KR830009510A - 감광성 수지 조성물 및 이를 사용한 감광성 엘리먼트 - Google Patents
감광성 수지 조성물 및 이를 사용한 감광성 엘리먼트 Download PDFInfo
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- KR830009510A KR830009510A KR1019820000937A KR820000937A KR830009510A KR 830009510 A KR830009510 A KR 830009510A KR 1019820000937 A KR1019820000937 A KR 1019820000937A KR 820000937 A KR820000937 A KR 820000937A KR 830009510 A KR830009510 A KR 830009510A
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- South Korea
- Prior art keywords
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- benzimidazole
- benzotriazole
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- 239000011342 resin composition Substances 0.000 title claims 6
- 150000001875 compounds Chemical class 0.000 claims 14
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 claims 13
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 claims 9
- 239000000203 mixture Substances 0.000 claims 8
- -1 phosphate compound Chemical class 0.000 claims 8
- 239000002253 acid Substances 0.000 claims 6
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 claims 6
- 239000012964 benzotriazole Substances 0.000 claims 6
- 150000003839 salts Chemical class 0.000 claims 6
- SEILKFZTLVMHRR-UHFFFAOYSA-N 2-phosphonooxyethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOP(O)(O)=O SEILKFZTLVMHRR-UHFFFAOYSA-N 0.000 claims 4
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims 4
- 229910019142 PO4 Inorganic materials 0.000 claims 4
- 239000003795 chemical substances by application Substances 0.000 claims 4
- 235000021317 phosphate Nutrition 0.000 claims 4
- 229920001169 thermoplastic Polymers 0.000 claims 4
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 claims 3
- VZXPHDGHQXLXJC-UHFFFAOYSA-N 1,6-diisocyanato-5,6-dimethylheptane Chemical compound O=C=NC(C)(C)C(C)CCCCN=C=O VZXPHDGHQXLXJC-UHFFFAOYSA-N 0.000 claims 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims 2
- WAJJFPMYKWCDNI-UHFFFAOYSA-N 2-[hydroxy(2-prop-2-enoyloxyethoxy)phosphoryl]oxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOP(=O)(O)OCCOC(=O)C=C WAJJFPMYKWCDNI-UHFFFAOYSA-N 0.000 claims 2
- NXBXJOWBDCQIHF-UHFFFAOYSA-N 2-[hydroxy-[2-(2-methylprop-2-enoyloxy)ethoxy]phosphoryl]oxyethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOP(O)(=O)OCCOC(=O)C(C)=C NXBXJOWBDCQIHF-UHFFFAOYSA-N 0.000 claims 2
- UDXXYUDJOHIIDZ-UHFFFAOYSA-N 2-phosphonooxyethyl prop-2-enoate Chemical compound OP(O)(=O)OCCOC(=O)C=C UDXXYUDJOHIIDZ-UHFFFAOYSA-N 0.000 claims 2
- JMTMSDXUXJISAY-UHFFFAOYSA-N 2H-benzotriazol-4-ol Chemical compound OC1=CC=CC2=C1N=NN2 JMTMSDXUXJISAY-UHFFFAOYSA-N 0.000 claims 2
- LSONXNMNZYBRDE-UHFFFAOYSA-N 2h-benzotriazole;hydrochloride Chemical compound Cl.C1=CC=C2NN=NC2=C1 LSONXNMNZYBRDE-UHFFFAOYSA-N 0.000 claims 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims 2
- 239000005058 Isophorone diisocyanate Substances 0.000 claims 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims 2
- 150000001298 alcohols Chemical class 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 2
- JZMPIUODFXBXSC-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.CCOC(N)=O JZMPIUODFXBXSC-UHFFFAOYSA-N 0.000 claims 2
- NPZTUJOABDZTLV-UHFFFAOYSA-N hydroxybenzotriazole Substances O=C1C=CC=C2NNN=C12 NPZTUJOABDZTLV-UHFFFAOYSA-N 0.000 claims 2
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 239000010452 phosphate Substances 0.000 claims 2
- 150000003013 phosphoric acid derivatives Chemical class 0.000 claims 2
- 238000006116 polymerization reaction Methods 0.000 claims 2
- 229920006163 vinyl copolymer Polymers 0.000 claims 2
- 125000003277 amino group Chemical group 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 150000001565 benzotriazoles Chemical class 0.000 claims 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims 1
- 229910052736 halogen Inorganic materials 0.000 claims 1
- 150000002367 halogens Chemical class 0.000 claims 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims 1
- 230000000243 photosynthetic effect Effects 0.000 claims 1
- 238000006467 substitution reaction Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
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- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L75/00—Compositions of polyureas or polyurethanes; Compositions of derivatives of such polymers
- C08L75/04—Polyurethanes
- C08L75/14—Polyurethanes having carbon-to-carbon unsaturated bonds
- C08L75/16—Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
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- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
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- C08G18/671—Unsaturated compounds having only one group containing active hydrogen
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
- H05K3/287—Photosensitive compositions
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
- H05K2203/0783—Using solvent, e.g. for cleaning; Regulating solvent content of pastes or coatings for adjusting the viscosity
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1 및 2도는 본 발명에 따른 감광성 엘리먼트의 예를 나타내는 단면도이다.
제3도는 실시예에서 사용된 감광성 엘리먼트를 제조하는 장치의 개략도이다.
제4도는 실시예에서 사용된 시험용 음성 마스크를 나타내는 도면이다.
제5도는 실시예에서 사용된 기저 물질상의 구리 패턴을 나타내는 도면이다.
Claims (20)
- (a) 벤조트리아졸, 벤즈이미다졸, 벤조티아졸, 그의 유도체 및 그의 염류로 이루어진 군으로부터 선택된 1종 이상의 화합물.(b) 광중합 불포화 결합을 갖는 인산염 화합물.(c) 필요하다면, 유기 열가소성 중합체.(d) 1종 이상의 말단 에틸렌기를 갖는 광중합 가능 불포화 화합물 및(e) 활성광 조사시 상기 불포화 화합물 (b) 및 (d)의 중합을 계시할 수 있는 감광제 및 또는 감광제 계통을 함유하는 감광성 수지 조성물.
- 제1항에 있어서, 감광성 수지 조성물의 중량을 기준으로 하여 성분(a)를 약 0.001 중량% 이상, 성분(b)를 약 0.001 중량% 이상, 필요하다면 성분 (c)를 20∼80 중량부, 성분(d)를 20∼80 중량부 그리고 성분(e)를 0.5∼10 중량부의 양으로 함유함을 특징으로 하는 조성물.
- 제1항에 있어서, 성분(a)의 벤조트리아졸, 벤즈이미다졸 및 벤조티아졸의 유도체가, 상기 화합물중의 하나 이상의 수소원자를 하나 이상의 알킬기, 니트로기, 아미노기, 히드록시기, 카르복시기 또는 할로겐 원자로 치환함으로써 수득됨을 특징으로 하는 조성물.
- 제1항에 있어서, 벤조트리아졸, 벤즈이미다졸 및 벤조티아졸의 염이 상기 화합물들의 산염류 및 아민염류임을 특징으로 하는 조성물.
- 제1항에 있어서, 성분 (b)가 산 포스폭시에틸 메타크릴레이트, 3-클로로-2-산 포스폭시프로필 메타크릴레이트, 비스(메타크릴옥시에틸) 포스페이트, 아크릴옥시에틸 포스페이트 및 비스(아크릴옥시에틸) 포스페이트로 이루어진 군으로부터 선택된 1종 이상의 화합물임을 특징으로 하는 조성물.
- 제1항에 있어서, 성분(c)의 유기 열가소성 중합체가 비닐 공중합체임을 특징으로 하는 조성물.
- 제1항에 있어서, 성분(d)의 1종 이상의 말단 에틸기를 갖는 광중합 가능 불포화 화합물이.(ⅰ) 트리메틸헥사메틸렌 디이소시아네이트 및 이소포론 디이소시아네이트로 이루어진 군으로부터 선택된 1종 이상의 디시소시아네이트 화합물.(ⅱ) 2가 알코올의 아크릴산 또는 메타크릴산 모노에 스테르 및 필요하다면,(ⅲ) 2가 알코올을 반응시킴으로써 수득된 우레탄 디아크릴레이트 또는 우레탄 디메타크릴레이트 화합물임을 특징으로 하는 조성물.
- 제1항에 있어서, 성분 (a)가 히드록시벤조트리아졸이고 성분 (b)가 산 포스폭시에틸 메타크릴레이트임을 특징으로 하는 조성물.
- 제1항에 있어서, 성분 (a)가 벤즈이미다졸이고 성분 (b)가 비스(아크릴옥시에틸) 포스페이트임을 특징으로 하는 조성물.
- 제1항에 있어서, 성분(a)가 벤조트리아졸 히드로클로라이드이고 성분(b)가 3-클로로-2-산 포스폭시프로필 메타크릴레이트임을 특징으로 하는 조성물.
- (a) 벤조트리아졸, 벤즈이미다졸, 벤조티아졸, 그의 유도체 및 그의 염류로 이루어진 군으로부터 선택된 1종 이상의 화합물,(b) 광화합 불포화 결합을 갖는 인산염 화합물,(c) 유기 열가소성 중합체,(d) 1종 이상의 말단 에틸렌기를 갖는 광중합 가능 불포화 화합물 및(e) 활성광 조사시 상기 불포화 화합물 (b) 및 (d)의 중합을 계시시킬 수 있는 감광제 및 또는 감광제 계통을 함유하는 감광성 수지 조성물층 및 상기층을 지지하는 지지막으로 이루어진 감광성 엘리먼트.
- 제11항에 있어서, 상기 수지 조성물이 감광성 수지 조성물의 중량을 기준으로 하여 성분 (a)를 0.001 중량% 이상, 성분 (b)를 0.001 중량% 이상, 성분 (c)를 20∼80 중량부, 성분 (d)를 20∼80 중량부, 그리고 성분 (e)를 0.5∼10 중량보의 양으로 함유함을 특징으로 하는 감광성 엘리먼트.
- 제11항에 있어서, 상기 화합물중의 1종 이상의 수소원자를 1종 이상의 알킬기, 아릴기, 니트로기, 아미노기, 히드록시기, 카르복시기 또는 할로겐으로 치환시킴으로써, 벤조트리아졸, 벤즈이미다졸 및 벤조티아졸의 유도체가 수득됨을 특징으로 하는 감광성 엘리먼트.
- 제11항에 있어서, 성분 (a)의 벤조트리아졸, 벤즈이미다졸 및 벤조티아졸의 염류가 상기 화합물의 산염류 또는 아민 염류임을 특징으로 하는 감광성 엘리먼트.
- 제11항에 있어서, 성분 (b)가 산 포스폭시에틸 메타크릴레이트, 3-클로로-2-산 포스폭시프로필 메타크릴레이트, 비스(메타크릴옥시에틸) 포스페이트, 아크릴옥시에틸 포스페이트 및 비스(아크릴옥시에틸) 포스페이트로 이루어진 군으로부터 선택된 1종 이상의 화합물임을 특징으로 하는 감광성 엘리먼트.
- 제11항에 있어서, 성분(c)의 유기 열가소성 중합체가 비닐공중합체임을 특징으로 하는 감광성 엘리먼트.
- 제11항에 있어서, 성분 (d)의 1종 이상의 말단 에틸렌기를 갖는 광중합 가능 불포화 화합물이,(ⅰ) 트리메틸헥사메틸렌 디이소시아네이트 및 이소포론 디이소시아네이트로 이루어진 군으로부터 선택된 1종 이상의 디이소시아네이트 화합물,(ⅱ) 2가 알코올의 아크릴산 또는 메타크릴산 모노에스테르 및 필요하다면,(ⅲ) 2가 알코올을 반응시킴으로써 수득되는 우레탄 디아크릴레이트 또는 우레탄 디메타크릴레이트 화합물임을 특징으로 하는 감광성 엘리먼트.
- 제11항에 있어서, 성분 (a)가 히드록시벤조트리아졸이고 성분 (b)가 산 포스폭시에틸 메타크릴레이트임을 특징으로 하는 감광성 엘리먼트.
- 제11항에 있어서, 성분 (a)가 벤즈이미다졸이고 성분 (b)가 비스(아크릴옥시에틸) 포스페이트임을 특징으로 하는 감광성 엘리먼트.
- 제11항에 있어서, 성분 (a)가 벤조트리아졸 히드로클로라이드이고 성분 (b)가 3-클로로-2-산 포스폭시프로필 메타크릴레이트임을 특징으로 하는 감광성 엘리먼트.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31808 | 1981-03-04 | ||
JP81-31808 | 1981-03-04 | ||
JP3180881A JPS5824035B2 (ja) | 1981-03-04 | 1981-03-04 | 感光性エレメント |
JP34779 | 1981-03-10 | ||
JP56034779A JPS57148392A (en) | 1981-03-10 | 1981-03-10 | Photosensitive resin composition |
JP81-34779 | 1981-03-10 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR830009510A true KR830009510A (ko) | 1983-12-21 |
KR850001954B1 KR850001954B1 (ko) | 1985-12-31 |
Family
ID=26370319
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR8200937A KR850001954B1 (ko) | 1981-03-04 | 1982-03-04 | 감광성 수지 조성물 및 이를 사용한 감광성 엘리먼트 |
Country Status (5)
Country | Link |
---|---|
US (1) | US4438190A (ko) |
KR (1) | KR850001954B1 (ko) |
DE (1) | DE3207504C2 (ko) |
FR (1) | FR2501388B1 (ko) |
GB (1) | GB2094329B (ko) |
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US4752553A (en) * | 1982-04-01 | 1988-06-21 | M&T Chemicals Inc. | High resolution solder mask photopolymers for screen coating over circuit traces |
US4510593A (en) * | 1982-10-18 | 1985-04-09 | Minnesota Mining And Manufacturing Company | Information disk of grooved, metal-coated crosslinked polymeric layer |
JPS59204837A (ja) * | 1983-05-09 | 1984-11-20 | Asahi Chem Ind Co Ltd | 光重合性積層体及びそれを用いたレジスト像形成方法 |
US5069929A (en) * | 1984-09-19 | 1991-12-03 | Sumitomo Metal Industries, Ltd. | Actinic radiation-curable rust-preventive coating compositions for steel products |
JPS61166541A (ja) * | 1985-01-19 | 1986-07-28 | Fuotopori Ouka Kk | 光重合性組成物 |
US4629679A (en) * | 1985-02-12 | 1986-12-16 | Mitsubishi Rayon Company Ltd. | Tetrazole compound-containing photopolymerizable resin composition |
US4612270A (en) * | 1985-03-14 | 1986-09-16 | Rca Corporation | Two-layer negative resist |
NL8502106A (nl) * | 1985-07-23 | 1987-02-16 | Philips Nv | Optische glasvezel voorzien van een kunststofbedekking en hardbare kunststofsamenstelling. |
GB2184556B (en) * | 1985-12-24 | 1990-04-04 | Sanyo Kokusaku Pulp Co | Process for producing images for overhead projection |
US4738870A (en) * | 1986-03-27 | 1988-04-19 | The Dow Chemical Company | Adherent photopolymerizable compositions |
JPS62262043A (ja) * | 1986-05-08 | 1987-11-14 | Tokyo Ohka Kogyo Co Ltd | ポジ型感光性樹脂組成物 |
US4680249A (en) * | 1986-05-28 | 1987-07-14 | E. I. Du Pont De Nemours And Company | Photopolymerizable composition containing carboxy benzotriazole |
US5089376A (en) * | 1986-12-08 | 1992-02-18 | Armstrong World Industries, Inc. | Photoimagable solder mask coating |
DE3722923A1 (de) * | 1987-07-10 | 1989-01-19 | Siemens Ag | Photoresistfolie als kleber fuer die verbindung von zwei flachen teilen |
EP0301523B1 (en) * | 1987-07-28 | 1992-09-30 | Sumitomo Electric Industries, Ltd. | Molding of modified polyphenylene oxide resin |
JPH0820733B2 (ja) * | 1988-08-11 | 1996-03-04 | 富士写真フイルム株式会社 | ドライフイルムレジスト用光重合性組成物 |
CA1341128C (en) * | 1989-06-27 | 2000-10-24 | Borden Chemical, Inc. | Optical fiber array |
CA2034623A1 (en) * | 1990-02-16 | 1991-08-17 | Ming Tara | Photoimageable compositions containing fugitive colorants |
CZ290073B6 (cs) * | 1991-04-03 | 2002-05-15 | Red Spot Paint & Varnish Co., Inc. | Ultrafialovým zářením vytvrzovatelná čirá potahovací kompozice a způsob výroby ochranného a/nebo dekorativního povlaku |
US5478607A (en) * | 1991-05-17 | 1995-12-26 | Hitachi Telecon Technologies Ltd. | Method for use of preflux, printed wiring board, and method for production thereof |
DE4431751C1 (de) * | 1994-09-06 | 1996-05-09 | Siemens Ag | Flammwidriges einkomponentiges Reaktionsharz |
EP0780731B1 (en) * | 1995-12-22 | 2002-04-17 | Mitsubishi Chemical Corporation | Photopolymerizable composition for a color filter, color filter and liquid crystal display device |
US6514668B1 (en) * | 1996-12-26 | 2003-02-04 | Mitsubishi Chemical Corporation | Photosensitive lithographic printing plate |
WO1998036325A1 (en) * | 1997-02-13 | 1998-08-20 | Dsm N.V. | Photocurable resin composition |
US6440519B1 (en) | 1997-02-13 | 2002-08-27 | Dsm N.V. | Photocurable adhesive for optical disk |
US5938856A (en) * | 1997-06-13 | 1999-08-17 | International Business Machines Corporation | Process of removing flux residue from microelectronic components |
KR100547959B1 (ko) * | 1998-07-30 | 2006-02-02 | 미네소타 마이닝 앤드 매뉴팩춰링 캄파니 | 투명한 금속 산화물 콜로이드 및 세라머를 제조하기 위한 나노크기 금속 산화물 입자 |
US6329058B1 (en) | 1998-07-30 | 2001-12-11 | 3M Innovative Properties Company | Nanosize metal oxide particles for producing transparent metal oxide colloids and ceramers |
US6261700B1 (en) | 1998-12-30 | 2001-07-17 | 3M Innovative Properties Co | Ceramer containing a brominated polymer and inorganic oxide particles |
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US6228543B1 (en) | 1999-09-09 | 2001-05-08 | 3M Innovative Properties Company | Thermal transfer with a plasticizer-containing transfer layer |
US6458462B1 (en) | 2000-12-13 | 2002-10-01 | 3M Innovative Properties Company | Sporting goods having a ceramer coating |
EP1788434B2 (en) * | 2005-11-18 | 2019-01-02 | Agfa Nv | Method of making a lithographic printing plate |
US10392458B2 (en) * | 2013-07-08 | 2019-08-27 | Lg Chem, Ltd. | Resin blend |
WO2019124307A1 (ja) * | 2017-12-20 | 2019-06-27 | 住友電気工業株式会社 | プリント配線板の製造方法及び積層体 |
US10889901B2 (en) | 2018-07-25 | 2021-01-12 | International Business Machines Corporation | Ultraviolet-stabilized corrosion inhibitors |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3622334A (en) * | 1969-12-31 | 1971-11-23 | Du Pont | Photopolymerizable compositions and elements containing heterocyclic nitrogen-containing compounds |
JPS4827801A (ko) * | 1971-08-06 | 1973-04-12 | ||
US3987127A (en) * | 1974-01-08 | 1976-10-19 | Ford Motor Company | Radiation polymerizable coating composition containing an unsaturated phosphoric ester |
US3992477A (en) * | 1974-12-31 | 1976-11-16 | Ford Motor Company | Protective coating composition |
US3957918A (en) * | 1974-12-31 | 1976-05-18 | Ford Motor Company | Radiation polymerizable coating composition containing an unsaturated phosphoric ester |
JPS52117985A (en) * | 1976-03-30 | 1977-10-03 | Hitachi Chem Co Ltd | Photosensitive polymer composition |
JPS53109703A (en) | 1977-03-08 | 1978-09-25 | Teijin Ltd | Improved supporting plate |
US4289844A (en) | 1979-06-18 | 1981-09-15 | Eastman Kodak Company | Photopolymerizable compositions featuring novel co-initiators |
US4268610A (en) * | 1979-11-05 | 1981-05-19 | Hercules Incorporated | Photoresist formulations |
JPS5764734A (en) * | 1980-10-08 | 1982-04-20 | Hitachi Chem Co Ltd | Photosensitive resin composition and photosensitive element |
-
1982
- 1982-02-24 US US06/351,765 patent/US4438190A/en not_active Expired - Lifetime
- 1982-03-02 DE DE3207504A patent/DE3207504C2/de not_active Expired
- 1982-03-03 FR FR8203558A patent/FR2501388B1/fr not_active Expired
- 1982-03-03 GB GB8206222A patent/GB2094329B/en not_active Expired
- 1982-03-04 KR KR8200937A patent/KR850001954B1/ko active
Also Published As
Publication number | Publication date |
---|---|
US4438190A (en) | 1984-03-20 |
DE3207504A1 (de) | 1982-09-30 |
KR850001954B1 (ko) | 1985-12-31 |
DE3207504C2 (de) | 1985-12-19 |
GB2094329B (en) | 1985-02-27 |
FR2501388B1 (fr) | 1988-03-25 |
GB2094329A (en) | 1982-09-15 |
FR2501388A1 (fr) | 1982-09-10 |
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