KR20230175251A - 패턴 형성용 조성물 - Google Patents

패턴 형성용 조성물 Download PDF

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Publication number
KR20230175251A
KR20230175251A KR1020237039854A KR20237039854A KR20230175251A KR 20230175251 A KR20230175251 A KR 20230175251A KR 1020237039854 A KR1020237039854 A KR 1020237039854A KR 20237039854 A KR20237039854 A KR 20237039854A KR 20230175251 A KR20230175251 A KR 20230175251A
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KR
South Korea
Prior art keywords
group
carbon atoms
composition
formula
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020237039854A
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English (en)
Korean (ko)
Inventor
나오키 나카이에
도모키 후루카와
Original Assignee
닛산 가가쿠 가부시키가이샤
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Publication of KR20230175251A publication Critical patent/KR20230175251A/ko
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/85—Arrangements for extracting light from the devices
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/0622—Polycondensates containing six-membered rings, not condensed with other rings, with nitrogen atoms as the only ring hetero atoms
    • C08G73/0638—Polycondensates containing six-membered rings, not condensed with other rings, with nitrogen atoms as the only ring hetero atoms with at least three nitrogen atoms in the ring
    • C08G73/0644—Poly(1,3,5)triazines
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/10—Metal compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/02—Details
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Plural Heterocyclic Compounds (AREA)
KR1020237039854A 2021-04-23 2022-04-21 패턴 형성용 조성물 Pending KR20230175251A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2021-073304 2021-04-23
JP2021073304 2021-04-23
PCT/JP2022/018430 WO2022225014A1 (ja) 2021-04-23 2022-04-21 パターン形成用組成物

Publications (1)

Publication Number Publication Date
KR20230175251A true KR20230175251A (ko) 2023-12-29

Family

ID=83722395

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020237039854A Pending KR20230175251A (ko) 2021-04-23 2022-04-21 패턴 형성용 조성물

Country Status (5)

Country Link
JP (1) JPWO2022225014A1 (https=)
KR (1) KR20230175251A (https=)
CN (1) CN117597398A (https=)
TW (1) TWI892005B (https=)
WO (1) WO2022225014A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7334875B1 (ja) * 2023-03-10 2023-08-29 東ソー株式会社 ブロックイソシアネート組成物及びその製造方法、塗料用硬化剤、塗料組成物、並びに、塗膜

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010128661A1 (ja) 2009-05-07 2010-11-11 日産化学工業株式会社 トリアジン環含有重合体およびそれを含む膜形成用組成物
WO2016024613A1 (ja) 2014-08-13 2016-02-18 日産化学工業株式会社 トリアジン環含有重合体およびそれを含む組成物
WO2016114337A1 (ja) 2015-01-15 2016-07-21 日産化学工業株式会社 トリアジン環含有重合体およびそれを含む組成物
WO2019093203A1 (ja) 2017-11-08 2019-05-16 日産化学株式会社 トリアジン環含有重合体およびそれを含む組成物

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10174164B2 (en) * 2011-12-20 2019-01-08 Nissan Chemical Industries, Ltd. Triazine ring-containing polymer and composition for film formation comprising same
EP2848967A4 (en) * 2012-05-11 2015-11-25 Nissan Chemical Ind Ltd FILM-COMPOSITE COMPOSITION
JP5979420B2 (ja) * 2012-05-28 2016-08-24 国立大学法人岩手大学 ヒドロキシ基含有芳香族ジアミン、ポリアミド樹脂、樹脂組成物、及び、それらの用途
JP6100021B2 (ja) * 2013-02-22 2017-03-22 出光興産株式会社 トリアジン環含有線状ポリマーからなる高屈折率材料
KR102641678B1 (ko) * 2016-02-09 2024-02-28 닛산 가가쿠 가부시키가이샤 트라이아진환 함유 중합체 및 그것을 포함하는 조성물
JP7605132B2 (ja) * 2019-12-09 2024-12-24 日産化学株式会社 パターン形成用組成物

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010128661A1 (ja) 2009-05-07 2010-11-11 日産化学工業株式会社 トリアジン環含有重合体およびそれを含む膜形成用組成物
WO2016024613A1 (ja) 2014-08-13 2016-02-18 日産化学工業株式会社 トリアジン環含有重合体およびそれを含む組成物
WO2016114337A1 (ja) 2015-01-15 2016-07-21 日産化学工業株式会社 トリアジン環含有重合体およびそれを含む組成物
WO2019093203A1 (ja) 2017-11-08 2019-05-16 日産化学株式会社 トリアジン環含有重合体およびそれを含む組成物

Also Published As

Publication number Publication date
WO2022225014A1 (ja) 2022-10-27
TW202309147A (zh) 2023-03-01
JPWO2022225014A1 (https=) 2022-10-27
TWI892005B (zh) 2025-08-01
CN117597398A (zh) 2024-02-23

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