KR20220167226A - 반도체 장치 및 반도체 장치의 제조 방법 - Google Patents

반도체 장치 및 반도체 장치의 제조 방법 Download PDF

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KR20220167226A
KR20220167226A KR1020220069339A KR20220069339A KR20220167226A KR 20220167226 A KR20220167226 A KR 20220167226A KR 1020220069339 A KR1020220069339 A KR 1020220069339A KR 20220069339 A KR20220069339 A KR 20220069339A KR 20220167226 A KR20220167226 A KR 20220167226A
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South Korea
Prior art keywords
core ball
conductive
conductive pad
main surface
substrate
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KR1020220069339A
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English (en)
Korean (ko)
Inventor
신이치로 세키지마
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신꼬오덴기 고교 가부시키가이샤
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Publication of KR20220167226A publication Critical patent/KR20220167226A/ko
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49811Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
    • H01L23/49816Spherical bumps on the substrate for external connection, e.g. ball grid arrays [BGA]
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    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
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    • H01L24/02Bonding areas ; Manufacturing methods related thereto
    • H01L24/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L24/06Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
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    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49822Multilayer substrates
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    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
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    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
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    • H01L23/49833Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers the chip support structure consisting of a plurality of insulating substrates
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    • H01L2224/05099Material
    • H01L2224/051Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • H01L2224/05138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/05147Copper [Cu] as principal constituent
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    • H01L2224/13138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
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    • H01L2224/1356Disposition
    • H01L2224/13562On the entire exposed surface of the core
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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Geometry (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Combinations Of Printed Boards (AREA)
  • Wire Bonding (AREA)
KR1020220069339A 2021-06-10 2022-06-08 반도체 장치 및 반도체 장치의 제조 방법 Pending KR20220167226A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2021-097292 2021-06-10
JP2021097292A JP7661663B2 (ja) 2021-06-10 2021-06-10 半導体装置及び半導体装置の製造方法

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Publication Number Publication Date
KR20220167226A true KR20220167226A (ko) 2022-12-20

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US (1) US12406953B2 (enExample)
JP (1) JP7661663B2 (enExample)
KR (1) KR20220167226A (enExample)
CN (1) CN115472589A (enExample)

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Publication number Priority date Publication date Assignee Title
US20250323136A1 (en) * 2024-04-12 2025-10-16 Qualcomm Incorporated Integrated circuit (ic) package including two substrates and vertical interconnects coupling the two substrates, the vertical interconnects comprising a metal ball and metal pin combination to address an increased distance between substrates

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012009782A (ja) 2010-06-28 2012-01-12 Shinko Electric Ind Co Ltd 半導体パッケージの製造方法

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Publication number Priority date Publication date Assignee Title
JP3270813B2 (ja) * 1995-07-11 2002-04-02 株式会社ピーエフユー 半導体装置とその製造方法
US5926694A (en) * 1996-07-11 1999-07-20 Pfu Limited Semiconductor device and a manufacturing method thereof
JPH10270496A (ja) * 1997-03-27 1998-10-09 Hitachi Ltd 電子装置、情報処理装置、半導体装置並びに半導体チップの実装方法
US6610591B1 (en) * 2000-08-25 2003-08-26 Micron Technology, Inc. Methods of ball grid array
JPWO2007069606A1 (ja) * 2005-12-14 2009-05-21 新光電気工業株式会社 チップ内蔵基板の製造方法
US20080142968A1 (en) * 2006-12-15 2008-06-19 International Business Machines Corporation Structure for controlled collapse chip connection with a captured pad geometry
JP5525793B2 (ja) * 2009-10-19 2014-06-18 パナソニック株式会社 半導体装置
JP2011187635A (ja) * 2010-03-08 2011-09-22 Hitachi Metals Ltd 半導体装置およびその製造方法
JP2012099642A (ja) * 2010-11-02 2012-05-24 Hitachi Metals Ltd 半導体装置、それを用いた電子部品およびそれらの製造方法
US20130043573A1 (en) * 2011-08-15 2013-02-21 Advanced Analogic Technologies (Hong Kong) Limited Solder Bump Bonding In Semiconductor Package Using Solder Balls Having High-Temperature Cores
JP6352644B2 (ja) * 2014-02-12 2018-07-04 新光電気工業株式会社 配線基板及び半導体パッケージの製造方法
US10157850B1 (en) * 2017-07-28 2018-12-18 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor packages and manufacturing method thereof

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012009782A (ja) 2010-06-28 2012-01-12 Shinko Electric Ind Co Ltd 半導体パッケージの製造方法

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JP2022188977A (ja) 2022-12-22
US20220399293A1 (en) 2022-12-15
US12406953B2 (en) 2025-09-02
CN115472589A (zh) 2022-12-13
JP7661663B2 (ja) 2025-04-15

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