JPWO2023080132A1 - - Google Patents
Info
- Publication number
- JPWO2023080132A1 JPWO2023080132A1 JP2023558038A JP2023558038A JPWO2023080132A1 JP WO2023080132 A1 JPWO2023080132 A1 JP WO2023080132A1 JP 2023558038 A JP2023558038 A JP 2023558038A JP 2023558038 A JP2023558038 A JP 2023558038A JP WO2023080132 A1 JPWO2023080132 A1 JP WO2023080132A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G10/00—Condensation polymers of aldehydes or ketones with aromatic hydrocarbons or halogenated aromatic hydrocarbons only
- C08G10/02—Condensation polymers of aldehydes or ketones with aromatic hydrocarbons or halogenated aromatic hydrocarbons only of aldehydes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
- C08L61/18—Condensation polymers of aldehydes or ketones with aromatic hydrocarbons or their halogen derivatives only
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
- Epoxy Resins (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021179571 | 2021-11-02 | ||
| PCT/JP2022/040860 WO2023080132A1 (ja) | 2021-11-02 | 2022-11-01 | アラルキル樹脂、エポキシ樹脂の希釈剤、硬化性樹脂組成物、感光性樹脂組成物、硬化物、電子デバイス、アラルキル樹脂の製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2023080132A1 true JPWO2023080132A1 (enrdf_load_stackoverflow) | 2023-05-11 |
Family
ID=86241151
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023558038A Pending JPWO2023080132A1 (enrdf_load_stackoverflow) | 2021-11-02 | 2022-11-01 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPWO2023080132A1 (enrdf_load_stackoverflow) |
| KR (1) | KR20240088837A (enrdf_load_stackoverflow) |
| CN (1) | CN118043368A (enrdf_load_stackoverflow) |
| TW (1) | TW202330683A (enrdf_load_stackoverflow) |
| WO (1) | WO2023080132A1 (enrdf_load_stackoverflow) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB8629556D0 (en) * | 1986-12-10 | 1987-01-21 | Ici Plc | Polyarylalkanes |
| KR102797312B1 (ko) * | 2019-02-06 | 2025-04-18 | 샌트랄 글래스 컴퍼니 리미티드 | 1,1,1-트리플루오로-2,2-비스아릴에탄의 제조방법 및 1,1,1-트리플루오로-2,2-비스아릴에탄 |
| US20230125986A1 (en) * | 2020-03-27 | 2023-04-27 | Central Glass Company, Limited | Novolak Resin, Epoxy Resin, Photosensitive Resin Composition, Curable Resin Composition, Cured Substance, Electronic Device, Production Method for Novolak Resin, and Production Method for Epoxy Resin |
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2022
- 2022-11-01 WO PCT/JP2022/040860 patent/WO2023080132A1/ja active Application Filing
- 2022-11-01 KR KR1020247012222A patent/KR20240088837A/ko active Pending
- 2022-11-01 JP JP2023558038A patent/JPWO2023080132A1/ja active Pending
- 2022-11-01 CN CN202280066753.5A patent/CN118043368A/zh active Pending
- 2022-11-02 TW TW111141768A patent/TW202330683A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| CN118043368A (zh) | 2024-05-14 |
| TW202330683A (zh) | 2023-08-01 |
| KR20240088837A (ko) | 2024-06-20 |
| WO2023080132A1 (ja) | 2023-05-11 |