KR20220076310A - 증착 장치, 성막 장치, 성막 방법 및 전자 디바이스의 제조 방법 - Google Patents
증착 장치, 성막 장치, 성막 방법 및 전자 디바이스의 제조 방법 Download PDFInfo
- Publication number
- KR20220076310A KR20220076310A KR1020210152742A KR20210152742A KR20220076310A KR 20220076310 A KR20220076310 A KR 20220076310A KR 1020210152742 A KR1020210152742 A KR 1020210152742A KR 20210152742 A KR20210152742 A KR 20210152742A KR 20220076310 A KR20220076310 A KR 20220076310A
- Authority
- KR
- South Korea
- Prior art keywords
- rotation shaft
- shutter
- vapor deposition
- substrate
- deposition
- Prior art date
Links
- 238000007740 vapor deposition Methods 0.000 title claims abstract description 70
- 238000000034 method Methods 0.000 title claims description 20
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 230000008021 deposition Effects 0.000 claims abstract description 63
- 239000002826 coolant Substances 0.000 claims abstract description 43
- 239000000463 material Substances 0.000 claims abstract description 43
- 239000000758 substrate Substances 0.000 claims abstract description 41
- 230000008020 evaporation Effects 0.000 claims abstract description 26
- 238000001704 evaporation Methods 0.000 claims abstract description 26
- 238000007599 discharging Methods 0.000 claims abstract description 3
- 238000000151 deposition Methods 0.000 claims description 65
- 238000012544 monitoring process Methods 0.000 claims description 10
- 238000009434 installation Methods 0.000 claims description 9
- 238000005516 engineering process Methods 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 66
- 238000012806 monitoring device Methods 0.000 description 22
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 22
- 239000010408 film Substances 0.000 description 16
- 238000012546 transfer Methods 0.000 description 16
- 238000010586 diagram Methods 0.000 description 9
- 238000001816 cooling Methods 0.000 description 8
- 230000007246 mechanism Effects 0.000 description 8
- 230000005525 hole transport Effects 0.000 description 7
- 230000000903 blocking effect Effects 0.000 description 6
- 239000013078 crystal Substances 0.000 description 6
- 239000002184 metal Substances 0.000 description 5
- 230000001105 regulatory effect Effects 0.000 description 5
- 230000008569 process Effects 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 206010037660 Pyrexia Diseases 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 239000000498 cooling water Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000005339 levitation Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 238000009428 plumbing Methods 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000003685 thermal hair damage Effects 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
-
- H01L51/001—
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020198686A JP7354086B2 (ja) | 2020-11-30 | 2020-11-30 | 蒸着装置、成膜装置、成膜方法及び電子デバイスの製造方法 |
| JPJP-P-2020-198686 | 2020-11-30 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20220076310A true KR20220076310A (ko) | 2022-06-08 |
| KR102709793B1 KR102709793B1 (ko) | 2024-09-26 |
Family
ID=81768028
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020210152742A KR102709793B1 (ko) | 2020-11-30 | 2021-11-09 | 증착 장치, 성막 장치, 성막 방법 및 전자 디바이스의 제조 방법 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP7354086B2 (zh) |
| KR (1) | KR102709793B1 (zh) |
| CN (1) | CN114574812B (zh) |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006083423A (ja) * | 2004-09-15 | 2006-03-30 | Tokki Corp | 蒸着装置における蒸発源用のシャッタ及びその蒸着装置 |
| JP2009108381A (ja) * | 2007-10-31 | 2009-05-21 | Raiku:Kk | 成膜装置及び成膜方法 |
| JP2010140840A (ja) * | 2008-12-15 | 2010-06-24 | Hitachi High-Technologies Corp | 有機ｅｌデバイス製造装置及び成膜装置並びに液晶表示基板製造装置 |
| JP2014110086A (ja) * | 2012-11-30 | 2014-06-12 | Panasonic Corp | 有機ｅｌ素子の製造装置 |
| KR20160018253A (ko) * | 2014-08-08 | 2016-02-17 | 주식회사 선익시스템 | 증착 장치 |
| JP2019534938A (ja) | 2017-09-26 | 2019-12-05 | アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ | 材料堆積装置、真空堆積システム、及び真空堆積を行う方法 |
| JP2020007587A (ja) | 2018-07-04 | 2020-01-16 | 株式会社アルバック | 蒸着装置、および、蒸着方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4460334B2 (ja) * | 2004-03-12 | 2010-05-12 | 大日本スクリーン製造株式会社 | 基板処理装置および基板処理方法 |
| CN101665913B (zh) * | 2009-09-30 | 2012-05-23 | 东莞宏威数码机械有限公司 | 真空镀膜用处理装置 |
| CN101876055B (zh) * | 2010-03-23 | 2012-02-15 | 东莞宏威数码机械有限公司 | 挡板冷却装置 |
-
2020
- 2020-11-30 JP JP2020198686A patent/JP7354086B2/ja active Active
-
2021
- 2021-11-09 KR KR1020210152742A patent/KR102709793B1/ko active IP Right Grant
- 2021-11-18 CN CN202111365912.5A patent/CN114574812B/zh active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006083423A (ja) * | 2004-09-15 | 2006-03-30 | Tokki Corp | 蒸着装置における蒸発源用のシャッタ及びその蒸着装置 |
| JP2009108381A (ja) * | 2007-10-31 | 2009-05-21 | Raiku:Kk | 成膜装置及び成膜方法 |
| JP2010140840A (ja) * | 2008-12-15 | 2010-06-24 | Hitachi High-Technologies Corp | 有機ｅｌデバイス製造装置及び成膜装置並びに液晶表示基板製造装置 |
| JP2014110086A (ja) * | 2012-11-30 | 2014-06-12 | Panasonic Corp | 有機ｅｌ素子の製造装置 |
| KR20160018253A (ko) * | 2014-08-08 | 2016-02-17 | 주식회사 선익시스템 | 증착 장치 |
| JP2019534938A (ja) | 2017-09-26 | 2019-12-05 | アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ | 材料堆積装置、真空堆積システム、及び真空堆積を行う方法 |
| JP2020007587A (ja) | 2018-07-04 | 2020-01-16 | 株式会社アルバック | 蒸着装置、および、蒸着方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN114574812B (zh) | 2023-12-19 |
| JP2022086588A (ja) | 2022-06-09 |
| CN114574812A (zh) | 2022-06-03 |
| KR102709793B1 (ko) | 2024-09-26 |
| JP7354086B2 (ja) | 2023-10-02 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101801351B1 (ko) | 박막 증착 장치, 이를 이용한 유기 발광 표시 장치의 제조 방법 및 이를 이용하여 제조된 유기 발광 표시 장치 | |
| KR101678056B1 (ko) | 박막 증착 장치, 이를 이용한 유기 발광 디스플레이 장치의 제조방법 및 이에 따라 제조된 유기 발광 디스플레이 장치 | |
| JP5847437B2 (ja) | 薄膜蒸着装置及びこれを利用した有機発光表示装置の製造方法 | |
| KR101730498B1 (ko) | 유기층 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법 | |
| US8536057B2 (en) | Thin film deposition apparatus and method of manufacturing organic light emitting device by using the same | |
| WO2012124563A1 (ja) | 蒸着粒子射出装置および蒸着装置並びに蒸着方法 | |
| KR101597887B1 (ko) | 증착 방법 및 증착 장치 | |
| KR101965102B1 (ko) | 성막장치, 성막방법 및 전자 디바이스 제조방법 | |
| US20080282984A1 (en) | Method of fabricating light-emitting device and apparatus for manufacturing light-emitting device | |
| US7247984B2 (en) | Electroluminescence element and electroluminescence panel | |
| KR20140018046A (ko) | 유기층 증착 어셈블리, 유기층 증착 장치, 유기 발광 표시 장치 및 유기 발광 표시 장치 제조 방법 | |
| KR20140039607A (ko) | 유기층 증착 장치, 이를 이용한 유기 발광 디스플레이 장치의 제조 방법 및 이에 따라 제조된 유기 발광 디스플레이 장치 | |
| JP6429491B2 (ja) | 蒸着装置用マスク、蒸着装置、蒸着方法、及び、有機エレクトロルミネッセンス素子の製造方法 | |
| KR20220076311A (ko) | 증착 장치, 성막 장치, 성막 방법 및 전자 디바이스의 제조 방법 | |
| KR102527121B1 (ko) | 성막 장치, 유기 디바이스의 제조 장치, 및 유기 디바이스의 제조 방법 | |
| KR20220076310A (ko) | 증착 장치, 성막 장치, 성막 방법 및 전자 디바이스의 제조 방법 | |
| EP3327808B1 (en) | Roll to roll fabricating system having turning unit | |
| JP7498216B2 (ja) | 成膜装置及び成膜方法 | |
| JP7216064B2 (ja) | 成膜装置、成膜方法及び電子デバイスの製造方法 | |
| KR101751263B1 (ko) | 기판 증착장치 | |
| KR101749040B1 (ko) | 기판 증착장치 | |
| KR20230012414A (ko) | 성막 장치, 성막 방법 및 증발원 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| E902 | Notification of reason for refusal | ||
| E701 | Decision to grant or registration of patent right |