KR20230131263A - 플라즈마 처리 장치, 고주파 전력 급전 회로, 및 임피던스정합 방법 - Google Patents

플라즈마 처리 장치, 고주파 전력 급전 회로, 및 임피던스정합 방법 Download PDF

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Publication number
KR20230131263A
KR20230131263A KR1020237027660A KR20237027660A KR20230131263A KR 20230131263 A KR20230131263 A KR 20230131263A KR 1020237027660 A KR1020237027660 A KR 1020237027660A KR 20237027660 A KR20237027660 A KR 20237027660A KR 20230131263 A KR20230131263 A KR 20230131263A
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KR
South Korea
Prior art keywords
impedance
frequency power
plasma
power supply
plasma processing
Prior art date
Application number
KR1020237027660A
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English (en)
Korean (ko)
Inventor
마사하루 시라타니
구니히토 가마타키
가즈노리 고가
다카히로 신도
다츠오 마츠도
Original Assignee
고쿠리쓰다이가쿠호진 규슈다이가쿠
도쿄엘렉트론가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 고쿠리쓰다이가쿠호진 규슈다이가쿠, 도쿄엘렉트론가부시키가이샤 filed Critical 고쿠리쓰다이가쿠호진 규슈다이가쿠
Publication of KR20230131263A publication Critical patent/KR20230131263A/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H01J37/32183—Matching circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H11/00—Networks using active elements
    • H03H11/02—Multiple-port networks
    • H03H11/40—Impedance converters
    • H03H11/44—Negative impedance converters
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
    • H03H7/38—Impedance-matching networks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating
    • H01J2237/3321—CVD [Chemical Vapor Deposition]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/334—Etching

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
KR1020237027660A 2021-01-28 2022-01-19 플라즈마 처리 장치, 고주파 전력 급전 회로, 및 임피던스정합 방법 KR20230131263A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2021-012038 2021-01-28
JP2021012038A JP2022115443A (ja) 2021-01-28 2021-01-28 プラズマ処理装置、高周波電力給電回路、およびインピーダンス整合方法
PCT/JP2022/001781 WO2022163461A1 (ja) 2021-01-28 2022-01-19 プラズマ処理装置、高周波電力給電回路、およびインピーダンス整合方法

Publications (1)

Publication Number Publication Date
KR20230131263A true KR20230131263A (ko) 2023-09-12

Family

ID=82653322

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020237027660A KR20230131263A (ko) 2021-01-28 2022-01-19 플라즈마 처리 장치, 고주파 전력 급전 회로, 및 임피던스정합 방법

Country Status (4)

Country Link
US (1) US20240120179A1 (ja)
JP (1) JP2022115443A (ja)
KR (1) KR20230131263A (ja)
WO (1) WO2022163461A1 (ja)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011124192A (ja) 2009-12-14 2011-06-23 Shindengen Electric Mfg Co Ltd インピーダンス整合装置及びそれを備えたプラズマ発生装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5288971A (en) * 1991-08-09 1994-02-22 Advanced Energy Industries, Inc. System for igniting a plasma for thin film processing
JP2005303503A (ja) * 2004-04-08 2005-10-27 General Res Of Electronics Inc 負性インピーダンス変換器
US7105075B2 (en) * 2004-07-02 2006-09-12 Advanced Energy Industries, Inc. DC power supply utilizing real time estimation of dynamic impedance

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011124192A (ja) 2009-12-14 2011-06-23 Shindengen Electric Mfg Co Ltd インピーダンス整合装置及びそれを備えたプラズマ発生装置

Also Published As

Publication number Publication date
US20240120179A1 (en) 2024-04-11
WO2022163461A1 (ja) 2022-08-04
JP2022115443A (ja) 2022-08-09

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