KR20240033185A - 촬상 소자, 적층형 촬상 소자, 촬상 장치 및 전자 장치 - Google Patents

촬상 소자, 적층형 촬상 소자, 촬상 장치 및 전자 장치 Download PDF

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KR20240033185A
KR20240033185A KR1020247007201A KR20247007201A KR20240033185A KR 20240033185 A KR20240033185 A KR 20240033185A KR 1020247007201 A KR1020247007201 A KR 1020247007201A KR 20247007201 A KR20247007201 A KR 20247007201A KR 20240033185 A KR20240033185 A KR 20240033185A
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derivatives
imaging device
group
photoelectric conversion
electrode
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Korean (ko)
Inventor
야스하루 우지이에
마사카즈 무로야마
마사시 반도
마사키 무라타
히데유키 쿠미타
사치코 사카이가와
신타로우 히라타
유야 쿠마가이
유 카토
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소니그룹주식회사
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60—Organic compounds having low molecular weight
    • H10K85/649—Aromatic compounds comprising a hetero atom
    • H10K85/657—Polycyclic condensed heteroaromatic hydrocarbons
    • H10K85/6572—Polycyclic condensed heteroaromatic hydrocarbons comprising only nitrogen in the heteroaromatic polycondensed ring system, e.g. phenanthroline or carbazole
    • H01L27/1462—
    • H01L27/14643—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10—Integrated devices
    • H10F39/12—Image sensors
    • H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/805—Coatings
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/30—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising bulk heterojunctions, e.g. interpenetrating networks of donor and acceptor material domains
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/80—Constructional details
    • H10K30/81—Electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K39/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic radiation-sensitive element covered by group H10K30/00
    • H10K39/30—Devices controlled by radiation
    • H10K39/32—Organic image sensors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/20—Carbon compounds, e.g. carbon nanotubes or fullerenes
    • H10K85/211—Fullerenes, e.g. C60
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/30—Coordination compounds
    • H10K85/311—Phthalocyanine
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/30—Coordination compounds
    • H10K85/321—Metal complexes comprising a group IIIA element, e.g. Tris (8-hydroxyquinoline) gallium [Gaq3]
    • H10K85/322—Metal complexes comprising a group IIIA element, e.g. Tris (8-hydroxyquinoline) gallium [Gaq3] comprising boron
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60—Organic compounds having low molecular weight
    • H10K85/631—Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine
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    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60—Organic compounds having low molecular weight
    • H10K85/649—Aromatic compounds comprising a hetero atom
    • H10K85/654—Aromatic compounds comprising a hetero atom comprising only nitrogen as heteroatom
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60—Organic compounds having low molecular weight
    • H10K85/649—Aromatic compounds comprising a hetero atom
    • H10K85/655—Aromatic compounds comprising a hetero atom comprising only sulfur as heteroatom
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60—Organic compounds having low molecular weight
    • H10K85/649—Aromatic compounds comprising a hetero atom
    • H10K85/657—Polycyclic condensed heteroaromatic hydrocarbons
    • H10K85/6576—Polycyclic condensed heteroaromatic hydrocarbons comprising only sulfur in the heteroaromatic polycondensed ring system, e.g. benzothiophene
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/10—Transparent electrodes, e.g. using graphene
    • H10K2102/101—Transparent electrodes, e.g. using graphene comprising transparent conductive oxides [TCO]
    • H10K2102/103—Transparent electrodes, e.g. using graphene comprising transparent conductive oxides [TCO] comprising indium oxides, e.g. ITO
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/30—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising bulk heterojunctions, e.g. interpenetrating networks of donor and acceptor material domains
    • H10K30/353—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising bulk heterojunctions, e.g. interpenetrating networks of donor and acceptor material domains comprising blocking layers, e.g. exciton blocking layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/30—Coordination compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Inorganic Chemistry (AREA)
  • Nanotechnology (AREA)
  • Light Receiving Elements (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Electroluminescent Light Sources (AREA)
KR1020247007201A 2016-11-22 2017-11-17 촬상 소자, 적층형 촬상 소자, 촬상 장치 및 전자 장치 Ceased KR20240033185A (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2016227291A JP6834400B2 (ja) 2016-11-22 2016-11-22 撮像素子、積層型撮像素子、撮像装置及び電子装置
JPJP-P-2016-227291 2016-11-22
PCT/JP2017/041394 WO2018097046A1 (en) 2016-11-22 2017-11-17 Imaging element, stacked-type imaging element, imaging apparatus and electronic apparatus
KR1020197013457A KR102645210B1 (ko) 2016-11-22 2017-11-17 촬상 소자, 적층형 촬상 소자, 촬상 장치 및 전자 장치

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KR1020197013457A Division KR102645210B1 (ko) 2016-11-22 2017-11-17 촬상 소자, 적층형 촬상 소자, 촬상 장치 및 전자 장치

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KR20240033185A true KR20240033185A (ko) 2024-03-12

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KR1020197013457A Active KR102645210B1 (ko) 2016-11-22 2017-11-17 촬상 소자, 적층형 촬상 소자, 촬상 장치 및 전자 장치

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US (3) US10886335B2 (enExample)
JP (1) JP6834400B2 (enExample)
KR (2) KR20240033185A (enExample)
CN (4) CN117202753A (enExample)
WO (1) WO2018097046A1 (enExample)

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JP7663316B2 (ja) * 2019-09-09 2025-04-16 キヤノン株式会社 半導体装置
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KR20210092367A (ko) 2020-01-15 2021-07-26 삼성디스플레이 주식회사 유기 전계 발광 소자 및 유기 전계 발광 소자용 아민 화합물
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JP7516094B2 (ja) * 2020-04-07 2024-07-16 キヤノン株式会社 光電変換素子
CN111933805B (zh) * 2020-09-04 2025-01-21 天津理工大学 一种亚酞菁衍生物的异质结型绿光探测器的制备方法
JP7711082B2 (ja) 2020-10-01 2025-07-22 保土谷化学工業株式会社 光電変換素子に用いる有機薄膜、及びその光電変換素子
TWI915452B (zh) * 2020-11-27 2026-02-21 日商日鐵化學材料股份有限公司 攝像用的光電轉換元件材料及光電轉換元件
TWI899379B (zh) 2020-11-27 2025-10-01 日商日鐵化學材料股份有限公司 攝像用光電轉換元件
JP7791700B2 (ja) 2020-12-23 2025-12-24 保土谷化学工業株式会社 インドロカルバゾール環を有する化合物、受光素子用材料、有機薄膜、受光素子、及び撮像素子
JP2022108268A (ja) 2021-01-12 2022-07-25 保土谷化学工業株式会社 光電変換素子に用いる有機薄膜、及びその光電変換素子
JP7785551B2 (ja) 2021-01-28 2025-12-15 保土谷化学工業株式会社 光電変換素子および撮像素子
KR20220115517A (ko) 2021-02-10 2022-08-17 호도가야 가가쿠 고교 가부시키가이샤 디카르바졸을 갖는 광전 변환 소자용 재료, 유기 박막, 광전 변환 소자 및 촬상 소자
KR20240035756A (ko) 2021-07-15 2024-03-18 닛테츠 케미컬 앤드 머티리얼 가부시키가이샤 촬상용 광전 변환 소자용 재료
CN117598045A (zh) 2021-07-15 2024-02-23 日铁化学材料株式会社 摄像用的光电转换元件用材料及摄像用光电转换元件
JP2023050149A (ja) * 2021-09-29 2023-04-10 保土谷化学工業株式会社 光電変換素子に用いる有機薄膜
CN118104414A (zh) * 2021-10-26 2024-05-28 松下知识产权经营株式会社 摄像装置
TW202402758A (zh) 2022-05-25 2024-01-16 日商日鐵化學材料股份有限公司 攝像用的光電轉換元件用材料及使用其的攝像用光電轉換元件
TW202404063A (zh) 2022-05-25 2024-01-16 日商日鐵化學材料股份有限公司 攝像用的光電轉換元件用材料及光電轉換元件
KR20250069556A (ko) 2022-09-14 2025-05-19 닛테츠 케미컬 앤드 머티리얼 가부시키가이샤 광전 변환 소자용 재료 및 이것을 사용한 광전 변환 소자
CN119894903A (zh) 2022-09-22 2025-04-25 保土谷化学工业株式会社 化合物、有机薄膜及光电转换元件
JPWO2024135588A1 (enExample) 2022-12-23 2024-06-27
JP2024127793A (ja) 2023-03-08 2024-09-20 保土谷化学工業株式会社 受光素子用有機薄膜、およびそれを用いた受光素子
JPWO2025018226A1 (enExample) 2023-07-14 2025-01-23
JPWO2025018227A1 (enExample) 2023-07-14 2025-01-23
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CN117596908B (zh) * 2024-01-19 2024-04-05 武汉楚兴技术有限公司 一种像素单元、图像传感器及其制造方法

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CN117202754A (zh) 2023-12-08
CN117202752A (zh) 2023-12-08
JP2018085427A (ja) 2018-05-31
CN109952652B (zh) 2023-09-19
US20210134887A1 (en) 2021-05-06
KR20190085922A (ko) 2019-07-19
CN109952652A (zh) 2019-06-28
US10886335B2 (en) 2021-01-05
JP6834400B2 (ja) 2021-02-24
US20230354627A1 (en) 2023-11-02
CN117202753A (zh) 2023-12-08
US20190288040A1 (en) 2019-09-19
WO2018097046A1 (en) 2018-05-31
KR102645210B1 (ko) 2024-03-08

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