KR20240054920A - 감광성 조성물, 그것을 이용한 경화막, 컬러 필터, 광학 필터, 화상 표시 장치, 고체 촬상 소자, 및 적외선 센서 - Google Patents

감광성 조성물, 그것을 이용한 경화막, 컬러 필터, 광학 필터, 화상 표시 장치, 고체 촬상 소자, 및 적외선 센서 Download PDF

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Publication number
KR20240054920A
KR20240054920A KR1020237041811A KR20237041811A KR20240054920A KR 20240054920 A KR20240054920 A KR 20240054920A KR 1020237041811 A KR1020237041811 A KR 1020237041811A KR 20237041811 A KR20237041811 A KR 20237041811A KR 20240054920 A KR20240054920 A KR 20240054920A
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KR
South Korea
Prior art keywords
group
carbon atoms
hydrogen atom
alkyl group
meth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020237041811A
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English (en)
Korean (ko)
Inventor
케이이치 콘도
신타로 사쿠라이
슌페이 스즈키
šœ페이 스즈키
슈헤이 카와오카
Original Assignee
아티엔스 가부시키가이샤
도요 비주얼 솔루션스 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication of KR20240054920A publication Critical patent/KR20240054920A/ko
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/32—Compounds containing nitrogen bound to oxygen
    • C08K5/33—Oximes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds
    • C08L101/02—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/006—Preparation of organic pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
KR1020237041811A 2021-09-13 2022-09-08 감광성 조성물, 그것을 이용한 경화막, 컬러 필터, 광학 필터, 화상 표시 장치, 고체 촬상 소자, 및 적외선 센서 Pending KR20240054920A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021148439A JP7221348B1 (ja) 2021-09-13 2021-09-13 感光性着色組成物、それを用いた硬化膜、カラーフィルタ、光学フィルタ、画像表示装置、固体撮像素子、及び赤外線センサ
JPJP-P-2021-148439 2021-09-13
PCT/JP2022/033780 WO2023038092A1 (ja) 2021-09-13 2022-09-08 感光性組成物、それを用いた硬化膜、カラーフィルタ、光学フィルタ、画像表示装置、固体撮像素子、及び赤外線センサ

Publications (1)

Publication Number Publication Date
KR20240054920A true KR20240054920A (ko) 2024-04-26

Family

ID=85197986

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020237041811A Pending KR20240054920A (ko) 2021-09-13 2022-09-08 감광성 조성물, 그것을 이용한 경화막, 컬러 필터, 광학 필터, 화상 표시 장치, 고체 촬상 소자, 및 적외선 센서

Country Status (5)

Country Link
JP (2) JP7221348B1 (https=)
KR (1) KR20240054920A (https=)
CN (1) CN117425857A (https=)
TW (1) TW202319406A (https=)
WO (1) WO2023038092A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024189679A1 (ja) * 2023-03-10 2024-09-19 株式会社レゾナック 感光性樹脂組成物、感光性エレメント、硬化物、レジストパターンの形成方法、及び、プリント配線板の製造方法
JP7401016B1 (ja) 2023-05-15 2023-12-19 東洋インキＳｃホールディングス株式会社 封止シート及び、樹脂組成物層を有するディスプレイ
JPWO2024237134A1 (https=) * 2023-05-18 2024-11-21
CN119707775A (zh) * 2023-09-26 2025-03-28 常州强力先端电子材料有限公司 一种咔唑肟酯光引发剂及其制备方法和应用

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20130134494A (ko) 2012-05-31 2013-12-10 주식회사 엘지화학 잉크 조성물, 이를 이용한 컬러필터 및 이를 포함하는 디스플레이 소자
JP2016084464A (ja) 2014-10-24 2016-05-19 昭和電工株式会社 硬化性樹脂組成物、カラーフィルター、画像表示素子及びカラーフィルターの製造方法
WO2019026547A1 (ja) 2017-08-03 2019-02-07 昭和電工株式会社 感光性樹脂組成物及びその製造方法
JP2021102759A (ja) 2019-12-20 2021-07-15 Jsr株式会社 着色組成物、着色硬化膜及びその製造方法、カラーフィルタ、表示素子、受光素子、並びに硬化性組成物

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5636918B2 (ja) 2010-11-30 2014-12-10 Jsr株式会社 感放射線性樹脂組成物、表示素子用硬化膜、表示素子用硬化膜の形成方法、及び表示素子
JP6159309B2 (ja) 2014-01-31 2017-07-05 富士フイルム株式会社 着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置
JP2016069345A (ja) 2014-09-30 2016-05-09 富士フイルム株式会社 金属元素含有化合物、硬化性組成物、硬化膜、有機ｅｌ表示装置、液晶表示装置、及び、タッチパネル表示装置
JP6165813B2 (ja) 2014-09-30 2017-07-19 富士フイルム株式会社 硬化性組成物、硬化膜、有機ｅｌ表示装置、液晶表示装置、及び、タッチパネル表示装置
CN105467765B (zh) 2014-09-30 2020-04-24 富士胶片株式会社 感光性组合物、硬化膜的制造方法、硬化膜及其应用
JP2020052071A (ja) 2018-09-21 2020-04-02 東洋インキＳｃホールディングス株式会社 カラーフィルタ用感光性着色組成物及びカラーフィルタ

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20130134494A (ko) 2012-05-31 2013-12-10 주식회사 엘지화학 잉크 조성물, 이를 이용한 컬러필터 및 이를 포함하는 디스플레이 소자
JP2016084464A (ja) 2014-10-24 2016-05-19 昭和電工株式会社 硬化性樹脂組成物、カラーフィルター、画像表示素子及びカラーフィルターの製造方法
WO2019026547A1 (ja) 2017-08-03 2019-02-07 昭和電工株式会社 感光性樹脂組成物及びその製造方法
JP2021102759A (ja) 2019-12-20 2021-07-15 Jsr株式会社 着色組成物、着色硬化膜及びその製造方法、カラーフィルタ、表示素子、受光素子、並びに硬化性組成物

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Publication number Publication date
JP2023041665A (ja) 2023-03-24
JP7221348B1 (ja) 2023-02-13
CN117425857A (zh) 2024-01-19
TW202319406A (zh) 2023-05-16
JP7816065B2 (ja) 2026-02-18
WO2023038092A1 (ja) 2023-03-16
JP2023041208A (ja) 2023-03-24

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