KR20240088837A - 아랄킬 수지, 에폭시 수지의 희석제, 경화성 수지 조성물, 감광성 수지 조성물, 경화물, 전자 디바이스, 아랄킬 수지의 제조방법 - Google Patents

아랄킬 수지, 에폭시 수지의 희석제, 경화성 수지 조성물, 감광성 수지 조성물, 경화물, 전자 디바이스, 아랄킬 수지의 제조방법 Download PDF

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Publication number
KR20240088837A
KR20240088837A KR1020247012222A KR20247012222A KR20240088837A KR 20240088837 A KR20240088837 A KR 20240088837A KR 1020247012222 A KR1020247012222 A KR 1020247012222A KR 20247012222 A KR20247012222 A KR 20247012222A KR 20240088837 A KR20240088837 A KR 20240088837A
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KR
South Korea
Prior art keywords
integer
general formula
resin
aralkyl resin
atom
Prior art date
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Pending
Application number
KR1020247012222A
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English (en)
Korean (ko)
Inventor
겐스케 히로타키
게이지로 세키
히로카쓰 나구라
겐지 호소이
Original Assignee
샌트랄 글래스 컴퍼니 리미티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 샌트랄 글래스 컴퍼니 리미티드 filed Critical 샌트랄 글래스 컴퍼니 리미티드
Publication of KR20240088837A publication Critical patent/KR20240088837A/ko
Pending legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G10/00Condensation polymers of aldehydes or ketones with aromatic hydrocarbons or halogenated aromatic hydrocarbons only
    • C08G10/02Condensation polymers of aldehydes or ketones with aromatic hydrocarbons or halogenated aromatic hydrocarbons only of aldehydes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/18Condensation polymers of aldehydes or ketones with aromatic hydrocarbons or their halogen derivatives only
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/22Exposing sequentially with the same light pattern different positions of the same surface

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
  • Epoxy Resins (AREA)
KR1020247012222A 2021-11-02 2022-11-01 아랄킬 수지, 에폭시 수지의 희석제, 경화성 수지 조성물, 감광성 수지 조성물, 경화물, 전자 디바이스, 아랄킬 수지의 제조방법 Pending KR20240088837A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2021-179571 2021-11-02
JP2021179571 2021-11-02
PCT/JP2022/040860 WO2023080132A1 (ja) 2021-11-02 2022-11-01 アラルキル樹脂、エポキシ樹脂の希釈剤、硬化性樹脂組成物、感光性樹脂組成物、硬化物、電子デバイス、アラルキル樹脂の製造方法

Publications (1)

Publication Number Publication Date
KR20240088837A true KR20240088837A (ko) 2024-06-20

Family

ID=86241151

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020247012222A Pending KR20240088837A (ko) 2021-11-02 2022-11-01 아랄킬 수지, 에폭시 수지의 희석제, 경화성 수지 조성물, 감광성 수지 조성물, 경화물, 전자 디바이스, 아랄킬 수지의 제조방법

Country Status (5)

Country Link
JP (1) JPWO2023080132A1 (enrdf_load_stackoverflow)
KR (1) KR20240088837A (enrdf_load_stackoverflow)
CN (1) CN118043368A (enrdf_load_stackoverflow)
TW (1) TW202330683A (enrdf_load_stackoverflow)
WO (1) WO2023080132A1 (enrdf_load_stackoverflow)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021193878A1 (ja) 2020-03-27 2021-09-30 セントラル硝子株式会社 ノボラック樹脂、エポキシ樹脂、感光性樹脂組成物、硬化性樹脂組成物、硬化物、電子デバイス、ノボラック樹脂の製造方法およびエポキシ樹脂の製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8629556D0 (en) * 1986-12-10 1987-01-21 Ici Plc Polyarylalkanes
KR102797312B1 (ko) * 2019-02-06 2025-04-18 샌트랄 글래스 컴퍼니 리미티드 1,1,1-트리플루오로-2,2-비스아릴에탄의 제조방법 및 1,1,1-트리플루오로-2,2-비스아릴에탄

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021193878A1 (ja) 2020-03-27 2021-09-30 セントラル硝子株式会社 ノボラック樹脂、エポキシ樹脂、感光性樹脂組成物、硬化性樹脂組成物、硬化物、電子デバイス、ノボラック樹脂の製造方法およびエポキシ樹脂の製造方法

Also Published As

Publication number Publication date
JPWO2023080132A1 (enrdf_load_stackoverflow) 2023-05-11
CN118043368A (zh) 2024-05-14
TW202330683A (zh) 2023-08-01
WO2023080132A1 (ja) 2023-05-11

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PA0105 International application

Patent event date: 20240412

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application