CN117425857A - 感光性组合物、使用其的硬化膜、彩色滤光片、光学滤波器、图像显示装置、固体摄像元件、及红外线传感器 - Google Patents

感光性组合物、使用其的硬化膜、彩色滤光片、光学滤波器、图像显示装置、固体摄像元件、及红外线传感器 Download PDF

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Publication number
CN117425857A
CN117425857A CN202280040746.8A CN202280040746A CN117425857A CN 117425857 A CN117425857 A CN 117425857A CN 202280040746 A CN202280040746 A CN 202280040746A CN 117425857 A CN117425857 A CN 117425857A
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CN
China
Prior art keywords
group
carbon atoms
hydrogen atom
alkyl group
general formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202280040746.8A
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English (en)
Chinese (zh)
Inventor
近藤庆一
樱井慎太郎
铃木骏平
河冈秀平
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dongyang Yihuan Co ltd
Artience Co Ltd
Original Assignee
Dongyang Yihuan Co ltd
Toyo Ink SC Holdings Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongyang Yihuan Co ltd, Toyo Ink SC Holdings Co Ltd filed Critical Dongyang Yihuan Co ltd
Publication of CN117425857A publication Critical patent/CN117425857A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/32—Compounds containing nitrogen bound to oxygen
    • C08K5/33—Oximes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds
    • C08L101/02—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/006—Preparation of organic pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
CN202280040746.8A 2021-09-13 2022-09-08 感光性组合物、使用其的硬化膜、彩色滤光片、光学滤波器、图像显示装置、固体摄像元件、及红外线传感器 Pending CN117425857A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021148439A JP7221348B1 (ja) 2021-09-13 2021-09-13 感光性着色組成物、それを用いた硬化膜、カラーフィルタ、光学フィルタ、画像表示装置、固体撮像素子、及び赤外線センサ
JP2021-148439 2021-09-13
PCT/JP2022/033780 WO2023038092A1 (ja) 2021-09-13 2022-09-08 感光性組成物、それを用いた硬化膜、カラーフィルタ、光学フィルタ、画像表示装置、固体撮像素子、及び赤外線センサ

Publications (1)

Publication Number Publication Date
CN117425857A true CN117425857A (zh) 2024-01-19

Family

ID=85197986

Family Applications (1)

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CN202280040746.8A Pending CN117425857A (zh) 2021-09-13 2022-09-08 感光性组合物、使用其的硬化膜、彩色滤光片、光学滤波器、图像显示装置、固体摄像元件、及红外线传感器

Country Status (5)

Country Link
JP (2) JP7221348B1 (https=)
KR (1) KR20240054920A (https=)
CN (1) CN117425857A (https=)
TW (1) TW202319406A (https=)
WO (1) WO2023038092A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025066824A1 (zh) * 2023-09-26 2025-04-03 常州强力先端电子材料有限公司 一种咔唑肟酯光引发剂及其制备方法和应用

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024189679A1 (ja) * 2023-03-10 2024-09-19 株式会社レゾナック 感光性樹脂組成物、感光性エレメント、硬化物、レジストパターンの形成方法、及び、プリント配線板の製造方法
JP7401016B1 (ja) 2023-05-15 2023-12-19 東洋インキＳｃホールディングス株式会社 封止シート及び、樹脂組成物層を有するディスプレイ
JPWO2024237134A1 (https=) * 2023-05-18 2024-11-21

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5636918B2 (ja) 2010-11-30 2014-12-10 Jsr株式会社 感放射線性樹脂組成物、表示素子用硬化膜、表示素子用硬化膜の形成方法、及び表示素子
KR101687849B1 (ko) 2012-05-31 2016-12-19 주식회사 엘지화학 잉크 조성물, 이를 이용한 컬러필터 및 이를 포함하는 디스플레이 소자
JP6159309B2 (ja) 2014-01-31 2017-07-05 富士フイルム株式会社 着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置
JP2016069345A (ja) 2014-09-30 2016-05-09 富士フイルム株式会社 金属元素含有化合物、硬化性組成物、硬化膜、有機ｅｌ表示装置、液晶表示装置、及び、タッチパネル表示装置
JP6165813B2 (ja) 2014-09-30 2017-07-19 富士フイルム株式会社 硬化性組成物、硬化膜、有機ｅｌ表示装置、液晶表示装置、及び、タッチパネル表示装置
CN105467765B (zh) 2014-09-30 2020-04-24 富士胶片株式会社 感光性组合物、硬化膜的制造方法、硬化膜及其应用
JP2016084464A (ja) 2014-10-24 2016-05-19 昭和電工株式会社 硬化性樹脂組成物、カラーフィルター、画像表示素子及びカラーフィルターの製造方法
KR102626467B1 (ko) 2017-08-03 2024-01-17 가부시끼가이샤 레조낙 감광성 수지 조성물 및 그 제조 방법
JP2020052071A (ja) 2018-09-21 2020-04-02 東洋インキＳｃホールディングス株式会社 カラーフィルタ用感光性着色組成物及びカラーフィルタ
CN116859670A (zh) 2019-12-20 2023-10-10 Jsr株式会社 着色组合物、着色硬化膜及其制法、彩色滤光片、显示元件、光接收元件以及硬化性组合物

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025066824A1 (zh) * 2023-09-26 2025-04-03 常州强力先端电子材料有限公司 一种咔唑肟酯光引发剂及其制备方法和应用

Also Published As

Publication number Publication date
JP2023041665A (ja) 2023-03-24
JP7221348B1 (ja) 2023-02-13
TW202319406A (zh) 2023-05-16
JP7816065B2 (ja) 2026-02-18
KR20240054920A (ko) 2024-04-26
WO2023038092A1 (ja) 2023-03-16
JP2023041208A (ja) 2023-03-24

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Address after: Japan Tokyo central Beijing two chome 2 No. 1

Applicant after: Aitiansi Co.,Ltd.

Applicant after: Dongyang Yihuan Co.,Ltd.

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