KR20240033157A - 최적화된 고체-상 전구체의 승화를 위한 다중 구역 가열 격실 - Google Patents

최적화된 고체-상 전구체의 승화를 위한 다중 구역 가열 격실 Download PDF

Info

Publication number
KR20240033157A
KR20240033157A KR1020247006920A KR20247006920A KR20240033157A KR 20240033157 A KR20240033157 A KR 20240033157A KR 1020247006920 A KR1020247006920 A KR 1020247006920A KR 20247006920 A KR20247006920 A KR 20247006920A KR 20240033157 A KR20240033157 A KR 20240033157A
Authority
KR
South Korea
Prior art keywords
heating
compartment
heating zone
housing
oven
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020247006920A
Other languages
English (en)
Korean (ko)
Inventor
토마스 더블유. 필츠
마슨 시델
로버트 에쉬바흐
와드 햄프톤 바일리
데이비드 비. 에벨링
스예다흐 유스라 파티마
데이비드 엠. 라이더
션 에스. 케이블
Original Assignee
버슘머트리얼즈 유에스, 엘엘씨
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 버슘머트리얼즈 유에스, 엘엘씨 filed Critical 버슘머트리얼즈 유에스, 엘엘씨
Publication of KR20240033157A publication Critical patent/KR20240033157A/ko
Pending legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B1/00—Details of electric heating devices
    • H05B1/02—Automatic switching arrangements specially adapted to apparatus ; Control of heating devices
    • H05B1/0227—Applications
    • H05B1/023—Industrial applications
    • H05B1/0233—Industrial applications for semiconductors manufacturing
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45561—Gas plumbing upstream of the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D1/00—Evaporating
    • B01D1/0011—Heating features

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Vapour Deposition (AREA)
  • Devices For Use In Laboratory Experiments (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
  • Furnace Details (AREA)
  • Treatment Of Fiber Materials (AREA)
  • Drying Of Solid Materials (AREA)
KR1020247006920A 2021-07-30 2022-07-26 최적화된 고체-상 전구체의 승화를 위한 다중 구역 가열 격실 Pending KR20240033157A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202163227842P 2021-07-30 2021-07-30
US63/227,842 2021-07-30
PCT/US2022/074140 WO2023010001A1 (en) 2021-07-30 2022-07-26 Multiple zone heated enclosure for optimized sublimation of solid-phase precursors

Publications (1)

Publication Number Publication Date
KR20240033157A true KR20240033157A (ko) 2024-03-12

Family

ID=85088119

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020247006920A Pending KR20240033157A (ko) 2021-07-30 2022-07-26 최적화된 고체-상 전구체의 승화를 위한 다중 구역 가열 격실

Country Status (8)

Country Link
US (1) US20250106944A1 (https=)
EP (1) EP4359585B1 (https=)
JP (1) JP2024529516A (https=)
KR (1) KR20240033157A (https=)
CN (1) CN117940601A (https=)
IL (1) IL310458A (https=)
TW (1) TWI809995B (https=)
WO (1) WO2023010001A1 (https=)

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3009235A (en) 1957-10-02 1961-11-21 Internat Velcro Company Separable fastening device
KR100199008B1 (ko) * 1996-12-06 1999-06-15 정선종 화학기상증착형 원자층 에피택시 장치 및 화학기상증착 장치의 액체소스 증기 공급장치
US6451692B1 (en) 2000-08-18 2002-09-17 Micron Technology, Inc. Preheating of chemical vapor deposition precursors
US8545629B2 (en) * 2001-12-24 2013-10-01 Crystal Is, Inc. Method and apparatus for producing large, single-crystals of aluminum nitride
US6953047B2 (en) 2002-01-14 2005-10-11 Air Products And Chemicals, Inc. Cabinet for chemical delivery with solvent purging
US8865271B2 (en) * 2003-06-06 2014-10-21 Neophotonics Corporation High rate deposition for the formation of high quality optical coatings
US6909839B2 (en) 2003-07-23 2005-06-21 Advanced Technology Materials, Inc. Delivery systems for efficient vaporization of precursor source material
KR101615913B1 (ko) * 2014-11-12 2016-05-13 에스엔유 프리시젼 주식회사 박막증착장치
KR20170126536A (ko) 2016-05-09 2017-11-20 삼성디스플레이 주식회사 증착 장치
JP6409021B2 (ja) 2016-05-20 2018-10-17 日本エア・リキード株式会社 昇華ガス供給システムおよび昇華ガス供給方法
US11421320B2 (en) 2017-12-07 2022-08-23 Entegris, Inc. Chemical delivery system and method of operating the chemical delivery system
US11021793B2 (en) 2018-05-31 2021-06-01 L'Air Liquide, Société Anonyme pour I'Etude et I'Exploitation des Procédés Georges Claude Group 6 transition metal-containing compositions for vapor deposition of group 6 transition metal-containing films
CN109269562A (zh) * 2018-10-11 2019-01-25 中核新能核工业工程有限责任公司 一种铀浓缩厂供料用加热蒸发装置
KR102221960B1 (ko) * 2019-03-25 2021-03-04 엘지전자 주식회사 증착 장치
KR102909679B1 (ko) * 2020-01-17 2026-01-08 삼성전자주식회사 조리기기

Also Published As

Publication number Publication date
EP4359585B1 (en) 2025-07-02
US20250106944A1 (en) 2025-03-27
CN117940601A (zh) 2024-04-26
JP2024529516A (ja) 2024-08-06
IL310458A (en) 2024-03-01
EP4359585A4 (en) 2024-06-19
EP4359585A1 (en) 2024-05-01
TWI809995B (zh) 2023-07-21
TW202305171A (zh) 2023-02-01
WO2023010001A1 (en) 2023-02-02

Similar Documents

Publication Publication Date Title
US9096931B2 (en) Deposition valve assembly and method of heating the same
US11694912B2 (en) High pressure and high temperature anneal chamber
KR102560400B1 (ko) 기판 처리 장치, 가스 박스, 반도체 장치의 제조 방법 및 프로그램
US20200386444A1 (en) Hybrid water heater
US20200243345A1 (en) High pressure and high temperature anneal chamber
TWI443489B (zh) 溫度箱、控制一裝置之溫度的溫控系統、及自我閉封式纜線饋穿模組
TW475046B (en) System and method for controlled delivery of liquefied gases including control aspects
TW201812962A (zh) 容器收納設備
TWI557261B (zh) 先質輸送系統
KR20240033157A (ko) 최적화된 고체-상 전구체의 승화를 위한 다중 구역 가열 격실
US8459293B2 (en) Ampoule with integrated hybrid valve
TWI815346B (zh) 基板處理裝置、半導體裝置的製造方法及程式
JP2003031562A (ja) 熱処理装置
KR101061922B1 (ko) 처리 장치 및 처리 방법
KR102837447B1 (ko) 플라스마 처리 장치
JP2006097080A (ja) 基板処理装置
JP2018101741A (ja) 基板処理装置及び基板処理方法
CN217154624U (zh) 一种晶圆暂存冷却装置
CN218100024U (zh) 一种用于环境箱内零部件的局部保温装置
US12486571B2 (en) Atomic layer deposition coating system for inner walls of gas lines
CN220061976U (zh) 空气处理装置
KR102730275B1 (ko) 반도체 공정 챔버
CN101443475A (zh) 模块化化学气相沉积（cvd）反应器
JP2005223115A (ja) 基板処理装置

Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20240228

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
A201 Request for examination
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20250509

Comment text: Request for Examination of Application