TW202319406A - 感光性組成物、使用其的硬化膜、彩色濾光片、光學濾波器、圖像顯示裝置、固體攝像元件、及紅外線感測器 - Google Patents

感光性組成物、使用其的硬化膜、彩色濾光片、光學濾波器、圖像顯示裝置、固體攝像元件、及紅外線感測器 Download PDF

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TW202319406A
TW202319406A TW111134372A TW111134372A TW202319406A TW 202319406 A TW202319406 A TW 202319406A TW 111134372 A TW111134372 A TW 111134372A TW 111134372 A TW111134372 A TW 111134372A TW 202319406 A TW202319406 A TW 202319406A
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Taiwan
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group
carbons
alkyl group
hydrogen atom
meth
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TW111134372A
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English (en)
Chinese (zh)
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近藤慶一
櫻井慎太郎
鈴木駿平
河岡秀平
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日商東洋油墨Ｓｃ控股股份有限公司
日商東洋翊絢股份有限公司
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Publication of TW202319406A publication Critical patent/TW202319406A/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/32—Compounds containing nitrogen bound to oxygen
    • C08K5/33—Oximes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds
    • C08L101/02—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/006—Preparation of organic pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
TW111134372A 2021-09-13 2022-09-12 感光性組成物、使用其的硬化膜、彩色濾光片、光學濾波器、圖像顯示裝置、固體攝像元件、及紅外線感測器 TW202319406A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021148439A JP7221348B1 (ja) 2021-09-13 2021-09-13 感光性着色組成物、それを用いた硬化膜、カラーフィルタ、光学フィルタ、画像表示装置、固体撮像素子、及び赤外線センサ
JP2021-148439 2021-09-13

Publications (1)

Publication Number Publication Date
TW202319406A true TW202319406A (zh) 2023-05-16

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TW111134372A TW202319406A (zh) 2021-09-13 2022-09-12 感光性組成物、使用其的硬化膜、彩色濾光片、光學濾波器、圖像顯示裝置、固體攝像元件、及紅外線感測器

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JP (2) JP7221348B1 (https=)
KR (1) KR20240054920A (https=)
CN (1) CN117425857A (https=)
TW (1) TW202319406A (https=)
WO (1) WO2023038092A1 (https=)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024189679A1 (ja) * 2023-03-10 2024-09-19 株式会社レゾナック 感光性樹脂組成物、感光性エレメント、硬化物、レジストパターンの形成方法、及び、プリント配線板の製造方法
JP7401016B1 (ja) 2023-05-15 2023-12-19 東洋インキＳｃホールディングス株式会社 封止シート及び、樹脂組成物層を有するディスプレイ
JPWO2024237134A1 (https=) * 2023-05-18 2024-11-21
CN119707775A (zh) * 2023-09-26 2025-03-28 常州强力先端电子材料有限公司 一种咔唑肟酯光引发剂及其制备方法和应用

Family Cites Families (10)

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Publication number Priority date Publication date Assignee Title
JP5636918B2 (ja) 2010-11-30 2014-12-10 Jsr株式会社 感放射線性樹脂組成物、表示素子用硬化膜、表示素子用硬化膜の形成方法、及び表示素子
KR101687849B1 (ko) 2012-05-31 2016-12-19 주식회사 엘지화학 잉크 조성물, 이를 이용한 컬러필터 및 이를 포함하는 디스플레이 소자
JP6159309B2 (ja) 2014-01-31 2017-07-05 富士フイルム株式会社 着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置
JP2016069345A (ja) 2014-09-30 2016-05-09 富士フイルム株式会社 金属元素含有化合物、硬化性組成物、硬化膜、有機ｅｌ表示装置、液晶表示装置、及び、タッチパネル表示装置
JP6165813B2 (ja) 2014-09-30 2017-07-19 富士フイルム株式会社 硬化性組成物、硬化膜、有機ｅｌ表示装置、液晶表示装置、及び、タッチパネル表示装置
CN105467765B (zh) 2014-09-30 2020-04-24 富士胶片株式会社 感光性组合物、硬化膜的制造方法、硬化膜及其应用
JP2016084464A (ja) 2014-10-24 2016-05-19 昭和電工株式会社 硬化性樹脂組成物、カラーフィルター、画像表示素子及びカラーフィルターの製造方法
KR102626467B1 (ko) 2017-08-03 2024-01-17 가부시끼가이샤 레조낙 감광성 수지 조성물 및 그 제조 방법
JP2020052071A (ja) 2018-09-21 2020-04-02 東洋インキＳｃホールディングス株式会社 カラーフィルタ用感光性着色組成物及びカラーフィルタ
CN116859670A (zh) 2019-12-20 2023-10-10 Jsr株式会社 着色组合物、着色硬化膜及其制法、彩色滤光片、显示元件、光接收元件以及硬化性组合物

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JP2023041665A (ja) 2023-03-24
JP7221348B1 (ja) 2023-02-13
CN117425857A (zh) 2024-01-19
JP7816065B2 (ja) 2026-02-18
KR20240054920A (ko) 2024-04-26
WO2023038092A1 (ja) 2023-03-16
JP2023041208A (ja) 2023-03-24

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