP0067015B1/en not_active Expired
- 1982-05-28 KR KR8202439A patent/KR860000815B1/ko active
Also Published As
Publication number | Publication date |
---|---|
EP0067015A2 (en) | 1982-12-15 |
US4463279A (en) | 1984-07-31 |
EP0067015A3 (en) | 1983-02-09 |
EP0067015B1 (en) | 1986-10-01 |
DE3273528D1 (en) | 1986-11-06 |
JPS57197876A (en) | 1982-12-04 |
KR860000815B1 (ko) | 1986-06-28 |
JPH0120554B2 (ko) | 1989-04-17 |
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